JPS61173496A - プラズマｘ線発生装置 - Google Patents

プラズマｘ線発生装置

Info

Publication number
JPS61173496A
JPS61173496A JP60012510A JP1251085A JPS61173496A JP S61173496 A JPS61173496 A JP S61173496A JP 60012510 A JP60012510 A JP 60012510A JP 1251085 A JP1251085 A JP 1251085A JP S61173496 A JPS61173496 A JP S61173496A
Authority
JP
Japan
Prior art keywords
plasma
electrode
short circuit
discharge
short
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60012510A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0250600B2 (enExample
Inventor
Ikuo Okada
岡田　育夫
Yasunao Saito
斉藤　保直
Hideo Yoshihara
秀雄 吉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP60012510A priority Critical patent/JPS61173496A/ja
Publication of JPS61173496A publication Critical patent/JPS61173496A/ja
Publication of JPH0250600B2 publication Critical patent/JPH0250600B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/007—Production of X-ray radiation generated from plasma involving electric or magnetic fields in the process of plasma generation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60012510A 1985-01-28 1985-01-28 プラズマｘ線発生装置 Granted JPS61173496A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60012510A JPS61173496A (ja) 1985-01-28 1985-01-28 プラズマｘ線発生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60012510A JPS61173496A (ja) 1985-01-28 1985-01-28 プラズマｘ線発生装置

Publications (2)

Publication Number Publication Date
JPS61173496A true JPS61173496A (ja) 1986-08-05
JPH0250600B2 JPH0250600B2 (enExample) 1990-11-02

Family

ID=11807339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60012510A Granted JPS61173496A (ja) 1985-01-28 1985-01-28 プラズマｘ線発生装置

Country Status (1)

Country Link
JP (1) JPS61173496A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6240163B1 (en) 1998-06-19 2001-05-29 Advanced Laser & Fusion Technology Radiation E.G. X-ray pulse generator mechanisms
WO2006059275A2 (en) 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Method and apparatus for operating an electrical discharge device
WO2006120942A1 (ja) * 2005-05-06 2006-11-16 Tokyo Institute Of Technology プラズマ発生装置及びプラズマ発生方法
WO2007066239A3 (en) * 2005-10-18 2007-11-22 Alft Inc Soft x-ray generator
US8617072B2 (en) 2004-05-28 2013-12-31 Koninklijke Philips N.V. System for the noninvasive determination of tracer concentration in blood
JP2016031796A (ja) * 2014-07-28 2016-03-07 株式会社Ihi プラズマ光源システム

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6240163B1 (en) 1998-06-19 2001-05-29 Advanced Laser & Fusion Technology Radiation E.G. X-ray pulse generator mechanisms
US8617072B2 (en) 2004-05-28 2013-12-31 Koninklijke Philips N.V. System for the noninvasive determination of tracer concentration in blood
US20090173896A1 (en) * 2004-12-04 2009-07-09 Koninklijke Philips Electronics, N.V. Method and apparatus for operating an electricl discharge device
WO2006059275A2 (en) 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Method and apparatus for operating an electrical discharge device
WO2006059275A3 (en) * 2004-12-04 2006-08-31 Philips Intellectual Property Method and apparatus for operating an electrical discharge device
JP2008522379A (ja) * 2004-12-04 2008-06-26 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 電気放電装置を動作させる方法及び機器
US8227777B2 (en) * 2004-12-04 2012-07-24 Koninklijke Philips Electronics N.V. Method and apparatus for operating an electrical discharge device
WO2006120942A1 (ja) * 2005-05-06 2006-11-16 Tokyo Institute Of Technology プラズマ発生装置及びプラズマ発生方法
JP5114711B2 (ja) * 2005-05-06 2013-01-09 国立大学法人東京工業大学 プラズマ発生装置及びプラズマ発生方法
JP2009512173A (ja) * 2005-10-18 2009-03-19 アルフト インコーポレイテッド 軟ｘ線発生器
US7502446B2 (en) 2005-10-18 2009-03-10 Alft Inc. Soft x-ray generator
WO2007066239A3 (en) * 2005-10-18 2007-11-22 Alft Inc Soft x-ray generator
JP2016031796A (ja) * 2014-07-28 2016-03-07 株式会社Ihi プラズマ光源システム

Also Published As

Publication number Publication date
JPH0250600B2 (enExample) 1990-11-02

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term