JPS61288361A - Electron beam welding device - Google Patents
Electron beam welding deviceInfo
- Publication number
- JPS61288361A JPS61288361A JP12819585A JP12819585A JPS61288361A JP S61288361 A JPS61288361 A JP S61288361A JP 12819585 A JP12819585 A JP 12819585A JP 12819585 A JP12819585 A JP 12819585A JP S61288361 A JPS61288361 A JP S61288361A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- anode
- trap
- focusing coil
- welding device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Welding Or Cutting Using Electron Beams (AREA)
Abstract
Description
【発明の詳細な説明】
軌
〔発明の利用分野〕 本発明は電子4!ζこよる電子ビ
ーム溶接装置Iこ関するものである。[Detailed Description of the Invention] Trajectory [Field of Application of the Invention] The present invention relates to electronic 4! This relates to an electron beam welding device I.
鉄
〔発明の背景〕 電子黄による電子ビーム溶接を実施す
る場合、蒸気圧の低い合金成分、素材の錆。Iron [Background of the Invention] When performing electron beam welding using electronic yellow, alloy components with low vapor pressure and rust of the material.
で放電を起し、これが溶接欠陥の原因となってい色
た。この金属蒸気の電子鏡内侵入を防止する装置として
は実開昭51−85027号のように電子ビーム通路上
に細い穴をあけ一金属蒸気の侵入を防止する方法など数
多く提案されているが、ガス成分中のプラスイオンのみ
番こ注目した金属蒸気の侵入を防止する方法は見当らな
い。This caused electrical discharge, which caused welding defects. A number of devices have been proposed to prevent metal vapor from entering the electron mirror, such as the method of making a narrow hole in the electron beam path as in Japanese Utility Model Application No. 51-85027, to prevent metal vapor from entering. No method has been found to prevent the intrusion of metal vapor, which focuses only on positive ions in gas components.
〔発明の目的〕 本発明は前記のような事情によりなさ
れたもので、電子ビーム溶接中の金属蒸気。[Object of the Invention] The present invention was made in view of the above-mentioned circumstances, and relates to metal vapor during electron beam welding.
被
ガス成分中のプラスイオンのみに注目し、電子鏡内に金
属蒸気の侵入を防止することができる電子ビームを発生
するフィラメントと、電子ビームを辿して加速する陰極
および陽極と、加速された電子ビームを集束する集束コ
イルとよりなる電子ビーム溶接装置において、前記集束
コイルと陽極間の電子ビーム経路にマイナスの電位を印
加したトラップを設け、被加工材の加工部から発生する
陽イオンを前記トラップにより捕捉して、前記陽極およ
び陰極間lこ陽イオンの侵入を防止して両極間の異状放
電を防止する如くしたものである。A filament that generates an electron beam that focuses only on positive ions in the gaseous components and can prevent metal vapor from entering the electron mirror, a cathode and an anode that follow and accelerate the electron beam, and an accelerated In an electron beam welding device that includes a focusing coil that focuses an electron beam, a trap to which a negative potential is applied is provided in the electron beam path between the focusing coil and the anode, and the positive ions generated from the processed portion of the workpiece are The cations are captured by a trap to prevent cations from entering between the anode and cathode, thereby preventing abnormal discharge between the two electrodes.
〔発明の実施例〕 次に添付図面により本発明の一実施
例を説明する。[Embodiment of the Invention] Next, an embodiment of the present invention will be described with reference to the accompanying drawings.
添付図面は本発明の電子ビーム溶接装置の実施例の構成
を示すブロック図である。The accompanying drawing is a block diagram showing the configuration of an embodiment of the electron beam welding apparatus of the present invention.
添付図面において、電子ビーム溶接装置は、電子ビーム
を発生するためのフィラメント22と。In the accompanying drawings, an electron beam welding device includes a filament 22 for generating an electron beam.
該フィラメント22で発生した電子ビームを加速するた
めの加速電源26および陰極50.陽極28と陰極50
の電圧を制御するバイアス電源52と加速された電子ビ
ーム20を集束するための集束コイル30と、集束電子
ビーム20で溶接箇所12を加工される被加工材10よ
り構成され、これらの装置は真空室53内に収納され、
加工時にはl X I O−’mxHg以下の真空に保
たれている。An acceleration power source 26 and a cathode 50 for accelerating the electron beam generated by the filament 22. Anode 28 and cathode 50
A bias power supply 52 for controlling the voltage of It is stored in the chamber 53,
During processing, a vacuum of less than lXIO-'mxHg is maintained.
本発明においては、前記集束コイル30と陽極28間の
環子ビーム通路にトラップ13を配設し。In the present invention, a trap 13 is disposed in the loop beam path between the focusing coil 30 and the anode 28.
該トラップ13に電源36によりマイナスの電位を印加
する。A negative potential is applied to the trap 13 by a power source 36.
前記の構成において、直流のフィラメント電源24によ
りフィラメント22を加熱すると、フィラメント22か
ら熱電子20が放出される。その熱電子20は加速電源
26を用いてフィラメント22と陽極28間に印加され
ている加速電圧により加速され、さらに集束コイル30
により集束されて、エネルギイ密度の高い電子ビーム2
0となる。該電子ビーム20は被加工材10の表面を加
熱溶融して溶接が進行する。その際発生する被加工材中
のガス、蒸発しやすい合金成分1表面の酸化物などは高
温に加熱されて、電子ビーム20に沿って上昇 して陽
極28、陰極50方向に直進し、陽極28.陰極50間
の異状放電の原因となる。本発明においては、異状放電
の原因となる前記ガス21の内、プラスに帯電している
イオンについては、前記トラップ13にマイナスの電位
を印加しているので、トラップ13の静電吸引力により
プラスに帯電しているイオンは陽極28に到達する前に
トラップ13に捕捉される。従って異状放電を防止する
ことができる。In the above configuration, when the filament 22 is heated by the DC filament power supply 24, thermionic electrons 20 are emitted from the filament 22. The thermionic electrons 20 are accelerated by an accelerating voltage applied between the filament 22 and the anode 28 using an accelerating power source 26, and are further accelerated by a focusing coil 30.
An electron beam 2 with high energy density is focused by
It becomes 0. The electron beam 20 heats and melts the surface of the workpiece 10, and welding progresses. The gases generated in the workpiece and the oxides on the surface of the alloy component 1 that easily evaporate are heated to a high temperature, rise along the electron beam 20, go straight toward the anode 28 and the cathode 50, and pass through the anode 28. .. This causes abnormal discharge between the cathodes 50. In the present invention, since a negative potential is applied to the trap 13 for positively charged ions in the gas 21 that cause abnormal discharge, the electrostatic attraction force of the trap 13 causes the positively charged ions to be positively charged. The charged ions are trapped in the trap 13 before reaching the anode 28. Therefore, abnormal discharge can be prevented.
〔発明の効果〕 以上述べた如く1本発明は、型銑
子ビーム溶接をする電子妻内に簡単な構造よりなるトラ
ップを設け、該トラップにマイナス電位を印加すること
により電子傍白の異状放電を大巾に減小させることがで
き、電子ビーム溶接の加工精度を向上させることができ
る効果がある。[Effects of the Invention] As described above, the present invention provides a trap with a simple structure in the electron girdle for die piggy beam welding, and applies a negative potential to the trap to prevent abnormal discharge of electron interference. This has the effect of greatly reducing the width and improving the processing accuracy of electron beam welding.
添付図面は本発明の実施例の構成を示すプロツリ図であ
る。
10・・・被加工材、12・・・溶接箇所、13・・・
トラップ20・・電子ビーム、21・・発生ガス、22
・・フィラメント、26 加速電流、28・・陽極、
30・・・集束コイル36・・・電源、50・・・陰
極、52・・バイアス電源−53・・・真空室。The accompanying drawings are schematic diagrams showing the configuration of an embodiment of the present invention. 10... Work material, 12... Welding location, 13...
Trap 20...electron beam, 21...generated gas, 22
... filament, 26 accelerating current, 28... anode,
30... Focusing coil 36... Power supply, 50... Cathode, 52... Bias power supply - 53... Vacuum chamber.
Claims (1)
して加速する陰極および陽極と、加速された電子ビーム
を集束する集束コイルとにより構成した電子ビーム溶接
装置において、前記集束コイルと陽極間の電子ビーム通
路にマイナスの電位を印加したトラップを設けたことを
特徴とする電子ビーム溶接装置。In an electron beam welding device comprising a filament that generates an electron beam, a cathode and an anode that accelerate through the electron beam, and a focusing coil that focuses the accelerated electron beam, there is a negative electrode in the electron beam path between the focusing coil and the anode. An electron beam welding device characterized by being provided with a trap to which a potential of is applied.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12819585A JPS61288361A (en) | 1985-06-14 | 1985-06-14 | Electron beam welding device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12819585A JPS61288361A (en) | 1985-06-14 | 1985-06-14 | Electron beam welding device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61288361A true JPS61288361A (en) | 1986-12-18 |
Family
ID=14978804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12819585A Pending JPS61288361A (en) | 1985-06-14 | 1985-06-14 | Electron beam welding device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61288361A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011036896A (en) * | 2009-08-17 | 2011-02-24 | Mitsubishi Heavy Ind Ltd | Electron beam welding equipment |
CN104827177A (en) * | 2015-05-29 | 2015-08-12 | 哈尔滨工业大学 | Low-voltage high-current-beam electron beam vacuum welding device and method |
-
1985
- 1985-06-14 JP JP12819585A patent/JPS61288361A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011036896A (en) * | 2009-08-17 | 2011-02-24 | Mitsubishi Heavy Ind Ltd | Electron beam welding equipment |
CN104827177A (en) * | 2015-05-29 | 2015-08-12 | 哈尔滨工业大学 | Low-voltage high-current-beam electron beam vacuum welding device and method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4714860A (en) | Ion beam generating apparatus | |
US4541890A (en) | Hall ion generator for working surfaces with a low energy high intensity ion beam | |
US3218431A (en) | Self-focusing electron beam apparatus | |
US3174026A (en) | Method and means of circumventing cathode maintenance in electron beam devices | |
JPS61288361A (en) | Electron beam welding device | |
US20030080301A1 (en) | Ion implantation systems and methods utilizing a downstream gas source | |
JP3325393B2 (en) | Method and apparatus for producing ionic aluminum | |
US4939425A (en) | Four-electrode ion source | |
JP3254282B2 (en) | Pulsed ion beam generation method | |
JPH0473847A (en) | Electron radiation device | |
Yoshida et al. | Grid-controlled extraction of low-charged ions from a laser ion source | |
RU2777038C1 (en) | Gas-discharge cathode-beam gun | |
JP2605031B2 (en) | Electron beam excited ion source | |
JP2778227B2 (en) | Ion source | |
JPH0145068Y2 (en) | ||
JPH089776B2 (en) | Ion plating method and apparatus | |
JPS6221474A (en) | Electron beam machine | |
Gavrilov et al. | Formation of intense convergent particle beams in a gas-discharge-plasma-emitter diode | |
JPS6331703Y2 (en) | ||
Burdovitsin et al. | Plasma Electron Sources | |
JPS6237858A (en) | Triggering device for electron beam welder | |
JPH06176723A (en) | Electron beam generating device | |
JPH04106849A (en) | Processing apparatus | |
JPH0447422B2 (en) | ||
JPS5871544A (en) | Material treatment device by electron beam |