JPS6373356U - - Google Patents

Info

Publication number
JPS6373356U
JPS6373356U JP16786286U JP16786286U JPS6373356U JP S6373356 U JPS6373356 U JP S6373356U JP 16786286 U JP16786286 U JP 16786286U JP 16786286 U JP16786286 U JP 16786286U JP S6373356 U JPS6373356 U JP S6373356U
Authority
JP
Japan
Prior art keywords
holder
target
frequency sputtering
high frequency
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16786286U
Other languages
Japanese (ja)
Other versions
JPH033574Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16786286U priority Critical patent/JPH033574Y2/ja
Publication of JPS6373356U publication Critical patent/JPS6373356U/ja
Application granted granted Critical
Publication of JPH033574Y2 publication Critical patent/JPH033574Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案に係る高周波スパツタ装置の概
略構成図、第2図は基板ホルダーを移動可能とし
た高周波スパツタ装置の要部拡大図、第3図は従
来の高周波スパツタ装置の概略図である。 尚、図面中1はチヤンバー、4は基板ホルダー
、5は基板、8は高周波電源、9はバツキングプ
レート、10はターゲツト、11はターゲツト押
え、12はカソードシールド、13は導電部材で
ある。
Fig. 1 is a schematic diagram of a high-frequency sputtering device according to the present invention, Fig. 2 is an enlarged view of the main parts of a high-frequency sputtering device with a movable substrate holder, and Fig. 3 is a schematic diagram of a conventional high-frequency sputtering device. . In the drawings, 1 is a chamber, 4 is a substrate holder, 5 is a substrate, 8 is a high frequency power source, 9 is a backing plate, 10 is a target, 11 is a target holder, 12 is a cathode shield, and 13 is a conductive member.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 基板ホルダーに保持された基板とバツキングプ
レートにターゲツト押えによつて保持されたター
ゲツトとをチヤンバー内にて対向配置せしめると
ともに、ターゲツト押えをカソードシールドで覆
うようにした高周波スパツタ装置において、前記
カソードシールドと基板ホルダーとは導電部材を
介して電気的に直接接続されていることを特徴と
する高周波スパツタ装置。
In a high frequency sputtering apparatus in which a substrate held by a substrate holder and a target held by a target holder on a backing plate are disposed facing each other in a chamber, and the target holder is covered with a cathode shield, the cathode shield A high frequency sputtering device characterized in that the and substrate holder are directly electrically connected via a conductive member.
JP16786286U 1986-10-31 1986-10-31 Expired JPH033574Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16786286U JPH033574Y2 (en) 1986-10-31 1986-10-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16786286U JPH033574Y2 (en) 1986-10-31 1986-10-31

Publications (2)

Publication Number Publication Date
JPS6373356U true JPS6373356U (en) 1988-05-16
JPH033574Y2 JPH033574Y2 (en) 1991-01-30

Family

ID=31100195

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16786286U Expired JPH033574Y2 (en) 1986-10-31 1986-10-31

Country Status (1)

Country Link
JP (1) JPH033574Y2 (en)

Also Published As

Publication number Publication date
JPH033574Y2 (en) 1991-01-30

Similar Documents

Publication Publication Date Title
JPS6373356U (en)
JPS62148570U (en)
JPS6413119U (en)
JPS60185656U (en) High frequency sputtering device
JPS6373359U (en)
JPS6356256U (en)
JPS61188352U (en)
JPS59103756U (en) Electrode for high frequency plasma excitation
JPS62152435U (en)
JPH0378057U (en)
JPS63186765U (en)
JPH0378055U (en)
JPS6286690U (en)
JPS6221065U (en)
JPS62104436U (en)
JPS6346465U (en)
JPS63140060U (en)
JPS63187326U (en)
JPS63170936U (en)
JPS5983971U (en) Ion plating device
JPH0354657U (en)
JPS63131757U (en)
JPS63183261U (en)
JPH047651U (en)
JPS63197332U (en)