JPS59178898U - plasma generator - Google Patents

plasma generator

Info

Publication number
JPS59178898U
JPS59178898U JP7272483U JP7272483U JPS59178898U JP S59178898 U JPS59178898 U JP S59178898U JP 7272483 U JP7272483 U JP 7272483U JP 7272483 U JP7272483 U JP 7272483U JP S59178898 U JPS59178898 U JP S59178898U
Authority
JP
Japan
Prior art keywords
exhaust chamber
plasma
plate
generated
plasma generator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7272483U
Other languages
Japanese (ja)
Other versions
JPH0241168Y2 (en
Inventor
洋司 伊藤
Original Assignee
日本電子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電子株式会社 filed Critical 日本電子株式会社
Priority to JP7272483U priority Critical patent/JPS59178898U/en
Publication of JPS59178898U publication Critical patent/JPS59178898U/en
Application granted granted Critical
Publication of JPH0241168Y2 publication Critical patent/JPH0241168Y2/ja
Granted legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はプラズマ発生装置の一例として示した高周波イ
オンブレーティング装置の概略図、第2図は本考案の一
実施例を示した高周波イオンブレーティング装置の概略
図である。 1:排気室、4:高周波電極、7:整合回路、8:高周
波電源、11:真空管発信機、13ニブレート電源、1
9ニブレ一ト電流検出回路、20:比較回路、21:制
御回路、22ニゲリツト電流、検出回路、23:比較回
路、24:表示装置。
FIG. 1 is a schematic diagram of a high frequency ion blating device shown as an example of a plasma generating device, and FIG. 2 is a schematic diagram of a high frequency ion blating device showing one embodiment of the present invention. 1: Exhaust chamber, 4: High frequency electrode, 7: Matching circuit, 8: High frequency power supply, 11: Vacuum tube transmitter, 13 Nibrate power supply, 1
9 nigerit current detection circuit, 20: comparison circuit, 21: control circuit, 22 nigerit current detection circuit, 23: comparison circuit, 24: display device.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 排気室内に高周波電極を配置し、真空管発振機からの高
周波電力を整合回路を介して該電極に印加することによ
り該排気室内にプラズマを発生出来る様になした装置に
おいて、前記真空管発振機に流れるプレート電流及びも
しくはグリッド電流を検出する手段、該プレート電流及
びもしくはグリッド電流が基準値以上流れたとき、前記
発信機のプレート電源をオフさせる信号を発生する手段
を設けたプラズマ発生装置。
In an apparatus in which a high-frequency electrode is arranged in an exhaust chamber, and plasma is generated in the exhaust chamber by applying high-frequency power from a vacuum tube oscillator to the electrode via a matching circuit, the plasma is generated in the exhaust chamber. A plasma generation device comprising: means for detecting a plate current and/or a grid current; and means for generating a signal for turning off the plate power source of the transmitter when the plate current and/or the grid current flows in excess of a reference value.
JP7272483U 1983-05-16 1983-05-16 plasma generator Granted JPS59178898U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7272483U JPS59178898U (en) 1983-05-16 1983-05-16 plasma generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7272483U JPS59178898U (en) 1983-05-16 1983-05-16 plasma generator

Publications (2)

Publication Number Publication Date
JPS59178898U true JPS59178898U (en) 1984-11-29
JPH0241168Y2 JPH0241168Y2 (en) 1990-11-01

Family

ID=30202858

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7272483U Granted JPS59178898U (en) 1983-05-16 1983-05-16 plasma generator

Country Status (1)

Country Link
JP (1) JPS59178898U (en)

Also Published As

Publication number Publication date
JPH0241168Y2 (en) 1990-11-01

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