JPH0242060U - - Google Patents
Info
- Publication number
- JPH0242060U JPH0242060U JP11990788U JP11990788U JPH0242060U JP H0242060 U JPH0242060 U JP H0242060U JP 11990788 U JP11990788 U JP 11990788U JP 11990788 U JP11990788 U JP 11990788U JP H0242060 U JPH0242060 U JP H0242060U
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- cathode
- target
- anode
- sample chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Description
第１図は本案の一実施例の構成図である。
１……シールド板、２……ターゲツトベース材
（カソード）、３……ターゲツト、４……ガラス
、５……膜厚センサ、６……試料、７……試料台
、８……アノード。
FIG. 1 is a block diagram of an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Shield plate, 2... Target base material (cathode), 3... Target, 4... Glass, 5... Film thickness sensor, 6... Sample, 7... Sample stand, 8... Anode.
Claims (1)
試料室内に配置された一対のアノード、カソード
と、このカソードに装着されたターゲツトと、前
記アノード付近に配置された膜厚計センサと、こ
のセンサからの信号を処理する膜厚計と、前記ア
ノード、カソード間に電圧を印加する電源とを備
えたものにおいて、前記膜厚計でコーテイングレ
ートの変化からターゲツトの寿命を検知すること
を特徴とするターゲツト寿命表示付イオンスパツ
タリング装置。 A sample chamber, an exhaust system for evacuating the sample, a pair of anodes and a cathode disposed within the sample chamber, a target attached to the cathode, a film thickness gauge sensor disposed near the anode, and The device is equipped with a film thickness meter that processes signals from a sensor, and a power source that applies a voltage between the anode and cathode, characterized in that the film thickness meter detects the life of the target from changes in coating rate. Ion sputtering equipment with target life display.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11990788U JPH0242060U (en) | 1988-09-14 | 1988-09-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11990788U JPH0242060U (en) | 1988-09-14 | 1988-09-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0242060U true JPH0242060U (en) | 1990-03-23 |
Family
ID=31365549
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11990788U Pending JPH0242060U (en) | 1988-09-14 | 1988-09-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0242060U (en) |
-
1988
- 1988-09-14 JP JP11990788U patent/JPH0242060U/ja active Pending
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