JPH0241894B2 - - Google Patents
Info
- Publication number
- JPH0241894B2 JPH0241894B2 JP875784A JP875784A JPH0241894B2 JP H0241894 B2 JPH0241894 B2 JP H0241894B2 JP 875784 A JP875784 A JP 875784A JP 875784 A JP875784 A JP 875784A JP H0241894 B2 JPH0241894 B2 JP H0241894B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- resist
- coating
- forming
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 14
- 150000001768 cations Chemical class 0.000 claims description 4
- 238000010894 electron beam technology Methods 0.000 claims description 4
- 239000000178 monomer Substances 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- 239000010408 film Substances 0.000 description 26
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 4
- 125000001165 hydrophobic group Chemical group 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- LLCSWKVOHICRDD-UHFFFAOYSA-N buta-1,3-diyne Chemical group C#CC#C LLCSWKVOHICRDD-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/165—Monolayers, e.g. Langmuir-Blodgett
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP875784A JPS60153124A (ja) | 1984-01-20 | 1984-01-20 | 塗膜形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP875784A JPS60153124A (ja) | 1984-01-20 | 1984-01-20 | 塗膜形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60153124A JPS60153124A (ja) | 1985-08-12 |
| JPH0241894B2 true JPH0241894B2 (fr) | 1990-09-19 |
Family
ID=11701796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP875784A Granted JPS60153124A (ja) | 1984-01-20 | 1984-01-20 | 塗膜形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60153124A (fr) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0647093B2 (ja) * | 1986-08-01 | 1994-06-22 | 株式会社リコー | 半導性ないし導電性薄膜の製造方法 |
| JPH0653249B2 (ja) * | 1987-01-28 | 1994-07-20 | 松下電器産業株式会社 | 表面の酸化防止方法 |
| JPH0667981B2 (ja) * | 1988-04-28 | 1994-08-31 | 松下電器産業株式会社 | ポリアセチレン又はポリアセン型超長共役ポリマーの製造方法 |
| JP2667250B2 (ja) * | 1989-06-15 | 1997-10-27 | 松下電子工業株式会社 | 半導体装置の製造方法 |
-
1984
- 1984-01-20 JP JP875784A patent/JPS60153124A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60153124A (ja) | 1985-08-12 |
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