JPH0238728U - - Google Patents
Info
- Publication number
- JPH0238728U JPH0238728U JP11742388U JP11742388U JPH0238728U JP H0238728 U JPH0238728 U JP H0238728U JP 11742388 U JP11742388 U JP 11742388U JP 11742388 U JP11742388 U JP 11742388U JP H0238728 U JPH0238728 U JP H0238728U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- susceptor
- counterbore
- reactor
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000927 vapour-phase epitaxy Methods 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 125000002524 organometallic group Chemical group 0.000 claims 2
- 239000000463 material Substances 0.000 claims 1
- 238000001947 vapour-phase growth Methods 0.000 claims 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11742388U JPH0238728U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-09-08 | 1988-09-08 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11742388U JPH0238728U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-09-08 | 1988-09-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0238728U true JPH0238728U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-03-15 |
Family
ID=31360871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11742388U Pending JPH0238728U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-09-08 | 1988-09-08 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0238728U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002231645A (ja) * | 2001-02-02 | 2002-08-16 | Ngk Insulators Ltd | 窒化物半導体膜の製造方法 |
JP2009252969A (ja) * | 2008-04-04 | 2009-10-29 | Sumitomo Electric Ind Ltd | サセプタおよび気相成長装置 |
-
1988
- 1988-09-08 JP JP11742388U patent/JPH0238728U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002231645A (ja) * | 2001-02-02 | 2002-08-16 | Ngk Insulators Ltd | 窒化物半導体膜の製造方法 |
JP2009252969A (ja) * | 2008-04-04 | 2009-10-29 | Sumitomo Electric Ind Ltd | サセプタおよび気相成長装置 |