JPH0315735B2 - - Google Patents

Info

Publication number
JPH0315735B2
JPH0315735B2 JP9371682A JP9371682A JPH0315735B2 JP H0315735 B2 JPH0315735 B2 JP H0315735B2 JP 9371682 A JP9371682 A JP 9371682A JP 9371682 A JP9371682 A JP 9371682A JP H0315735 B2 JPH0315735 B2 JP H0315735B2
Authority
JP
Japan
Prior art keywords
substrate
container
waste liquid
exhaust
bowl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9371682A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58209744A (ja
Inventor
Masaru Kitagawa
Noriaki Mori
Akio Tsucha
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP9371682A priority Critical patent/JPS58209744A/ja
Publication of JPS58209744A publication Critical patent/JPS58209744A/ja
Publication of JPH0315735B2 publication Critical patent/JPH0315735B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9371682A 1982-05-31 1982-05-31 回転式表面処理装置 Granted JPS58209744A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9371682A JPS58209744A (ja) 1982-05-31 1982-05-31 回転式表面処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9371682A JPS58209744A (ja) 1982-05-31 1982-05-31 回転式表面処理装置

Publications (2)

Publication Number Publication Date
JPS58209744A JPS58209744A (ja) 1983-12-06
JPH0315735B2 true JPH0315735B2 (it) 1991-03-01

Family

ID=14090134

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9371682A Granted JPS58209744A (ja) 1982-05-31 1982-05-31 回転式表面処理装置

Country Status (1)

Country Link
JP (1) JPS58209744A (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6377569A (ja) * 1986-09-19 1988-04-07 Dainippon Screen Mfg Co Ltd 基板の回転式表面処理装置
JPS63136523A (ja) * 1986-11-27 1988-06-08 Nec Yamagata Ltd 半導体製造装置

Also Published As

Publication number Publication date
JPS58209744A (ja) 1983-12-06

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