JPH0260231B2 - - Google Patents
Info
- Publication number
- JPH0260231B2 JPH0260231B2 JP60195947A JP19594785A JPH0260231B2 JP H0260231 B2 JPH0260231 B2 JP H0260231B2 JP 60195947 A JP60195947 A JP 60195947A JP 19594785 A JP19594785 A JP 19594785A JP H0260231 B2 JPH0260231 B2 JP H0260231B2
- Authority
- JP
- Japan
- Prior art keywords
- bonding
- layer
- etching
- etching mask
- junction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005530 etching Methods 0.000 claims description 55
- 239000000470 constituent Substances 0.000 claims description 26
- 238000004519 manufacturing process Methods 0.000 claims description 22
- 230000004888 barrier function Effects 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 5
- 239000002887 superconductor Substances 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 description 9
- 239000010955 niobium Substances 0.000 description 9
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 230000010354 integration Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N69/00—Integrated devices, or assemblies of multiple devices, comprising at least one superconducting element covered by group H10N60/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0912—Manufacture or treatment of Josephson-effect devices
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60195947A JPS6257264A (ja) | 1985-09-06 | 1985-09-06 | 超伝導集積回路の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60195947A JPS6257264A (ja) | 1985-09-06 | 1985-09-06 | 超伝導集積回路の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6257264A JPS6257264A (ja) | 1987-03-12 |
| JPH0260231B2 true JPH0260231B2 (enrdf_load_stackoverflow) | 1990-12-14 |
Family
ID=16349621
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60195947A Granted JPS6257264A (ja) | 1985-09-06 | 1985-09-06 | 超伝導集積回路の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6257264A (enrdf_load_stackoverflow) |
-
1985
- 1985-09-06 JP JP60195947A patent/JPS6257264A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6257264A (ja) | 1987-03-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |