JPH029464B2 - - Google Patents

Info

Publication number
JPH029464B2
JPH029464B2 JP55048776A JP4877680A JPH029464B2 JP H029464 B2 JPH029464 B2 JP H029464B2 JP 55048776 A JP55048776 A JP 55048776A JP 4877680 A JP4877680 A JP 4877680A JP H029464 B2 JPH029464 B2 JP H029464B2
Authority
JP
Japan
Prior art keywords
diffusion layer
diode
mask
conductivity type
diffusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55048776A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55141762A (en
Inventor
Barudoman Anri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of JPS55141762A publication Critical patent/JPS55141762A/ja
Publication of JPH029464B2 publication Critical patent/JPH029464B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • H01L29/868PIN diodes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/983Zener diodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
JP4877680A 1979-04-20 1980-04-15 Electron avalanche diode and method of fabricating same Granted JPS55141762A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7910065A FR2454704A1 (fr) 1979-04-20 1979-04-20 Diode a avalanche de type planar a tension de claquage comprise entre 4 et 8 volts

Publications (2)

Publication Number Publication Date
JPS55141762A JPS55141762A (en) 1980-11-05
JPH029464B2 true JPH029464B2 (US07935154-20110503-C00018.png) 1990-03-02

Family

ID=9224549

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4877680A Granted JPS55141762A (en) 1979-04-20 1980-04-15 Electron avalanche diode and method of fabricating same

Country Status (5)

Country Link
US (1) US4323909A (US07935154-20110503-C00018.png)
EP (1) EP0018862B1 (US07935154-20110503-C00018.png)
JP (1) JPS55141762A (US07935154-20110503-C00018.png)
DE (1) DE3069258D1 (US07935154-20110503-C00018.png)
FR (1) FR2454704A1 (US07935154-20110503-C00018.png)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0043734B1 (en) * 1980-07-08 1985-10-16 Fujitsu Limited Avalanche photodiodes
NL187942C (nl) * 1980-08-18 1992-02-17 Philips Nv Zenerdiode en werkwijze ter vervaardiging daarvan.
US4999683A (en) * 1988-12-30 1991-03-12 Sanken Electric Co., Ltd. Avalanche breakdown semiconductor device
US5150176A (en) * 1992-02-13 1992-09-22 Motorola, Inc. PN junction surge suppressor structure with moat
US20050275065A1 (en) * 2004-06-14 2005-12-15 Tyco Electronics Corporation Diode with improved energy impulse rating
JP6642507B2 (ja) * 2016-10-18 2020-02-05 株式会社デンソー 半導体装置およびその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5144387A (ja) * 1974-10-01 1976-04-15 Satoji Shimizu Tajikutatsupumashiin no tatsupusetsusonkenchisochi
JPS5264883A (en) * 1975-11-26 1977-05-28 Fuji Electric Co Ltd Semiconductor element

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3391287A (en) * 1965-07-30 1968-07-02 Westinghouse Electric Corp Guard junctions for p-nu junction semiconductor devices
US4030117A (en) * 1975-03-10 1977-06-14 International Telephone And Telegraph Corporation Zener diode
US4075649A (en) * 1975-11-25 1978-02-21 Siemens Corporation Single chip temperature compensated reference diode and method for making same
CA1080836A (en) * 1977-09-21 1980-07-01 Paul P. Webb Multi-element avalanche photodiode having reduced electrical noise

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5144387A (ja) * 1974-10-01 1976-04-15 Satoji Shimizu Tajikutatsupumashiin no tatsupusetsusonkenchisochi
JPS5264883A (en) * 1975-11-26 1977-05-28 Fuji Electric Co Ltd Semiconductor element

Also Published As

Publication number Publication date
EP0018862A1 (fr) 1980-11-12
JPS55141762A (en) 1980-11-05
US4323909A (en) 1982-04-06
FR2454704B1 (US07935154-20110503-C00018.png) 1982-06-04
DE3069258D1 (en) 1984-10-31
EP0018862B1 (fr) 1984-09-26
FR2454704A1 (fr) 1980-11-14

Similar Documents

Publication Publication Date Title
US4742377A (en) Schottky barrier device with doped composite guard ring
US4638551A (en) Schottky barrier device and method of manufacture
KR100330847B1 (ko) 반절연층을갖는반도체장치
EP0341075B1 (en) Symmetrical blocking high voltage breakdown semiconductor device and method of fabrication
KR900008146B1 (ko) 반도체 정류기 및 그 제조방법
JPS5840345B2 (ja) サイリスタ
US3984859A (en) High withstand voltage semiconductor device with shallow grooves between semiconductor region and field limiting rings with outer mesa groove
US4419681A (en) Zener diode
US4473941A (en) Method of fabricating zener diodes
US4999684A (en) Symmetrical blocking high voltage breakdown semiconducotr device
KR100503936B1 (ko) 반도체장치
JPH029464B2 (US07935154-20110503-C00018.png)
US4215358A (en) Mesa type semiconductor device
US4987459A (en) Variable capacitance diode element having wide capacitance variation range
US7365391B2 (en) Semiconductor device and method for manufacturing thereof
JPH06268202A (ja) 高耐圧炭化珪素ショットキ−・ダイオ−ド
JP2919405B2 (ja) シリコン・ゲルマニウム層の最適な配置構成を有する高電圧シリコン・ダイオード
JPH10233515A (ja) ショットキーバリア半導体装置とその製造方法
US4881115A (en) Bipolar semiconductor device having a conductive recombination layer
US4125415A (en) Method of making high voltage semiconductor structure
JP2678550B2 (ja) 基準ダイオード及び保護ダイオードを持つツェナーダイオード
EP1184908B1 (en) Field effect transistor
JPH08227897A (ja) 半導体装置およびその製法
KR100520662B1 (ko) 반도체장치
WO2000074130A1 (en) Discrete schottky diode device with reduced leakage current