CN210535623U - X-ray source and X-ray imaging apparatus - Google Patents
X-ray source and X-ray imaging apparatus Download PDFInfo
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- CN210535623U CN210535623U CN201921818440.2U CN201921818440U CN210535623U CN 210535623 U CN210535623 U CN 210535623U CN 201921818440 U CN201921818440 U CN 201921818440U CN 210535623 U CN210535623 U CN 210535623U
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Abstract
The present disclosure provides an X-ray source and an X-ray imaging apparatus. The X-ray source (100) comprises: a housing (101) defining a vacuum space within the housing; an electron beam generating device (110) disposed within the vacuum space of the housing and configured to emit an electron beam (102); a first focusing device (120) disposed in the vacuum space of the housing for receiving and focusing the electron beam from the electron beam generating device; an anode target (130) disposed within the vacuum space of the housing, facing the first focusing device and configured to generate X-rays upon impingement of a focused electron beam from the first focusing device, the first focusing device configured to focus the received electron beam onto the anode target at an adjustable first potential such that a beam spot (103) generated on the anode target by the focused electron beam impinging on the anode target is adjustable in size.
Description
Technical Field
Embodiments of the present disclosure relate generally to the field of X-ray detection, and more particularly, to an X-ray source and an X-ray imaging apparatus with adjustable focal spot size or position.
Background
X-rays have wide applications in the fields of industrial nondestructive testing, safety inspection, medical diagnosis and treatment, etc. An X-ray generating device, which may be referred to as an X-ray source or an X-ray generator, includes a cathode and an anode, and generates an electron beam from the cathode, which is accelerated by a high-voltage electric field between the cathode and the anode and strikes an anode target, thereby generating X-rays.
For a conventional X-ray source, especially for a distributed X-ray source including a cathode array, due to mechanical errors of installation and differences of cathodes, parameters such as a focal spot size, a focal spot position, and the like of each installed source are fixed values, and may not meet the use requirements of an imaging system, cannot be adjusted, and is poor in flexibility.
SUMMERY OF THE UTILITY MODEL
The present disclosure is directed to overcoming at least one of the above-mentioned and other problems and disadvantages of the prior art.
According to an aspect of the present disclosure, an X-ray source is presented, comprising: a housing defining a vacuum space within the housing; an electron beam generating device disposed within the vacuum space of the housing and configured to emit an electron beam; a first focusing device disposed in the vacuum space of the housing for receiving and focusing the electron beam from the electron beam generating device; an anode target disposed within the vacuum space of the housing, facing the first focusing device and configured to generate X-rays upon impingement of a focused electron beam from the first focusing device, the first focusing device configured to focus the received electron beam onto the anode target at an adjustable first potential such that a size of a beam spot generated on the anode target by the focused electron beam impinging on the anode target is adjustable.
In some embodiments, the X-ray source further comprises a second focusing device disposed within the vacuum space of the housing and between the electron beam generating device and the first focusing device to initially focus the electron beam from the electron beam generating device, such that the initially focused electron beam reaches the first focusing device and is further focused by the first focusing device.
In some embodiments, the second focusing device is configured to initially focus the electron beam from the electron beam generating device at a fixed zero potential.
In some embodiments, the second focusing device is configured to initially focus the electron beam from the electron beam generating device at an adjustable second potential.
In some embodiments, the anode target has an operating voltage in the range of 80kV to 300kV and the adjustable first potential is in the range of 4kV to 10 kV.
In some embodiments, the X-ray source further comprises a control grid disposed within the vacuum space of the housing and configured to control emission and cutoff of an electron beam by the electron beam generating device.
In some embodiments, the control grid is further configured to adjust an amount of electrons of the electron beam emitted by the electron beam generating device.
In some embodiments, the X-ray source further comprises a cooling device configured to cool the anode target.
In some embodiments, the X-ray source comprises a distributed X-ray source comprising a plurality of said electron beam generating devices and a plurality of said first focusing devices disposed within a vacuum space of a housing.
In some embodiments, each first focusing device focuses the electron beam from the corresponding electron beam generating device onto the anode target at an independently adjustable potential relative to the other first focusing devices.
According to another aspect of the present disclosure, there is provided an X-ray imaging apparatus comprising the X-ray source described in any embodiment of the present disclosure.
Other objects and advantages of the present disclosure will become apparent from the following detailed description of the disclosure, which proceeds with reference to the accompanying drawings, and may assist in a comprehensive understanding of the disclosure.
Drawings
The features and advantages of the present disclosure may be more clearly understood by reference to the accompanying drawings, which are illustrative and not intended to limit the disclosure in any way, and in which:
fig. 1 is a schematic diagram illustrating an arrangement of X-ray sources according to an exemplary embodiment of the present disclosure;
fig. 2 is a schematic view showing the arrangement of an X-ray source according to another exemplary embodiment of the present disclosure;
FIG. 3 is a schematic diagram illustrating the adjustment of a beam spot generated by an electron beam on an anode target by adjusting the potential on a focusing device according to an exemplary embodiment of the present disclosure; and
fig. 4 is a schematic view illustrating an arrangement of an X-ray source according to still another exemplary embodiment of the present disclosure.
Detailed Description
The technical solutions in the embodiments of the present disclosure will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present disclosure, and it is obvious that the described embodiments are only a part of the embodiments of the present disclosure, not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments disclosed herein without making any creative effort, shall fall within the protection scope of the present disclosure.
Furthermore, in the following detailed description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the embodiments of the disclosure. It may be evident, however, that one or more embodiments may be practiced without these specific details. In other instances, well-known structures and devices are shown in schematic form in order to simplify the drawing.
Fig. 1 schematically shows an arrangement of X-ray sources according to an exemplary embodiment of the present disclosure. As shown, the exemplary X-ray source 100 generally includes a housing 101 and an electron beam generating device 110, a first focusing device 120, and an anode target 130 disposed within the housing 101. A vacuum space is defined or formed within the housing 101, and thus the housing 101 may also be referred to as a vacuum chamber. The electron beam generating device 110 generates an electron beam and emits the electron beam 102, for example, toward an anode target 130. The first focusing device 120 is oriented within the vacuum space of the housing to receive the electron beam from the electron beam generating device 110 and focus the electron beam toward the anode target 130, the focused electron beam is accelerated by the high voltage electric field located within the housing 101 (e.g., between the electron beam generating device and the anode target, or between the first focusing device and the anode target) and obtains energy to impinge on the anode target, creating a beam spot or focal point 103 on the anode target 130, such that the anode target 130 generates X-rays upon impingement of the focused electron beam. The energy of the electron beam striking the anode target can be adjusted by controlling the magnitude of the electric field.
The X-ray source may be, for example, an X-ray tube or an accelerator. When the X-ray source is an X-ray tube, the electron beam generating device is a cathode; when the X-ray source is an accelerator, the electron beam generating device includes an electron gun and an accelerating tube, and in this case, the X-ray source may further include a microwave power source, a waveguide, and the like. In some examples, the anode target may be made of at least one of tungsten, copper, silver, and palladium.
In order to focus the electron beam on the anode target, a voltage is generally applied to a focusing device to shape and focus the electron beam. In conventional X-ray sources, the voltage or potential on the focusing means is fixed, and therefore the parameters of focal spot size, focal spot position, etc. cannot be adjusted. In the embodiment of the present disclosure, the first focusing device of the X-ray source can focus the received electron beam on the anode target at the adjustable first potential, that is, the voltage applied to the first focusing device or the potential thereon can be adjusted or controlled, so as to focus the electron beam in an adjustable or controllable manner, and thus the focal point of the focused electron beam can be adjusted by adjusting the voltage or the potential on the first focusing device, and further the size (e.g., area) or the position of the beam spot 103 generated on the anode target can be adjusted, thereby avoiding the situation that the focal point of the X-ray source does not meet the imaging requirement due to manufacturing or assembly errors, and improving the imaging quality and flexibility. In addition, the size or the position of a beam spot generated on the anode target by the focused electron beam can be adjusted by adjusting the voltage or the potential on the first focusing device, so that the beam spot has a smaller size and/or impacts a proper target point position on the anode target, and a foundation is laid for realizing higher spatial resolution and image fineness of an X-ray detection image of a subsequent detected object in an adjustable manner.
Fig. 2 shows an example of adjusting the beam spot generated by the focused electron beam on the anode target 130 by adjusting the voltage or potential on the first focusing means 120. Fig. 2 (a), (B), (C) show the state where the electron beam is focused and the different sizes of beam spots generated on the anode target 130 in the case where different voltages or potentials V1, V2, V3 are applied by the first focusing device 120, respectively; illustratively, V1 < V2 < V3, where in (a) of fig. 2 the electron beam impinges the anode target with a focal point located behind the anode target, in (B) of fig. 2 the electron beam impinges the anode target with a focal point located above the anode target, and in (C) of fig. 2 the electron beam impinges the anode target with a focal point located in front of the anode target, so that beam spots generated on the anode plate by the electron beam have different sizes. Further, by appropriately arranging the orientation of the first focusing means, it is also possible to change the position/size of the beam spot generated on the anode plate by the electron beam.
In the X-ray source as shown in fig. 1, a suitable operating voltage may be applied to the anode target via connector 161 by an external power supply 160, and a suitable operating voltage may be applied to the first focusing means 120 via connector 171 by an external power supply 170, the external power supply 170 comprising an adjustable voltage source. In some examples, the operating voltage applied to the anode target is in the range of 80kV to 300kV, and the adjustable first potential applied to the first focusing assembly can be in the range of 4kV to 10 kV.
As shown in fig. 1, the X-ray source may further include a control grid 140 disposed in the vacuum space of the housing 101, for example, at the electron exit of the electron beam generating device 110, for controlling the emission and cutoff of the electron beam generating device 110. For example, when a suitable voltage is applied to the control grid (e.g. a negative voltage, which may be larger in absolute value than the voltage on the electron beam generating device, i.e. the voltage applied on the control grid is a negative voltage with respect to the voltage on the electron beam generating device), no electrons are emitted onto the anode target and thus no X-rays are generated by the X-ray source; and when the voltage applied on the control grid is positive relative to the voltage on the electron beam generating device, the electrons emitted by the electron beam generating device are led out through the control grid and focused by the focusing device to impact the anode target so as to generate X rays. The amount of electrons of the electron beam emitted by the electron beam generating device can be adjusted by adjusting the voltage on the control grid, thereby adjusting the yield of the X-rays.
As shown in fig. 3, the X-ray source 100 may further comprise a cooling device 131 for cooling the anode target 130. For example, the cooling device can be made of a cooling body which conducts heat well and which in time carries away the heat generated in the anode target as a result of the electron beam striking the anode target. The cooling means may be attached to or in contact with a side of the anode target facing away from the electron beam impact surface.
In the embodiment illustrated in fig. 3, the X-ray source 100 further comprises a second focusing device 150 arranged within the vacuum space of the housing 101. The second focusing device 150 may be located between the electron beam generating device 110 and the first focusing device 120 to perform initial focusing on the electron beam from the electron beam generating device 120, so that the initially focused electron beam reaches the first focusing device 120 and is further focused by the first focusing device, thereby further improving the focusing accuracy.
In some examples, the potential on the second focusing device may be a fixed potential, such as a zero potential. In other embodiments, the second focusing device may also initially focus the electron beam from the electron beam generating device at an adjustable second potential, thereby further improving the focusing accuracy. As shown in fig. 3, a suitable operating voltage, such as a fixed voltage or an adjustable voltage, may be applied to the second focusing device 150 via a connector 181 by an external power source 180. It will be appreciated that although two stages of focusing devices (first focusing device 120 and second focusing device 150) are shown in the embodiment of fig. 3, in actual practice, more stages of focusing devices may be provided as needed to meet different focusing/imaging requirements.
Fig. 4 shows an arrangement of X-ray sources according to yet another exemplary embodiment of the present disclosure. In fig. 4, the X-ray source includes a distributed X-ray source, which includes a plurality of (e.g., two or more) electron beam generating devices 110 and a corresponding plurality of first focusing devices 120 disposed in a vacuum space of a housing 101, the plurality of electron beam generating devices 110 are arranged in an array as cathodes, and emission of electrons can be controlled by controlling a voltage applied on a grid, so that each electron beam generating device is controlled to sequentially emit electrons, and target points are bombarded on an anode target at corresponding sequential positions, thereby forming the distributed X-ray source.
In some embodiments, the voltages or potentials applied to the respective first focusing devices are independently adjustable, such that each first focusing device focuses the electron beam from the corresponding electron beam generating device onto the anode target at a potential independently adjustable with respect to the other first focusing devices, which may overcome problems due to poor cathode uniformity, mounting errors, etc., and further improve focusing flexibility and accuracy.
Embodiments of the present disclosure also provide an X-ray imaging apparatus including the aforementioned X-ray source, thereby enabling precise imaging of an object in a focus-adjustable or controllable manner.
Although embodiments of the present disclosure have been shown and described, it would be appreciated by those skilled in the art that changes may be made in these embodiments without departing from the principles and spirit of the disclosure, the scope of which is defined in the claims and their equivalents.
Claims (11)
1. An X-ray source (100), comprising:
a housing (101) defining a vacuum space within the housing;
an electron beam generating device (110) disposed within the vacuum space of the housing and configured to emit an electron beam (102);
a first focusing device (120) disposed in the vacuum space of the housing for receiving and focusing the electron beam from the electron beam generating device;
an anode target (130) disposed within the vacuum space of the housing, facing the first focusing device and configured to generate X-rays upon impingement of a focused electron beam from the first focusing device,
it is characterized in that the preparation method is characterized in that,
the first focusing device is configured to focus the received electron beam onto the anode target at an adjustable first potential, such that a size of a beam spot (103) generated on the anode target by the focused electron beam impinging on the anode target is adjustable.
2. The X-ray source of claim 1, further comprising:
and a second focusing device (150) arranged in the vacuum space of the shell and between the electron beam generating device and the first focusing device to perform initial focusing on the electron beams from the electron beam generating device, so that the initially focused electron beams reach the first focusing device and are further focused by the first focusing device.
3. An X-ray source according to claim 2, wherein the second focusing means is configured to initially focus the electron beam from the electron beam generating means at a fixed zero potential.
4. An X-ray source according to claim 2, wherein the second focusing means is configured to initially focus the electron beam from the electron beam generating means at an adjustable second potential.
5. An X-ray source according to any one of claims 1 to 4, wherein the anode target has an operating voltage in the range of 80kV to 300kV and the adjustable first potential is in the range of 4kV to 10 kV.
6. The X-ray source of any one of claims 1-4, further comprising:
a control grid (140) disposed within the vacuum space of the housing and configured to control emission and cut-off of an electron beam of the electron beam generating device.
7. The X-ray source of claim 6, wherein the control grid is further configured to adjust an amount of electrons of the electron beam emitted by the electron beam generating device.
8. The X-ray source of any one of claims 1-4, further comprising:
a cooling device (131) configured to cool the anode target.
9. The X-ray source according to any one of claims 1 to 4, characterized in that the X-ray source comprises a distributed X-ray source,
the distributed X-ray source comprises a plurality of electron beam generating devices and a plurality of first focusing devices which are arranged in a vacuum space of a shell.
10. An X-ray source according to claim 9, wherein each first focusing means focuses the electron beam from the corresponding electron beam generating means onto the anode target at an independently adjustable potential relative to the other first focusing means.
11. An X-ray imaging device, characterized in that it comprises an X-ray source according to any one of claims 1-10.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201921818440.2U CN210535623U (en) | 2019-10-25 | 2019-10-25 | X-ray source and X-ray imaging apparatus |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201921818440.2U CN210535623U (en) | 2019-10-25 | 2019-10-25 | X-ray source and X-ray imaging apparatus |
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| CN210535623U true CN210535623U (en) | 2020-05-15 |
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