JPH0378057U - - Google Patents
Info
- Publication number
- JPH0378057U JPH0378057U JP13817889U JP13817889U JPH0378057U JP H0378057 U JPH0378057 U JP H0378057U JP 13817889 U JP13817889 U JP 13817889U JP 13817889 U JP13817889 U JP 13817889U JP H0378057 U JPH0378057 U JP H0378057U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- substrates
- substrate holder
- holds
- potential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims 2
Landscapes
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Description
第１図は本考案の一実施例を示す要部概略断面
図、第２図は従来例を示す第１図対応の断面図で
ある。
１……基板ホルダ、４……基板、８……ＲＦ電
源装置、Ａ……放電領域。
FIG. 1 is a schematic sectional view of a main part showing an embodiment of the present invention, and FIG. 2 is a sectional view corresponding to FIG. 1 showing a conventional example. 1...Substrate holder, 4...Substrate, 8...RF power supply device, A...Discharge area.
Claims (1)
し、この基板ホルダの作動を通じて各基板を順次
に放電領域に臨ませることにより全ての基板に対
する逆スパツタリングを完了できるように構成さ
れたものにおいて、放電位置に配設される基板に
偏在的にＲＦ電位を与え得るように設けたことを
特徴とするスパツタリング装置。 A movable substrate holder that holds a plurality of substrates, and is configured such that reverse sputtering for all substrates can be completed by sequentially bringing each substrate to the discharge area through operation of the substrate holder, A sputtering device characterized in that it is provided so as to be able to unevenly apply an RF potential to a substrate disposed at a discharge position.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13817889U JPH0378057U (en) | 1989-11-28 | 1989-11-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13817889U JPH0378057U (en) | 1989-11-28 | 1989-11-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0378057U true JPH0378057U (en) | 1991-08-07 |
Family
ID=31685298
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13817889U Pending JPH0378057U (en) | 1989-11-28 | 1989-11-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0378057U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008057227A (en) * | 2006-08-31 | 2008-03-13 | Hitachi Housetec Co Ltd | Bathroom unit |
-
1989
- 1989-11-28 JP JP13817889U patent/JPH0378057U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008057227A (en) * | 2006-08-31 | 2008-03-13 | Hitachi Housetec Co Ltd | Bathroom unit |