JPH02500823A - 反応容器の各種反応ガス用ガス入口 - Google Patents

反応容器の各種反応ガス用ガス入口

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JPH02500823A
JPH02500823A JP63505415A JP50541588A JPH02500823A JP H02500823 A JPH02500823 A JP H02500823A JP 63505415 A JP63505415 A JP 63505415A JP 50541588 A JP50541588 A JP 50541588A JP H02500823 A JPH02500823 A JP H02500823A
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ユルゲンセン　ホルガー
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アイクストロン　ゲーエムベーハー
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Abstract

(57)【要約】本公報は電子出願前の出願データであるため要約のデータは記録されません。

Description

【発明の詳細な説明】 発明の名称 反応容器の各種反応ガス用ガス入口 技術分野 本発明は、反応容器の断面より本質的に小さい断面の供給管を備え、高い流速で ガスを流す反応容器の各種反応ガス用ガス入口に関する。
先行技術 かかるガス入口は例えばＭＯＣＶＤ反応管やその他の半導体製造用反応管でも必 要となる。その際一般に発生する問題として、断面の比較的狭い供給管を通して 供給した単数又は複数のガス流をできるだけ均一に死容積なしに大きな横断面に 拡散させねばならない。これは特にガス流の「切換え」によりできるだけ「鮮鋭 」な膜境界を生成すべき場合大切である。
発明の説明 本発明は、請求の範囲１の前提部分に記載した反応容器の各種反応ガス用ガス入 口を、単数又は複数のガス流ができるだけ均一に死容積なしに比較的大きな横断 面に拡散できるよう改良することを課題とする。
この課題の本発明による解決法がその諸展開とともに請求の範囲に明示しである 。
本発明によれば、ガス入口は二次曲面状内側輪郭の部分を有し、該部分は断面を 反応容器の断面に適合させ、貫流させる反応容器の一端に配置しである。個々の 供給管は二次曲面状内側輪郭を有する部分の概ね焦点で合流し、供給管のガス流 出口は二次曲面状部分の頂点を向いている。
これにより、供給管のガス流出口から高速で流出する「薄い」ガス噴流が二次曲 面状内側輪郭により°「幾何光学の法則に事実上従って」均一に死容積なしに拡 散される。
本発明の諸展開が従属請求の範囲に明示しである。
請求の範囲２に明示した供給管の放射状配置により、拡散ガス流の均一性を乱す ことなく複数のガス種を（同時及び／又は「逐次」）導入することができる。
実際的用途に関し、二次曲面状部分の内側輪郭、つまり二次曲面形状を半球に近 づけると、拡散ガス噴流の均一性が十二分に得られる。
請求の範囲４に明示した措置により、ガス流は反応管の断面全体に噴霧され、従 って均一化が一層進む。
図面の簡単な説明 以下図面を参考に本発明の１実施例を詳しく説明する。図は本発明によるガス入 口の横断面を示す。
図面中に＝単位で記入した寸法は単なる１例と理解すべきであり、本発明を限定 するものでないことをはっきり指摘しておく。
実施例の説明 本発明によるガス入口は本体１を有し、これにフランジ２が設けである。フラン ジ２は本体１を図示省略した反応管、例えば同じ日に提出した特許出願ｒＭＯｃ ＶＤ装置用石英ガラス反応管」に記載しであるような反応管と結合するのに役立 つ。
本体１内に設けた凹部３が「後側」閉鎖面４を有し、その形状は図示実施例の場 合半球形である。
更にガス供給管が放射状に配置して設けであるが、そのうち図面には２本の導管 ５．６のみ図示しである。
供給管５，６が流出ロア、８を有し、これは半球面４のほぼ中心に位置する。流 出口の縁が「切欠」いであるので、流出ガス流は一部「噴霧」される。
本発明によるガス入口は次のように働く：流出ロア又は８から高速で流出するガ ス流は穴の縁構造により一部噴霧されて面４の範囲に衝突する。高速で流出する ガス流はこの面４で「幾何光学の法則に事実上従って」反射し、その結果均一に 拡散され、穴７．８から「向流で」流出するガス流により再び噴霧され、そして フランジ２の穴から図示省略した反応管に流入する。
以上１実施例に基づき、一般的発明思想を制限することなく本発明を説明したが 、その枠内で各種の変形態様も勿論可能である。
例えば、球形面に代え円錐切断面（二次曲面状内側輪郭）、例えば放物面も使用 することができる。しかし本件の場合、幾何光学の方から知られているこの有利 な改良球面がもたらす利点は小さい。
ガス送入管は任意の数に高めることができる。放射状配置によりどのガス流も条 件が同じになり、特にガスが断面全体に均一に分布することになる。
従って本発明によるガス入口は迅速に「切換え」ねばならない各種ガス流を連続 して送入するのに適しているだけでなく、均一に拡散させ十分に混合しなげれば ならない複数のガス流を同時に送入するのにも適している。
国際調査報告 国際調査報告 Ｃミεε００３９９ ＳＡ　２２９４０

Claims (4)

    【特許請求の範囲】
  1. １．反応容器の断面より本質的に小さい断面の供給管を備え、高い流速でガスを 流す反応容器の各種反応ガス用ガス入口において、 −ガス入口が二次曲面状内側輪郭の部分を有し、その断面が反応容器の断面に適 合しており、該部分が、貫流させる反応容器の一端に配置してある；一個々の供 給管が、二次曲面状内側輪郭を有する部分の概ね焦点で合流している； 一供給管のガス流出口が二次曲面状部分の頂点を向いている 以上の特徴の組合せを特徴とするガス入口。
  2. ２．請求の範囲１記載のガス入口において、供給管を「放射状」に配置したこと を特徴とするガス入口。
  3. ３．請求の範囲１又は２記載のガス入口において、二次曲面形状を半球に近づけ たことを特徴とするガス入口。
  4. ４．請求の範囲１乃至３のいずれか１項記載のガス入口において、供給管のガス 流出口がガス流を噴霧することを特徴とするガス入口。
JP63505415A 1987-06-30 1988-06-30 反応容器の各種反応ガス用ガス入口 Expired - Fee Related JP2668258B2 (ja)

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DE19873721637 DE3721637A1 (de) 1987-06-30 1987-06-30 Gaseinlass fuer eine mehrzahl verschiedener reaktionsgase in reaktionsgefaesse
DE3721637.6 1987-06-30

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JPH02500823A true JPH02500823A (ja) 1990-03-22
JP2668258B2 JP2668258B2 (ja) 1997-10-27

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US (1) US5441703A (ja)
EP (1) EP0324811B1 (ja)
JP (1) JP2668258B2 (ja)
DE (2) DE3721637A1 (ja)
WO (1) WO1989000080A1 (ja)

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EP0324811B1 (de) 1992-04-01
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DE3721637A1 (de) 1989-01-12
WO1989000080A1 (en) 1989-01-12
US5441703A (en) 1995-08-15
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