CN117448771B - Multistage planetary workpiece carrier mechanism with adjustable substrate vacuum coating angle - Google Patents
Multistage planetary workpiece carrier mechanism with adjustable substrate vacuum coating angle Download PDFInfo
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- CN117448771B CN117448771B CN202311802026.3A CN202311802026A CN117448771B CN 117448771 B CN117448771 B CN 117448771B CN 202311802026 A CN202311802026 A CN 202311802026A CN 117448771 B CN117448771 B CN 117448771B
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- substrate
- rotating shaft
- rotating
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- shaft
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- 239000000758 substrate Substances 0.000 title claims abstract description 79
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 21
- 239000007888 film coating Substances 0.000 abstract description 12
- 238000009501 film coating Methods 0.000 abstract description 12
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000000576 coating method Methods 0.000 abstract description 7
- 238000006243 chemical reaction Methods 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 238000002309 gasification Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000033001 locomotion Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000009504 vacuum film coating Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to the technical field of vacuum coating, in particular to a multistage planetary workpiece carrier mechanism with an adjustable substrate vacuum coating angle. According to the multistage planetary workpiece carrier mechanism with the adjustable substrate vacuum coating angle, through the cooperation of the first rotating shaft, the connecting sleeve, the first fixed gear, the first rotary table, the second sleeve, the second rotating shaft, the first pinion, the first bevel gear, the angle adjusting mechanism, the substrate rotating mechanism and the like, the second rotating shaft revolves along with the first rotary table, meanwhile, as the first pinion and the first fixed gear are meshed and can rotate, the substrate rotating mechanism further rotates, the probability of collision between the substrate and gas molecules is improved, the reaction rate is increased, the quality during coating is improved, and the uniformity and compactness of the substrate coating are further improved. In addition, the angle adjusting mechanism can adjust the angle of the substrate rotating mechanism, is suitable for the shape of the curved substrate, improves the quality during film coating, and further improves the uniformity and compactness of the film coating of the substrate.
Description
Technical Field
The invention relates to the technical field of vacuum coating, in particular to a multistage planetary workpiece carrier mechanism with an adjustable substrate vacuum coating angle.
Background
Evaporation plating is a common surface coating technique that forms a thin film by evaporating a material to condense it on a substrate. And when the membrane material is gradually heated, liquefying and gasifying are carried out. The vaporized film molecules diffuse in a high vacuum environment and are eventually deposited on the substrate. In the prior art, a plane planetary workpiece disc is used, so that the substrate makes revolution and autorotation motions during film coating, and the speed of the substrate is improved. When the substrate rotates, the surface of the coating substance can continuously collide with the film material molecules in the gasification state, so that the reaction rate is increased, and meanwhile, the messiness in coating is increased, so that the probability that each position of the substrate contacts the film material molecules in the gasification state is equal, and the uniformity and compactness of the film are facilitated. The structure is more used for planar substrates, has certain limitation on film coating of curved substrates, and therefore, a novel multistage planetary workpiece carrier mechanism with adjustable vacuum film coating angles for substrates needs to be designed so as to enhance the autorotation of the substrates, improve the probability of collision between the substrates and molecules in a film material gasification state, increase the reaction rate, improve the quality during film coating, and improve the uniformity and compactness of film coating of the substrates.
Disclosure of Invention
Aiming at the defects in the prior art, the invention provides a multistage planetary workpiece carrier mechanism with an adjustable substrate vacuum coating angle.
The technical scheme adopted by the invention is as follows: the substrate vacuum coating angle-adjustable multistage planetary workpiece carrier mechanism comprises a connecting sleeve and a first rotating shaft which freely passes through the connecting sleeve, wherein a first fixed gear is welded on the connecting sleeve; the first rotating shaft is provided with a first rotating disc, a plurality of second sleeves are arranged on the first rotating disc, a second rotating shaft is matched with the first rotating disc through a bearing, a first pinion is arranged at the upper end of the second rotating shaft, a first bevel gear is arranged at the lower end of the second rotating shaft, and the first pinion is meshed with a first fixed gear; the lower part of the first rotating disc is also provided with an angle adjusting mechanism, the angle adjusting mechanism is connected with a substrate rotating mechanism, and the angle adjusting mechanism is matched with the first bevel gear.
In order to better realize the invention, the angle adjusting mechanism comprises a mounting frame connected with the first rotating disc, a hinge shaft is arranged on the mounting frame, a connecting plate is hinged on the hinge shaft, and the substrate rotating mechanism is arranged on the connecting plate; a second bevel gear is sleeved on the hinge shaft and is respectively matched with the first bevel gear and the substrate rotating mechanism; the mounting frame on be provided with the screw thread seat, this screw thread seat screw thread fit has the screw thread to adjust the pole, the screw thread adjust the one end of pole and the lateral part of connecting plate conflict.
In order to better realize the invention, the substrate rotating mechanism comprises a third shaft sleeve arranged on the connecting plate, wherein the third shaft sleeve is matched with a third rotating shaft through a bearing, one end of the third rotating shaft is provided with a third bevel gear, and the other end of the third rotating shaft is connected with a second rotating disc; the third bevel gear is meshed with the second bevel gear, and the second turntable is provided with a substrate autorotation mechanism.
In order to better realize the invention, the substrate autorotation mechanism comprises a fourth shaft sleeve arranged on the turntable, the fourth shaft sleeve is matched with a fourth rotating shaft through a bearing, one end of the fourth rotating shaft is provided with a substrate fixing disc, the other end of the fourth rotating shaft is provided with a second pinion, and a second fixed gear meshed with the second pinion is arranged on the third shaft sleeve.
In order to better realize the invention, a connecting fixing screw is arranged on the first fixed gear.
In order to better realize the invention, a first positioning seat is arranged outside the second sleeve, and the first positioning seat is connected with the first rotating disc through a screw.
In order to better realize the invention, a second positioning seat is arranged outside the third shaft sleeve and is connected with a second fixed gear through a screw.
In order to better realize the invention, a third positioning seat is arranged outside the fourth shaft sleeve and is connected with the second turntable through a screw.
The beneficial effects of the invention are as follows: according to the multistage planetary workpiece carrier mechanism with the adjustable substrate vacuum coating angle, through the cooperation of the first rotating shaft, the connecting sleeve, the first fixed gear, the first rotary table, the second sleeve, the second rotating shaft, the first pinion, the first bevel gear, the angle adjusting mechanism, the substrate rotating mechanism and the like, the second rotating shaft revolves along with the first rotary table, meanwhile, as the first pinion and the first fixed gear are meshed and can rotate, the substrate rotating mechanism further rotates, the rotation of the substrate is enhanced, the probability of collision between the substrate and gas molecules is improved, the reaction rate is increased, the quality of coating is improved, and the uniformity and compactness of the substrate coating are further improved. In addition, the angle adjusting mechanism can adjust the angle of the substrate rotating mechanism, is suitable for the shape of the curved substrate, improves the quality during film coating, and further improves the uniformity and compactness of the film coating of the substrate.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below. Like elements or portions are generally identified by like reference numerals throughout the several figures. In the drawings, elements or portions thereof are not necessarily drawn to scale.
FIG. 1 is a schematic view of a structure of a substrate vacuum coating angle adjustable multi-stage planetary workpiece carrier mechanism of the present invention;
FIG. 2 is a schematic view of a configuration of the angle adjusting mechanism of the substrate vacuum coating angle-adjustable multistage planetary workpiece carrier mechanism of the invention in combination with a substrate rotating mechanism;
in the drawing, 1-first rotating shaft, 2-connecting sleeve, 3-first rotary table, 4-first fixed gear, 5-first pinion, 6-second rotating shaft, 7-first bevel gear, 8-mounting rack, 9-hinge shaft, 10-connecting plate, 11-second bevel gear, 12-screw thread adjusting rod, 13-third bevel gear, 14-third rotating shaft, 15-third shaft sleeve, 16-second fixed gear, 17-second pinion, 18-fourth rotating shaft, 19-substrate fixed disk and 20-second rotary table.
Detailed Description
Embodiments of the technical scheme of the present invention will be described in detail below with reference to the accompanying drawings. The following examples are only for more clearly illustrating the technical aspects of the present invention, and thus are merely examples, and are not intended to limit the scope of the present invention.
It is noted that unless otherwise indicated, technical or scientific terms used herein should be given the ordinary meaning as understood by one of ordinary skill in the art to which this invention pertains.
Examples:
as shown in fig. 1 and 2, the multi-stage planetary workpiece carrier mechanism with the adjustable substrate vacuum coating angle comprises a workpiece carrier weldment formed by welding a first rotating shaft 1 and a first rotating disc, a connecting sleeve 2 and the first rotating shaft 1 freely penetrating through the connecting sleeve 2, wherein a first fixed gear 4 is arranged on the connecting sleeve 2; a plurality of second sleeves are arranged on the first rotating disc 3, a second rotating shaft 6 is matched with the first rotating disc through a bearing, a first pinion 5 is arranged at the upper end of the second rotating shaft 6, a first bevel gear 7 is arranged at the lower end of the second rotating shaft, and the first pinion 5 is meshed with the first fixed gear 4; the lower part of the first rotating disc 3 is also provided with an angle adjusting mechanism which is connected with a substrate rotating mechanism, and the angle adjusting mechanism is matched with the first bevel gear 7. According to the substrate vacuum coating angle-adjustable multistage planetary workpiece carrier mechanism, through the cooperation of the first rotating shaft 1, the connecting sleeve 2, the first fixed gear 4, the first rotating disc 3, the second sleeve, the second rotating shaft 6, the first pinion 5, the first bevel gear 7, the angle adjusting mechanism, the substrate rotating mechanism and the like, the second rotating shaft 6 revolves along with the first rotating disc, meanwhile, as the first pinion 5 and the first fixed gear 4 are meshed and can rotate, the substrate rotating mechanism further rotates, the rotation of the substrate is enhanced, the collision probability of the substrate and gas molecules is improved, the reaction rate is increased, the quality of the coated film is improved, and the uniformity and compactness of the coated film of the substrate are further improved. In addition, the angle adjusting mechanism can adjust the angle of the substrate rotating mechanism, is suitable for the shape of the curved substrate, improves the quality during film coating, and further improves the uniformity and compactness of the film coating of the substrate.
Preferably, the angle adjusting mechanism comprises a mounting frame 8 connected with the first rotating disc 3, a hinge shaft 9 is arranged on the mounting frame 8, a connecting plate 10 is hinged on the hinge shaft 9, and the substrate rotating mechanism is arranged on the connecting plate 10; a second bevel gear 11 is sleeved on the hinge shaft 9, and the second bevel gear 11 is respectively matched with the first bevel gear 7 and the substrate rotating mechanism; the mounting frame 8 is provided with a thread seat which is in threaded fit with a thread adjusting rod 12, and one end of the thread adjusting rod 12 is in interference with the side part of the connecting plate 10. By such a design, the telescopic length of the screw adjusting lever 12 can be changed by rotating the screw adjusting lever 12, thereby adjusting the inclination degree of the connection plate 10.
Preferably, the substrate rotating mechanism comprises a third shaft sleeve 15 mounted on the connecting plate 10, the third shaft sleeve 15 is matched with a third rotating shaft 14 through a bearing, one end of the third rotating shaft 14 is provided with a third bevel gear 13, and the other end is connected with a second turntable 20; the third bevel gear 13 is meshed with the second bevel gear 11, and the second turntable 20 is provided with a substrate rotation mechanism. The second bevel gear 11 is respectively matched with the first bevel gear 7 and the third bevel gear 13 to play a role in middle transmission of power, so that the power can be effectively transmitted no matter what inclination angle the connecting plate 10 is positioned.
Preferably, the substrate rotation mechanism comprises a fourth shaft sleeve arranged on the turntable, the fourth shaft sleeve is matched with a fourth rotating shaft 18 through a bearing, one end of the fourth rotating shaft 18 is provided with a substrate fixing disc 19, the other end of the fourth rotating shaft is provided with a second pinion 17, and the third shaft sleeve 15 is provided with a second fixing gear 16 meshed with the second pinion 17. After the design, the second turntable 20 drives the fourth rotating shaft 18 to revolve along the third rotating shaft 14, and meanwhile, as the second pinion 17 and the second fixed gear 16 are meshed and can rotate, the probability of collision of the substrate and gas molecules is improved, the reaction rate is increased, the quality during film coating is improved, and the uniformity and compactness of film coating of the substrate are further improved.
Preferably, a connecting fixing screw is provided on the first fixed gear 4. After the design, the connecting fixing screw can be connected to other fixed shells, so that stability is enhanced.
Preferably, a first positioning seat is arranged outside the second sleeve, and the first positioning seat is connected with the first rotating disc 3 through a screw. The detachable structure is designed, so that the detachable structure can be conveniently detached for maintenance.
Preferably, a second positioning seat is arranged outside the third sleeve 15, and is connected with the second fixed gear 16 through a screw. The detachable structure is designed, so that the detachable structure can be conveniently detached for maintenance.
Preferably, a third positioning seat is arranged outside the fourth shaft sleeve, and the third positioning seat is connected with the second turntable 20 through a screw. The detachable structure is designed, so that the detachable structure can be conveniently detached for maintenance.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and not for limiting the same; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the invention, and are intended to be included within the scope of the appended claims and description.
Claims (7)
1. The utility model provides a multistage planet work piece frame mechanism of substrate vacuum coating angle adjustable which characterized in that: comprises a connecting sleeve (2) and a first rotating shaft (1) which freely passes through the connecting sleeve (2), wherein a first fixed gear (4) is welded on the connecting sleeve (2); the first rotating shaft (1) is provided with a first rotating disc (3), a plurality of second sleeves are arranged on the first rotating disc (3), a second rotating shaft (6) is matched with the first rotating disc through a bearing, a first pinion (5) is arranged at the upper end of the second rotating shaft (6), a first bevel gear (7) is arranged at the lower end of the second rotating shaft, and the first pinion (5) is meshed with the first fixed gear (4); the lower part of the first rotating disc (3) is also provided with an angle adjusting mechanism which is connected with a substrate rotating mechanism, and the angle adjusting mechanism is matched with the first bevel gear (7);
the angle adjusting mechanism comprises a mounting frame (8) connected with the first rotating disc (3), a hinge shaft (9) is arranged on the mounting frame (8), a connecting plate (10) is hinged on the hinge shaft (9), and the substrate rotating mechanism is arranged on the connecting plate (10); a second bevel gear (11) is sleeved on the hinge shaft (9), and the second bevel gear (11) is respectively matched with the first bevel gear (7) and the substrate rotating mechanism; the mounting frame (8) is provided with a thread seat, the thread seat is in threaded fit with a thread adjusting rod (12), and one end of the thread adjusting rod (12) is in interference with the side part of the connecting plate (10).
2. The angularly adjustable multistage planetary work piece carrier mechanism of substrate vacuum coating according to claim 1, characterized in that: the substrate rotating mechanism comprises a third shaft sleeve (15) arranged on the connecting plate (10), a third rotating shaft (14) is matched with the third shaft sleeve (15) through a bearing, a third bevel gear (13) is arranged at one end of the third rotating shaft (14), and a second rotary table (20) is connected to the other end of the third rotating shaft; the third bevel gear (13) is meshed with the second bevel gear (11), and the second turntable (20) is provided with a substrate autorotation mechanism.
3. The angle-adjustable multistage planetary workpiece carrier mechanism for vacuum coating of substrates according to claim 2, wherein: the substrate rotation mechanism comprises a fourth shaft sleeve arranged on the turntable, a fourth rotating shaft (18) is matched with the fourth shaft sleeve through a bearing, a substrate fixing disc (19) is arranged at one end of the fourth rotating shaft (18), a second pinion (17) is arranged at the other end of the fourth rotating shaft, and a second fixing gear (16) meshed with the second pinion (17) is arranged on the third shaft sleeve (15).
4. The angle-adjustable multi-stage planetary workpiece carrier mechanism for vacuum coating of substrates according to claim 3, wherein: the first fixed gear (4) is provided with a connecting and fixing screw.
5. The angle-adjustable multi-stage planetary workpiece carrier mechanism for vacuum coating of substrates according to claim 4, wherein: the outer part of the second sleeve is provided with a first positioning seat which is connected with the first rotating disc (3) through a screw.
6. The angle-adjustable multi-stage planetary workpiece carrier mechanism for vacuum coating of substrates according to claim 5, wherein: the outside of the third shaft sleeve (15) is provided with a second positioning seat which is connected with a second fixed gear (16) through a screw.
7. The angle-adjustable multi-stage planetary workpiece carrier mechanism for vacuum coating of substrates according to claim 6, wherein: and a third positioning seat is arranged outside the fourth shaft sleeve and is connected with the second rotary table (20) through a screw.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311802026.3A CN117448771B (en) | 2023-12-26 | 2023-12-26 | Multistage planetary workpiece carrier mechanism with adjustable substrate vacuum coating angle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311802026.3A CN117448771B (en) | 2023-12-26 | 2023-12-26 | Multistage planetary workpiece carrier mechanism with adjustable substrate vacuum coating angle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN117448771A CN117448771A (en) | 2024-01-26 |
| CN117448771B true CN117448771B (en) | 2024-03-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311802026.3A Active CN117448771B (en) | 2023-12-26 | 2023-12-26 | Multistage planetary workpiece carrier mechanism with adjustable substrate vacuum coating angle |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117448771B (en) |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0471144A2 (en) * | 1990-08-14 | 1992-02-19 | Leybold Aktiengesellschaft | Planetary transmission with a gear set, in particular for devices for coating substrates |
| EP1835048A1 (en) * | 2006-03-17 | 2007-09-19 | Carl Zeiss AG | Device for holding and turning and/or rotating an object when coating it in a vacuum coating facility, calotte and method for holding and turning and/or rotating an object when coating it in a vacuum coating facility |
| CN103590006A (en) * | 2013-12-02 | 2014-02-19 | 上海沃家真空设备科技有限公司 | Multifunctional vacuum-coating machine rotating rack |
| CN106835059A (en) * | 2017-02-27 | 2017-06-13 | 江阴市中兴光电实业有限公司 | Coating machine diaphragm rotating mechanism with adjustable angle planetary plate |
| CN111676461A (en) * | 2020-06-28 | 2020-09-18 | 布勒莱宝光学设备（北京）有限公司 | Multistage planetary rotary coating mechanism |
| CN212894954U (en) * | 2020-06-28 | 2021-04-06 | 布勒莱宝光学设备（北京）有限公司 | Multistage planetary rotary coating mechanism |
| CN113265639A (en) * | 2021-04-16 | 2021-08-17 | 布勒莱宝光学设备（北京）有限公司 | Coating film rotating mechanism with automatic swing planetary disc |
| CN214422741U (en) * | 2020-12-04 | 2021-10-19 | 苏州鼎利涂层有限公司 | But angle regulation's coating film device |
| CN216141610U (en) * | 2021-08-06 | 2022-03-29 | 成都国泰真空设备有限公司 | Bevel planet workpiece carrier device with adjustable angle and position |
| KR20220060650A (en) * | 2020-11-05 | 2022-05-12 | 주식회사 선익시스템 | Vapor Deposition Apparatus having Height-Adjustable Angle Controlling Module |
| WO2023124251A1 (en) * | 2021-12-31 | 2023-07-06 | 华为数字能源技术有限公司 | Planetary disc structure and evaporative deposition apparatus |
| CN116623142A (en) * | 2023-04-10 | 2023-08-22 | 兰州空间技术物理研究所 | Multi-station rotating frame for magnetron sputtering of circular target |
-
2023
- 2023-12-26 CN CN202311802026.3A patent/CN117448771B/en active Active
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0471144A2 (en) * | 1990-08-14 | 1992-02-19 | Leybold Aktiengesellschaft | Planetary transmission with a gear set, in particular for devices for coating substrates |
| EP1835048A1 (en) * | 2006-03-17 | 2007-09-19 | Carl Zeiss AG | Device for holding and turning and/or rotating an object when coating it in a vacuum coating facility, calotte and method for holding and turning and/or rotating an object when coating it in a vacuum coating facility |
| CN103590006A (en) * | 2013-12-02 | 2014-02-19 | 上海沃家真空设备科技有限公司 | Multifunctional vacuum-coating machine rotating rack |
| CN106835059A (en) * | 2017-02-27 | 2017-06-13 | 江阴市中兴光电实业有限公司 | Coating machine diaphragm rotating mechanism with adjustable angle planetary plate |
| CN111676461A (en) * | 2020-06-28 | 2020-09-18 | 布勒莱宝光学设备（北京）有限公司 | Multistage planetary rotary coating mechanism |
| CN212894954U (en) * | 2020-06-28 | 2021-04-06 | 布勒莱宝光学设备（北京）有限公司 | Multistage planetary rotary coating mechanism |
| KR20220060650A (en) * | 2020-11-05 | 2022-05-12 | 주식회사 선익시스템 | Vapor Deposition Apparatus having Height-Adjustable Angle Controlling Module |
| CN214422741U (en) * | 2020-12-04 | 2021-10-19 | 苏州鼎利涂层有限公司 | But angle regulation's coating film device |
| CN113265639A (en) * | 2021-04-16 | 2021-08-17 | 布勒莱宝光学设备（北京）有限公司 | Coating film rotating mechanism with automatic swing planetary disc |
| CN216141610U (en) * | 2021-08-06 | 2022-03-29 | 成都国泰真空设备有限公司 | Bevel planet workpiece carrier device with adjustable angle and position |
| WO2023124251A1 (en) * | 2021-12-31 | 2023-07-06 | 华为数字能源技术有限公司 | Planetary disc structure and evaporative deposition apparatus |
| CN116623142A (en) * | 2023-04-10 | 2023-08-22 | 兰州空间技术物理研究所 | Multi-station rotating frame for magnetron sputtering of circular target |
Also Published As
| Publication number | Publication date |
|---|---|
| CN117448771A (en) | 2024-01-26 |
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