JPH0239086B2 - - Google Patents
Info
- Publication number
- JPH0239086B2 JPH0239086B2 JP60213129A JP21312985A JPH0239086B2 JP H0239086 B2 JPH0239086 B2 JP H0239086B2 JP 60213129 A JP60213129 A JP 60213129A JP 21312985 A JP21312985 A JP 21312985A JP H0239086 B2 JPH0239086 B2 JP H0239086B2
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- light
- processing chamber
- vacuum processing
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60213129A JPS6272127A (ja) | 1985-09-25 | 1985-09-25 | パタ−ン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60213129A JPS6272127A (ja) | 1985-09-25 | 1985-09-25 | パタ−ン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6272127A JPS6272127A (ja) | 1987-04-02 |
| JPH0239086B2 true JPH0239086B2 (Direct) | 1990-09-04 |
Family
ID=16634057
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60213129A Granted JPS6272127A (ja) | 1985-09-25 | 1985-09-25 | パタ−ン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6272127A (Direct) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2717855B2 (ja) * | 1989-07-11 | 1998-02-25 | 東京エレクトロン株式会社 | アッシング方法 |
| JPH03154330A (ja) * | 1989-11-13 | 1991-07-02 | Matsushita Electron Corp | 半導体装置の製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5933971B2 (ja) * | 1975-08-01 | 1984-08-20 | 株式会社日立製作所 | 回路パタ−ン形成方法及びその装置 |
| JPS57162330A (en) * | 1981-03-31 | 1982-10-06 | Kazuyuki Sugita | Dry formation of pattern or dry removal of resist pattern |
-
1985
- 1985-09-25 JP JP60213129A patent/JPS6272127A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6272127A (ja) | 1987-04-02 |
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