JPS5983971U - Ion plating device - Google Patents

Ion plating device

Info

Publication number
JPS5983971U
JPS5983971U JP17966782U JP17966782U JPS5983971U JP S5983971 U JPS5983971 U JP S5983971U JP 17966782 U JP17966782 U JP 17966782U JP 17966782 U JP17966782 U JP 17966782U JP S5983971 U JPS5983971 U JP S5983971U
Authority
JP
Japan
Prior art keywords
electrodes
ion plating
choke coil
evaporation source
plating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17966782U
Other languages
Japanese (ja)
Inventor
渡辺　完治
Original Assignee
日本電子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電子株式会社 filed Critical 日本電子株式会社
Priority to JP17966782U priority Critical patent/JPS5983971U/en
Publication of JPS5983971U publication Critical patent/JPS5983971U/en
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

添付図は本考案の一実施例を示した高周波イオンブレー
ティング装置の概略図である。 １：被排気室、９Ａ、　　９Ｂ：熱電子用電極、１０：
放電開始電源、１１：チョークコイル、１２：バイメタ
ルスイッチ。The attached figure is a schematic diagram of a high frequency ion blating device showing an embodiment of the present invention. 1: Exhaust chamber, 9A, 9B: Thermionic electrode, 10:
Discharge starting power supply, 11: Choke coil, 12: Bimetal switch.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 被排気室内に配置された蒸発源と基板との間にグロー放
電を発生させ、蒸発源からの蒸発粒子をイオン化させる
様になした装置において、１対の電極、該電極にチョー
クコイルを介して電力を印加する為の電源、及び該電極
に流れる電流によって瞬時前記チョークコイルで発生し
た逆起電力を前記電極間に印加させる様に作動するスイ
ッチから成る放電開始装置を具備したイオンプレーティ
　　゛ング装置。In an apparatus that generates glow discharge between an evaporation source and a substrate placed in an evacuated chamber and ionizes evaporated particles from the evaporation source, a pair of electrodes is connected to the electrode via a choke coil. Ion plating equipped with a discharge starting device consisting of a power source for applying electric power, and a switch that operates so as to apply a back electromotive force instantaneously generated in the choke coil between the electrodes due to the current flowing through the electrodes. Device.
JP17966782U 1982-11-27 1982-11-27 Ion plating device Pending JPS5983971U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17966782U JPS5983971U (en) 1982-11-27 1982-11-27 Ion plating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17966782U JPS5983971U (en) 1982-11-27 1982-11-27 Ion plating device

Publications (1)

Publication Number Publication Date
JPS5983971U true JPS5983971U (en) 1984-06-06

Family

ID=30389768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17966782U Pending JPS5983971U (en) 1982-11-27 1982-11-27 Ion plating device

Country Status (1)

Country Link
JP (1) JPS5983971U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01201470A (en) * 1988-02-04 1989-08-14 Shinko Seiki Kk Ionizing device and ion plating device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01201470A (en) * 1988-02-04 1989-08-14 Shinko Seiki Kk Ionizing device and ion plating device

Similar Documents

Publication Publication Date Title
JPS5983971U (en) Ion plating device
JPS5969964U (en) Film forming equipment
JPS59107473U (en) Ion beam irradiation device
JPS5969966U (en) Glow discharge generator
JPS60140763U (en) plasma equipment
JPS59178898U (en) plasma generator
JPS6124469U (en) Ion plating device
JPS60160030U (en) High frequency power supply protection circuit
JPS58160262U (en) GD-CVD equipment
JPS5986700U (en) Discharge electrode for plasma equipment
JPS5818966U (en) sputtering equipment
JPS58125353U (en) Negative ion detection device
JPS59187136U (en) Semiconductor thin film forming equipment
JPS60185656U (en) High frequency sputtering device
JPS6292550U (en)
JPS61139562U (en)
JPS59103756U (en) Electrode for high frequency plasma excitation
JPS60151295U (en) Electrode for low temperature plasma generation
JPS5951061U (en) High frequency ion plating equipment
JPS6119764U (en) Hydrogen flame burner device for thin layer chromatography detection
JPS58144741U (en) Hot cathode heating device for electron gun
JPS58138258U (en) image tube device
JPS58160309U (en) Film thickness monitor
JPS6319745U (en)
JPS58120558U (en) Negative ion detection device