JPH0238567A - Planetary rotary jig for vacuum vapor deposition apparatus - Google Patents

Planetary rotary jig for vacuum vapor deposition apparatus

Info

Publication number
JPH0238567A
JPH0238567A JP18765488A JP18765488A JPH0238567A JP H0238567 A JPH0238567 A JP H0238567A JP 18765488 A JP18765488 A JP 18765488A JP 18765488 A JP18765488 A JP 18765488A JP H0238567 A JPH0238567 A JP H0238567A
Authority
JP
Japan
Prior art keywords
substrates
fixed
substrate holder
planetary
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18765488A
Other languages
Japanese (ja)
Inventor
Isato Ameku
勇人 天久
Shinichi Yamabe
真一 山辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinmaywa Industries Ltd
Original Assignee
Shin Meiva Industry Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Meiva Industry Ltd filed Critical Shin Meiva Industry Ltd
Priority to JP18765488A priority Critical patent/JPH0238567A/en
Publication of JPH0238567A publication Critical patent/JPH0238567A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To form vapor-deposited films of uniform thickness on all substrates by allowing substrate holders to which substrates are attached, respectively, to perform rotational motions on their own axes and also revolutional motions with respect to a vapor deposition source by means of a planetary rotary jig with a specific structure at the time of vapor-depositing thin films onto many substrates, respectively, in a vacuum tank. CONSTITUTION:A vapor deposition source 13 fitted with an electron gun 10 is provided to the bottom 2b of a vacuum tank 2, and a planetary rotary mechanism 9 fitted with a rotating shaft 6 and an annular frame 8 is provided to the top 2a. A planetary rotary jig 25 is constituted of radiately provided plural circular-arched guide plates 26 in which respective one ends are fixed to the annular frame 8 and respective other ends are connected in the central parts by means of a joint plate 26a, angle adjustment arms 28 combinedly provided in a manner capable of turning upward and downward by means of circular-arched guide holes 27 provided in the above plates 26, and, via expansion means 29, bearings 30, rotational shafts for the bearings 30, and substrate holders 32 fixed to the shafts. While rotating the rotational shafts by means of rollers 33 and annular rails 35, respectively, the annular frame 8 is revolved along the circular-arched holes 27, by which the substrate holders 32 are subjected to planetary rotation and uniform vapor-deposited films can be formed on all the substrates.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は成膜設備の技術分野で利用され、特に、真空蒸
着装置のプラネタリ回転治具に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention is utilized in the technical field of film forming equipment, and particularly relates to a planetary rotation jig for a vacuum evaporation apparatus.

(従来の技術) ガラス等の基板に真空蒸着を行う場合は、その薄膜厚さ
を均等に形成するために、電子銃等の茫着源に対して基
板を公転させながら自転させるプラネタリ回転治具が適
用されている。
(Prior art) When performing vacuum deposition on a substrate such as glass, in order to form a thin film with an even thickness, a planetary rotating jig is used to rotate the substrate while revolving around a deposition source such as an electron gun. is applied.

このプラネタリ回転治具は、通常、多数の基板を着脱可
能に保持する基板ホルダと、この基板ホルダの中心に固
定して一端を突出させたホルダ軸と、このホルダ軸の突
出端部に固定したローラと、このローラを転動可能に乗
架させるために真空槽の胴部に沿って設けられた環状レ
ールと、前記ホルダ軸の中間部を枢支する軸受付き傾動
アームおよびこの傾動アームを懸吊支持するための逆り
形アームからなる角度調整手段とで構成されている。
This planetary rotation jig usually consists of a substrate holder that removably holds a large number of substrates, a holder shaft fixed at the center of the substrate holder with one end protruding, and a holder shaft fixed to the protruding end of the holder shaft. A roller, an annular rail provided along the body of the vacuum chamber for rolling the roller, a tilting arm with a bearing that pivotally supports the intermediate portion of the holder shaft, and suspending the tilting arm. and an angle adjustment means consisting of an inverted arm for hanging support.

一方、真空槽の頂部の中心部には、放射状に配置した複
数の旋回アームの基部が枢支され、その先端部に、それ
ぞれ角度調整手段の逆り形アームが連結されており、基
板ホルダは角度調整手段によって蒸着源に対する相対角
度が調整可能とされている。
On the other hand, in the center of the top of the vacuum chamber, the bases of a plurality of radially arranged swing arms are pivotally supported, and the inverted arms of angle adjustment means are connected to the tips of the arms, respectively, and the substrate holder is The relative angle to the vapor deposition source can be adjusted by the angle adjustment means.

(発明が解決しようとする課題) しかし、上記従来のプラネタリ回転治具は、角度調整手
段によって角度調整を行うとき、その都度、逆り形アー
ムの横部を旋回アームの長さ方向に移動させる調整と、
軸受付き傾動アームを逆り形アームの縦部に対して傾動
させる調整との二つの調整を行う必要があり、しかも、
基板ホルダを蒸着源に対して正対させようとすればする
ほどローラが環状レールから浮き上がるために、基板ホ
ルダに保持された基板は、蒸着源に対して自転動作をさ
せることが困雛となるとともに、プラネタリ回転治具が
増加するに従って、この傾向が顕著に現れる。
(Problem to be Solved by the Invention) However, in the above-mentioned conventional planetary rotating jig, each time the angle is adjusted by the angle adjusting means, the lateral part of the inverted arm is moved in the length direction of the rotating arm. adjustment and
It is necessary to perform two adjustments: the adjustment of tilting the tilting arm with a bearing relative to the vertical part of the inverted arm;
The more you try to make the substrate holder directly face the deposition source, the more the rollers will rise from the annular rail, making it difficult for the substrate held by the substrate holder to rotate relative to the deposition source. At the same time, as the number of planetary rotating jigs increases, this tendency becomes more noticeable.

また、基板は基板ホルダのピッチ円上に配置されていて
、基板をピッチ円の中心方向に反転させるときは、各基
板の保持枠を取り外して一枚ずつ裏返すという非能率的
な作業が行われている。
In addition, the boards are arranged on the pitch circle of the board holder, and when flipping the board toward the center of the pitch circle, the inefficient work of removing the holding frame of each board and flipping it over one by one is performed. ing.

本発明は、かかる従来の」二記課題に鑑み、基板ホルダ
は該基板ホルダを枢支する角度調整手段の一個所のみの
調整で角度の設定を可能とするとともに、基板ホルダの
ピッチ円上に配置された各基板は、同時に反転可能とし
た真空蒸着装置のプラネタリ回転治具を提供するにある
In view of the above two conventional problems, the present invention enables the substrate holder to set the angle by adjusting only one part of the angle adjustment means that pivots the substrate holder, and also allows the angle to be set on the pitch circle of the substrate holder. The purpose of each of the arranged substrates is to provide a planetary rotation jig for a vacuum evaporation apparatus that can be turned over at the same time.

(課題を解決するための手段) 本発明の真空蒸着装置のプラネタリ回転治具は、真空槽
の頂部に懸吊支持させた環状フレームに一端部が固設さ
れ、かつ他端部が前記真空槽の中心位置で互いに連結し
て放射状に配置されたガイド板と、該各ガイド板に穿設
した弧状ガイド孔に沿って俯仰可能に連設された角度調
整アームと、該角度調整アームに伸縮手段を介して連設
された軸受体と、該軸受体に枢支された自転軸と、該自
転軸の槽内側端部に固設された基板ホルダおよび槽外側
端部に固設されたローラと、該ローラを転動可能に乗架
させるために真空槽に固設された環状レールとからなる
ものであり、また、基板ホルダは、該基板ホルダのピッ
チ円上に配置した多数個の基板が、該各基板間に設けた
連動継手により同時に反転可能とされているものである
(Means for Solving the Problems) A planetary rotation jig for a vacuum evaporation apparatus of the present invention has one end fixed to an annular frame suspended and supported on the top of a vacuum chamber, and the other end fixed to the annular frame suspended from the top of the vacuum chamber. a guide plate connected to each other at the center position and arranged radially; an angle adjustment arm connected vertically and vertically along an arcuate guide hole bored in each guide plate; and an extendable means for the angle adjustment arm. a bearing body that is connected to the bearing body, a rotating shaft that is pivotally supported by the bearing body, a substrate holder that is fixed to the inner end of the tank of the rotating shaft, and a roller that is fixed to the outer end of the tank. , and an annular rail fixed to a vacuum chamber on which the roller can be mounted in a rolling manner, and the substrate holder has a large number of substrates arranged on a pitch circle of the substrate holder. , which can be simultaneously reversed by interlocking joints provided between the respective boards.

(作用) 上記の手段による作用は、蒸着源に対する基板ホルダの
相対角度は該基板ホルダと一体的に回動するローラが環
状レールに乗架する点接触部を中心とした円弧に沿って
調整が行われ、また、基板ホルダに配置された多数個の
基板は、連動継手により一個の基板の反転操作で他の各
基板が同時に反転される。
(Function) The effect of the above means is that the relative angle of the substrate holder with respect to the evaporation source can be adjusted along an arc centered at the point of contact where the roller that rotates integrally with the substrate holder rides on the annular rail. In addition, when a plurality of substrates placed in a substrate holder are inverted, each of the other substrates is simultaneously inverted when one substrate is inverted by an interlocking joint.

(実施例) 以下、本発明の一実施例を図面を参照して説明する。(Example) Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

第「図ないし第4図に示す真空蒸着装M1は、真空槽2
、真空ポンプ機構3、制御盤4および電子銃電源5を備
えている。前記真空槽2は頂部2aに懸吊支持された回
転軸6、回転軸駆動手段7および環状フレーム8からな
るプラネタリ回転機構9が設けられるとともに、底部2
bに電子銃10、ルツボ回転機構11およびシャンク機
構12からなる蒸着源13が設けられており、また、胴
部2Cには、ハロゲンヒータ14,14・・・が適宜の
相互間隔を保って配設されている。
The vacuum evaporation apparatus M1 shown in FIGS.
, a vacuum pump mechanism 3, a control panel 4, and an electron gun power source 5. The vacuum chamber 2 is provided with a planetary rotation mechanism 9 consisting of a rotating shaft 6, a rotating shaft driving means 7, and an annular frame 8 suspended and supported on the top portion 2a, and a planetary rotating mechanism 9 is provided on the bottom portion 2a.
An evaporation source 13 consisting of an electron gun 10, a crucible rotation mechanism 11, and a shank mechanism 12 is provided in b, and halogen heaters 14, 14, . . . are arranged at appropriate intervals in the body 2C. It is set up.

前記真空ポンプ機構3は、タライオポンプ15、メイン
バルブ16、クライオ再生バルブ17、粗引ポンプセッ
ト18および粗引バルブ19を備えている。20.20
は覗窓、21は防着板、22はベーキング用ヒータ板で
ある。
The vacuum pump mechanism 3 includes a talio pump 15, a main valve 16, a cryo regeneration valve 17, a roughing pump set 18, and a roughing valve 19. 20.20
2 is a viewing window, 21 is an adhesion prevention plate, and 22 is a baking heater plate.

さらに、真空槽2の内部の上方位置には、本発明のプラ
ネタリ回転治具25が設けられている。
Further, a planetary rotating jig 25 of the present invention is provided at an upper position inside the vacuum chamber 2.

プラネタリ回転治具25ば、前記環状フレーム8に一端
部が固設され、かつ他端部が前記真空槽2の中心位置で
継ぎ板26aにより互いに連結して放射状に配設された
円弧状の複数(例えば6個)のガイド板26.26・・
・と、該各ガイド板に穿設した弧状ガイド孔27に沿っ
て俯仰可能に連設された角度調整アーム28.28・・
・と、該名句度調整アームに伸縮手段29を介して連設
された軸受体30.30・・・と、該各軸受体に枢支さ
れた自転軸31.31・・・と、該各自転軸の槽内側端
部に固設された基板ホルダ32.32・・・および槽外
側端部に固設したローラ33.33・・・と、該各ロー
ラを転動可能に乗架させるために真空槽2の胴部2Cに
複数のブラケット34.34を介して固設された環状レ
ール35とからなっている。
The planetary rotating jig 25 includes a plurality of circular arc-shaped jigs, one end of which is fixed to the annular frame 8 and the other end of which is connected to each other by a joint plate 26a at the center of the vacuum chamber 2 and arranged radially. (for example 6) guide plates 26.26...
・An angle adjustment arm 28, 28, which is vertically and vertically connected along the arcuate guide hole 27 drilled in each guide plate.
・Bearing bodies 30, 30... connected to the degree adjustment arm via the telescopic means 29, rotation shafts 31, 31... pivotally supported by the respective bearing bodies, and the respective Substrate holders 32, 32... fixed to the inner end of the tank of the rotating shaft and rollers 33, 33... fixed to the outer end of the tank, and the rollers are mounted so that they can roll. It consists of an annular rail 35 fixed to the body 2C of the vacuum chamber 2 via a plurality of brackets 34 and 34.

前記角度調整アーム28は、第5回および第6図に示す
ように、一対の板状の■、形部材36の各縦部36 a
、  36 a間にスペーサ37を介在させてボルト3
8で結合するとともに、各横部36b。
As shown in the fifth and FIG.
, 36a with a spacer 37 interposed between the bolts 3
8 and each lateral portion 36b.

36bを前記ガイド板26の両側面に当接して調整ポル
1−37.37で固定することにより構成される。
36b are brought into contact with both sides of the guide plate 26 and fixed by adjustment poles 1-37.37.

前記伸縮手段29は前記ローラ33を環状レール35に
対して高さの微調整をするためのもので、前記り形部材
36の縦部36aの下端部に挿通したポル1〜38.3
8と、後述する軸受体30の取付部材41の長孔42,
42とで構成される。
The expansion/contraction means 29 is for finely adjusting the height of the roller 33 with respect to the annular rail 35.
8 and a long hole 42 of the mounting member 41 of the bearing body 30, which will be described later.
42.

前記軸受体30は、球軸受39.39を収容した軸受箱
40と取付部材41とからなり、該取付部材41には縦
方向の長孔42.42が穿設されている。
The bearing body 30 consists of a bearing box 40 containing a ball bearing 39.39 and a mounting member 41, and the mounting member 41 is provided with a longitudinal elongated hole 42.42.

前記基板ホルダ32は、該基板ホルダのピッチ円P1.
P2上にそれぞれ多数個の基板Wが基板枠43に着脱可
能に装着されて等間隔に配置されており、各基板W、W
・・・間には連動継手44(第8図参照)が設けられて
いる。
The substrate holder 32 has a pitch circle P1.
On P2, a large number of substrates W are removably attached to the substrate frame 43 and arranged at equal intervals, and each of the substrates W, W
. . . An interlocking joint 44 (see FIG. 8) is provided between them.

前記ローラ33は、外周部が尖鋭に形成されている。該
ローラ33を乗架させる環状レール35のガイド溝35
aは、基板ボルダ32の設定角度θが水平方向に対して
30° (第5図鎖線)ないし90° (第5図実線)
の範囲でローラ33が点接触で乗架できるように形成さ
れており、前記ガイド板26の弧状ガイド孔27はロー
ラ33の外周が環状レール35のガイド溝35aに点接
触をする接点を中心とした半径で形成されている。
The roller 33 has a sharp outer peripheral portion. Guide groove 35 of the annular rail 35 on which the roller 33 is mounted
In a, the set angle θ of the substrate boulder 32 is between 30° (dashed line in Figure 5) and 90° (solid line in Figure 5) with respect to the horizontal direction.
The arcuate guide hole 27 of the guide plate 26 is formed so that the roller 33 can be mounted in point contact within a range of It is formed with a radius of

前記連動継手44は第8図ないし第11図に示ずように
、基板ホルダ32に固定された軸受部材45と、該軸受
部材45に小径部/16aを枢支させた回動軸46と、
該回動軸46の大径部46bに形成したカム面47に圧
接して回動軸46力月80°回動するごとに、回動軸4
6を固定するための板ハネ4日と、回動軸46の小径部
46aの浮き」−がりを規制するための蓋板49と、回
動軸46の両端部に形成したフォーク部46c、46C
と係合させるために、基板枠43の外周部に設けられた
連結ピン50.50とから構成されている。
As shown in FIGS. 8 to 11, the interlocking joint 44 includes a bearing member 45 fixed to the substrate holder 32, a rotation shaft 46 having a small diameter portion /16a pivoted on the bearing member 45,
Each time the rotating shaft 46 rotates 80° by pressing against the cam surface 47 formed on the large diameter portion 46b of the rotating shaft 46, the rotating shaft 4
6, a cover plate 49 to prevent the small diameter portion 46a of the rotating shaft 46 from floating, and fork portions 46c, 46C formed at both ends of the rotating shaft 46.
The connecting pins 50 and 50 are provided on the outer periphery of the board frame 43 to engage with the board frame 43.

前記フォーク部46cの先端部形状は、基板枠43の係
合溝43aと干渉しないようにほぼ球形に形成されてい
る。
The tip of the fork portion 46c is formed into a substantially spherical shape so as not to interfere with the engagement groove 43a of the board frame 43.

基板ホルダ32に配置された多数個の基板WW・・・は
、いずれか−個の基板W8適宜の手段で反転させると、
この反転動作は連結ピン50.50と回動軸46とによ
る十字軸機能によって他の各基板W、W・・・に伝達さ
れ、ピッチ円PI(P2)に配置した全部の基板W、W
・・・がそれぞれ同時に反転するように構成されている
When a large number of substrates WW... placed on the substrate holder 32 are reversed by any one of the substrates W8 by appropriate means,
This reversal operation is transmitted to each of the other boards W, W, etc. by the cross axis function of the connecting pin 50, 50 and the rotation shaft 46, and all the boards W, W arranged in the pitch circle PI (P2)
. . . are configured to be inverted at the same time.

次に、上記実施例の作用について説明する。Next, the operation of the above embodiment will be explained.

第3図において、環状フレーム8が回転軸駆動手段7の
起動によって回転動作をすると、環状フレーム8にガイ
ド板26、角度調整アーム28および軸受体30を介し
て連設されている基板ホルダ32は、蒸着源13に対し
て公転動作をするとともに、環状レール35に乗架して
いるローラ33によって自転動作がなされ、基板ホルダ
32に保持された基板W、W・・・に均一な薄膜が形成
される。
In FIG. 3, when the annular frame 8 rotates due to activation of the rotary shaft driving means 7, the substrate holder 32, which is connected to the annular frame 8 via the guide plate 26, the angle adjustment arm 28, and the bearing body 30, rotates. , revolves around the evaporation source 13 and rotates on its own axis by the roller 33 mounted on the annular rail 35, forming a uniform thin film on the substrates W held by the substrate holder 32. be done.

いまもし、基板ホルダ32を蒸着源13に対して所望の
角度に設定しようとするときは、第5図において、調整
ボルト37.37を弛緩させた状態で角度調整アーム2
8を設定角度θに傾動させたのち、再び調整ポル)37
.37で固定する。
If you want to set the substrate holder 32 at a desired angle with respect to the deposition source 13, as shown in FIG.
8 to the set angle θ, then adjust again) 37
.. Fix it at 37.

なお、基板ホルダ32およびローラ33が三個所以上に
増えた場合は、増設分のローラ33の外周部は伸縮機構
29による微調整で環状レール35のガイド溝35aに
密接される。
Note that when the number of substrate holders 32 and rollers 33 is increased to three or more, the outer periphery of the additional rollers 33 is brought into close contact with the guide groove 35a of the annular rail 35 by fine adjustment by the expansion/contraction mechanism 29.

また、各基板ホルダ32.32・・・に配置された各基
板W、W・・・を反転させる場合は、−個の基板Wを反
転させるだけで他の各基板W、W・・・が連動継手44
.4’4・・・を介して同時に反転される。
Moreover, when reversing each substrate W, W, etc. arranged in each substrate holder 32, 32, etc., each of the other substrates W, W, Interlocking joint 44
.. 4'4... are simultaneously inverted.

(発明の効果) 本発明は上記の構成により、蒸着源に対する基板ホルダ
の相対角度は、環状レールに乗架したローラ外周部の接
点を中心とする円弧に沿って行われ、しかもガイド板と
角度調整アームとの連結部のみを調整するだけで設定で
きるとともに、各基板ホルダをそれぞれ違った角度に設
定してもローラは環状レールから離れることがないので
基板ホルダの自転動作が正常に行われて作業性および装
置の機能が向上するばかりでなく、基板ホルダに配置さ
れた多数個の基板は連動継手によって同時に反転される
ので、作業時間を大きく短縮することができ、さらに、
基板ホルダに適宜の反転手段を導入することによって、
真空を保持した状態で基板の反転操作が可能になるとい
う優れた利点がある。
(Effects of the Invention) With the above configuration, the present invention allows the relative angle of the substrate holder to the evaporation source to be set along an arc centered on the contact point of the outer circumference of the roller mounted on the annular rail, and at an angle with respect to the guide plate. Settings can be made by adjusting only the connection part with the adjustment arm, and the rollers do not move away from the annular rail even if each substrate holder is set at a different angle, so the substrate holders can rotate normally. Not only does work efficiency and equipment functionality improve, but multiple boards placed in the board holder can be flipped simultaneously using interlocking joints, which greatly reduces work time.
By introducing appropriate reversing means in the substrate holder,
An excellent advantage is that the substrate can be inverted while maintaining a vacuum.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明の実施態様を例示し、第1図は真空蒸着装
置の正面図、第2図は同左側面図、第3図は第2回の■
−■線における断面図、第4図は■のTV−IV線にお
ける断面図、第5図はプラネタリ回転治具の正面図、第
6図は角度調整アーム等の右側面図、第7図は基板ホル
ダの正面図、第8図は第7図の■部を拡大して示す図、
第9図は連動継手を一部断面で示す正面図、第10図は
同右側面図、第11図は連動継手を分解して示す外形斜
視図である。 1・・・真空蒸着装置 2a・・・頂部 25・・・プラネタリ回転治具 26・・・ガイド平反 2B・・・角度調整アーム 30・・・軸受体 32・・・基芋反ホルダ 35・・・環状レール W・・・基板    Pl 2・・・真空槽 8・・・環状フレーム 27・・・弧状ガイド孔 29・・・伸縮手段 31・・・自転軸 33・・・ローラ 44・・・連動継手 P2・・・ピッチ円
The drawings illustrate embodiments of the present invention, and FIG. 1 is a front view of the vacuum evaporation apparatus, FIG. 2 is a left side view of the same, and FIG.
Figure 4 is a cross-sectional view taken along line -■, Figure 4 is a cross-sectional view taken along line TV-IV, Figure 5 is a front view of the planetary rotating jig, Figure 6 is a right side view of the angle adjustment arm, etc. A front view of the board holder, FIG. 8 is an enlarged view of the part ■ in FIG. 7,
FIG. 9 is a partially sectional front view of the interlocking joint, FIG. 10 is a right side view thereof, and FIG. 11 is an exploded external perspective view of the interlocking joint. 1...Vacuum deposition device 2a...Top part 25...Planetary rotation jig 26...Guide flat panel 2B...Angle adjustment arm 30...Bearing body 32...Basic potato strip holder 35... - Annular rail W... Board Pl 2... Vacuum chamber 8... Annular frame 27... Arc-shaped guide hole 29... Expanding/contracting means 31... Rotating shaft 33... Roller 44... Interlocking Joint P2...pitch circle

Claims (1)

【特許請求の範囲】 1)真空槽の頂部に懸吊支持させた環状フレームに一端
部が固設され、かつ他端部が前記真空槽の中心位置で互
いに連結して放射状に配置されたガイド板と、該各ガイ
ド板に穿設した弧状ガイド孔に沿って俯仰可能に連設さ
れた角度調整アームと、該角度調整アームに伸縮手段を
介して連設された軸受体と、該軸受体に枢支された自転
軸と、該自転軸の槽内側端部に固設された基板ホルダお
よび槽外側端部に固設されたローラと、該ローラを転動
可能に乗架させるために真空槽に固設された環状レール
とからなることを特徴とする真空蒸着装置のプラネタリ
回転治具。 2)基板ホルダは、該基板ホルダのピッチ円上に配置し
た多数個の基板が、該各基板間に設けた連動継手により
同時に反転可能とされている請求項1記載の真空蒸着装
置のプラネタリ回転治具。
[Scope of Claims] 1) Guides having one end fixed to an annular frame suspended and supported on the top of the vacuum chamber, and the other ends of which are connected to each other at the center of the vacuum chamber and arranged radially. a plate, an angle adjustment arm connected in a vertically movable manner along an arcuate guide hole drilled in each guide plate, a bearing body connected to the angle adjustment arm via a telescoping means, and the bearing body. a substrate holder fixed to the inner end of the tank, a roller fixed to the outer end of the tank, and a vacuum in order to allow the roller to roll. A planetary rotation jig for a vacuum evaporation apparatus, characterized by comprising an annular rail fixed to a tank. 2) Planetary rotation of the vacuum evaporation apparatus according to claim 1, wherein the substrate holder is configured such that a large number of substrates arranged on a pitch circle of the substrate holder can be simultaneously reversed by an interlocking joint provided between the substrates. jig.
JP18765488A 1988-07-27 1988-07-27 Planetary rotary jig for vacuum vapor deposition apparatus Pending JPH0238567A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18765488A JPH0238567A (en) 1988-07-27 1988-07-27 Planetary rotary jig for vacuum vapor deposition apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18765488A JPH0238567A (en) 1988-07-27 1988-07-27 Planetary rotary jig for vacuum vapor deposition apparatus

Publications (1)

Publication Number Publication Date
JPH0238567A true JPH0238567A (en) 1990-02-07

Family

ID=16209872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18765488A Pending JPH0238567A (en) 1988-07-27 1988-07-27 Planetary rotary jig for vacuum vapor deposition apparatus

Country Status (1)

Country Link
JP (1) JPH0238567A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006330656A (en) * 2005-04-25 2006-12-07 Showa Shinku:Kk Vacuum deposition device for liquid crystal alignment layer and deposition method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006330656A (en) * 2005-04-25 2006-12-07 Showa Shinku:Kk Vacuum deposition device for liquid crystal alignment layer and deposition method thereof

Similar Documents

Publication Publication Date Title
CA2261425A1 (en) Method and apparatus for three-dimensional micro-fabrication and processing on flexible filamentary substrates
KR101646698B1 (en) Zig System for Revolving and Rotating in PVD coating machine
JPH0238567A (en) Planetary rotary jig for vacuum vapor deposition apparatus
CN208136324U (en) A kind of vacuum coater
JP5005205B2 (en) Vacuum deposition equipment
US20030075102A1 (en) System for inverting substrates
JP2673725B2 (en) Film forming equipment
JPS6362875A (en) Vacuum film forming device
JP2001207262A (en) Vacuum coating system for applying coating on optical substrate
JPH01184277A (en) Substrate rotating device
CN208857360U (en) A kind of plasma surface treatment all-directional rotation workpiece target platform
JP4550540B2 (en) Sample stage and ion sputtering equipment
JPH0718758Y2 (en) Vacuum deposition equipment
JPH0726361Y2 (en) Substrate inversion mechanism of vapor deposition equipment
TWI664305B (en) Three dimension revolution and rotation deposition turntable structure
CN216738504U (en) Multi-workpiece-disc film coating device
CN117448771B (en) Multistage planetary workpiece carrier mechanism with adjustable substrate vacuum coating angle
JP2006111952A (en) Film-forming apparatus
KR20200062617A (en) Sputtering apparatus applying three-axis driving stage
JP4721555B2 (en) Prism surface deposition apparatus and method
CN215756461U (en) Can control thick graphene film preparation facilities of membrane in a flexible way
JPH0718757Y2 (en) Planetary jig for vapor deposition equipment
JPH10194688A (en) Turn over machine with jig
CN111020517B (en) Base plate support bracket
JPS5845175B2 (en) Rotary evaporation equipment