JPH0257551U - - Google Patents
Info
- Publication number
- JPH0257551U JPH0257551U JP13729188U JP13729188U JPH0257551U JP H0257551 U JPH0257551 U JP H0257551U JP 13729188 U JP13729188 U JP 13729188U JP 13729188 U JP13729188 U JP 13729188U JP H0257551 U JPH0257551 U JP H0257551U
- Authority
- JP
- Japan
- Prior art keywords
- ion
- basic operating
- recipe
- beam current
- beam energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005468 ion implantation Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988137291U JP2530398Y2 (ja) | 1988-10-20 | 1988-10-20 | イオン注入装置の制御装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988137291U JP2530398Y2 (ja) | 1988-10-20 | 1988-10-20 | イオン注入装置の制御装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0257551U true JPH0257551U (enrdf_load_html_response) | 1990-04-25 |
JP2530398Y2 JP2530398Y2 (ja) | 1997-03-26 |
Family
ID=31398582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1988137291U Expired - Lifetime JP2530398Y2 (ja) | 1988-10-20 | 1988-10-20 | イオン注入装置の制御装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2530398Y2 (enrdf_load_html_response) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003178708A (ja) * | 2001-12-10 | 2003-06-27 | Nissin Electric Co Ltd | イオン注入装置 |
JP2007048588A (ja) * | 2005-08-10 | 2007-02-22 | Jeol Ltd | ガス流量設定方法およびイオンビーム加工装置 |
CN102237244A (zh) * | 2010-04-28 | 2011-11-09 | 日新离子机器株式会社 | 设定束电流密度分布的调整目标的方法和离子注入装置 |
JP2018147653A (ja) * | 2017-03-03 | 2018-09-20 | 日本電子株式会社 | 荷電粒子線装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5617194A (en) * | 1979-07-17 | 1981-02-18 | Daihen Corp | Method and apparatus for charged particle beam working |
JPS62117248A (ja) * | 1985-11-18 | 1987-05-28 | Tokyo Electron Ltd | イオン注入システム |
-
1988
- 1988-10-20 JP JP1988137291U patent/JP2530398Y2/ja not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5617194A (en) * | 1979-07-17 | 1981-02-18 | Daihen Corp | Method and apparatus for charged particle beam working |
JPS62117248A (ja) * | 1985-11-18 | 1987-05-28 | Tokyo Electron Ltd | イオン注入システム |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003178708A (ja) * | 2001-12-10 | 2003-06-27 | Nissin Electric Co Ltd | イオン注入装置 |
JP2007048588A (ja) * | 2005-08-10 | 2007-02-22 | Jeol Ltd | ガス流量設定方法およびイオンビーム加工装置 |
CN102237244A (zh) * | 2010-04-28 | 2011-11-09 | 日新离子机器株式会社 | 设定束电流密度分布的调整目标的方法和离子注入装置 |
JP2018147653A (ja) * | 2017-03-03 | 2018-09-20 | 日本電子株式会社 | 荷電粒子線装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2530398Y2 (ja) | 1997-03-26 |