JPH0250600B2 - - Google Patents
Info
- Publication number
- JPH0250600B2 JPH0250600B2 JP60012510A JP1251085A JPH0250600B2 JP H0250600 B2 JPH0250600 B2 JP H0250600B2 JP 60012510 A JP60012510 A JP 60012510A JP 1251085 A JP1251085 A JP 1251085A JP H0250600 B2 JPH0250600 B2 JP H0250600B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- discharge
- short circuit
- electrode
- discharge switch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/007—Production of X-ray radiation generated from plasma involving electric or magnetic fields in the process of plasma generation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60012510A JPS61173496A (ja) | 1985-01-28 | 1985-01-28 | プラズマx線発生装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60012510A JPS61173496A (ja) | 1985-01-28 | 1985-01-28 | プラズマx線発生装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61173496A JPS61173496A (ja) | 1986-08-05 |
| JPH0250600B2 true JPH0250600B2 (enExample) | 1990-11-02 |
Family
ID=11807339
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60012510A Granted JPS61173496A (ja) | 1985-01-28 | 1985-01-28 | プラズマx線発生装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61173496A (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2241116C (en) | 1998-06-19 | 2009-08-25 | Liyan Zhang | Radiation (e.g. x-ray pulse) generator mechanisms |
| EP1756742A2 (en) | 2004-05-28 | 2007-02-28 | Philips Intellectual Property & Standards GmbH | System for the noninvasive determination of tracer concentration in blood |
| DE102004058500A1 (de) * | 2004-12-04 | 2006-06-08 | Philips Intellectual Property & Standards Gmbh | Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung |
| US20090091273A1 (en) * | 2005-05-06 | 2009-04-09 | Tokyo Institute Of Technology | Light source for generating extreme ultraviolet light from plasma |
| US7502446B2 (en) | 2005-10-18 | 2009-03-10 | Alft Inc. | Soft x-ray generator |
| JP6303894B2 (ja) * | 2014-07-28 | 2018-04-04 | 株式会社Ihi | プラズマ光源システム |
-
1985
- 1985-01-28 JP JP60012510A patent/JPS61173496A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61173496A (ja) | 1986-08-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |