KR20200062617A - Sputtering apparatus applying three-axis driving stage - Google Patents

Abstract

The present invention relates to a sputtering device to which a triaxial driving stage is applied, and more specifically, to a sputtering device which can form a thin film on a substrate which is an object to be processed, and may comprise: a tilt-response rotational driving unit; a stage unit on which the substrate is mounted; and a driving delivering device which is connected to the tilt-response rotational driving unit and the stage unit in order to enable the tilt movement of the stage unit by the rotational operation of the tilt-response rotational driving unit. Here, the driving delivering device comprises a tilt driving delivering unit which is connected to the stage unit such that a tilt shaft, on which the stage unit is tilt-moved, may pass the heater center of the stage unit. Therefore, density of a sputter thin film can be controlled, and the uniformity of thickness thereof can be improved.

Description

SPUTTERING APPARATUS APPLYING THREE-AXIS DRIVING STAGE applied with a 3-axis driving stage

The present application relates to a sputtering device to which a 3-axis drive stage is applied.

When a thin film is formed on a substrate by a sputtering device, it is necessary to secure a technique for controlling the density, thickness and uniformity of the thin film according to process conditions. For example, when it is necessary to implement a Porosity thin film to minimize the stress of the sputter thin film required in a post process, it is possible to control the surface roughness of the thin film according to the sputtering inclination angle. In order to secure thickness uniformity according to the inclination angle, it is necessary to secure the optimal process conditions according to the distance between the target and the substrate as well as the rotation of the substrate.

However, in the related art, the target having a certain inclination angle is fixed, and the surface roughness and the like are controlled by the rotation of the substrate loaded horizontally with the ground, and it is very limited to diversify the sputtering process conditions. In addition, in order to evaluate the film quality according to various inclination angles, in the case of a stage in which a universal joint is applied as a method of having an inclination angle, an inclination axis is present at a lower portion of the substrate, and the origin of the substrate according to the inclination angle is distorted . In addition, there is a problem that the tilt angle is only up to 40 degrees in the tilt control using the universal joint. Therefore, in order to secure the uniformity of the sputter thin film, it was inevitable to adjust the distance between the substrate and the target or apply a large size target.

That is, in the existing sputtering equipment, there was no function to simultaneously adjust the heating, rotation, inclination, and the distance between the substrate and the target of the substrate, so the conditions for implementing an excellent thin film were somewhat limited.

The background technology of the present application is disclosed in Korean Patent Registration No. 10-1629396.

The present application is to solve the problems of the prior art described above, includes a heating function, and simultaneously controls the temperature, rotation, inclination, and the distance between the target and the substrate to control sputter thin film density and to improve thickness uniformity. It is an object to provide a sputtering device to which a stage is applied.

However, the technical problems to be achieved by the embodiments of the present application are not limited to the technical problems as described above, and other technical problems may exist.

As a technical means for achieving the above technical problem, the sputtering apparatus to which the 3-axis drive stage of the present application is applied is provided by a rotation drive of a tilt-compatible rotation drive unit, a stage unit on which the substrate is seated, and the tilt-compatible rotation drive unit. In order to make the tilt movement of the stage unit, a rotation drive unit corresponding to the tilt and a drive transmission mechanism connected to the stage unit, wherein the drive transmission mechanism includes a tilt axis through which the stage unit is tilted. And a tilt driving transmission part connected to the stage unit so as to pass through the heater center of the stage unit.

In addition, the sputtering apparatus to which the three-axis drive stage of the present application is applied further includes a rotation drive unit corresponding to rotation, and the drive transmission mechanism is configured to perform rotational movement of the stage unit by the rotation drive unit corresponding to rotation. , A rotation drive transmission unit connected to the rotation-compatible rotation drive unit and the stage unit, and connected to the stage unit such that a rotation axis through which the stage unit rotates passes through the heater center.

In addition, the drive transmission mechanism includes a base structure that is connected to the stage unit so that the stage unit is rotatable about the rotation axis, and the tilt drive transmission unit has a rotation axis that matches the tilt axis, and the base structure A main spur gear unit having one side fixedly connected to the base structure and a rotation shaft parallel to the tilt shaft so that a side thereof is fixedly connected to the base structure so that the tilt movement is performed around the tilt axis, and the rotation drive unit corresponding to the tilt It includes an auxiliary spur gear unit that is rotated in conjunction with the rotation drive, the rotation drive transmission unit has a rotation axis that coincides with the rotation axis of the main spur gear unit, the rotation degree of freedom that does not interlock with the rotation of the main spur gear unit It extends through the center of the main spur gear unit so as to have, and is rotated in conjunction with the rotation drive of the rotation drive unit corresponding to the rotation, and has a main shaft member provided with a bevel gear at one end thereof, a rotation shaft parallel to the rotation shaft, and The stage unit is rotated about the rotation axis by interlocking with the rotation of the auxiliary shaft member and the auxiliary shaft member provided to be rotated in conjunction with the rotation of the main shaft member by a bevel gear gear-engaged with the bevel gear of the main shaft member. To be moved, it may include a spur gear assembly including a plurality of rotation transmission spur gears that are coupled and connected in series from the auxiliary shaft member to the stage unit.

In addition, one of the plurality of rotation transmission spur gears is connected to the auxiliary shaft member so as to surround the auxiliary shaft member fixedly, and the other of the plurality of rotation transmission spur gears corresponds to the center of the stage unit. It can be connected to the stage shaft member to fixedly surround the periphery of the stage shaft member protruding downward.

In addition, the tilt-driven rotation drive unit is disposed such that the rotation shaft faces the vertical direction, a bevel gear is provided at an upper end of the rotation shaft, and a bevel gear is provided at the other end of the auxiliary spur gear unit, so that the tilt-driven rotation drive unit is provided. Bevel gear and gear can be combined.

In addition, the rotation-compatible rotation drive unit is disposed such that the rotation axis faces the vertical direction, a bevel gear is provided on an upper end of the rotation shaft, and a bevel gear is provided at the other end of the main shaft member to bevel the rotation-driven rotation drive unit. Gears and gears can be combined.

In addition, the sputtering apparatus to which the three-axis drive stage is applied may further include a lifting mechanism that raises and lowers the drive transmission mechanism.

In addition, the lifting mechanism, the rail portion coupled to the rail so as to be able to slide up and down with the drive transmission mechanism; And it may include a lifting drive unit for providing a driving force for raising and lowering the drive transmission mechanism along the rail portion.

The above-described problem solving means are merely exemplary and should not be construed as limiting the present application. In addition to the exemplary embodiments described above, additional embodiments may exist in the drawings and detailed description of the invention.

According to the above-mentioned problem solving means of the present application, heating, inclination angle, rotation, and vertical movement of the substrate may be simultaneously possible.

According to the above-described problem solving means of the present application, by controlling the surface roughness of the thin film according to the inclination angle, it is possible to secure the optimum inclination angle condition and minimize the thin film stress through the same, and secure the uniformity of the thin film by simultaneously rotating the substrate. can do.

According to the above-described problem solving means of the present application, the tilt axis may pass through the heater center of the stage unit to maintain the inclined origin when tilting, and the stage unit may be rotated at an inclination of up to 90 degrees.

According to the above-mentioned problem solving means of the present application, even in a small target size, thin film uniformity can be secured, and target manufacturing cost can be reduced.

According to the above-described problem solving means of the present application, uniform thin film deposition may be possible on a texturing substrate.

However, the effects obtainable herein are not limited to the above-described effects, and other effects may exist.

1 is a perspective view of a sputtering device to which a 3-axis drive stage is applied according to an embodiment of the present application.
2 is a cross-sectional view taken along line AA of FIG. 1.
3 is a view for explaining a state in which the stage unit is tilted with respect to the tilt axis.
4A is a photograph for explaining a state in which the substrate is not brought into the chamber while being coupled to the bonding member.
4B is a photograph for explaining a state in which the substrate is mounted and fixed to the stage unit.

Hereinafter, embodiments of the present application will be described in detail with reference to the accompanying drawings so that those skilled in the art to which the present application pertains may easily practice. However, the present application may be implemented in various different forms and is not limited to the embodiments described herein. In addition, in order to clearly describe the present application in the drawings, parts irrelevant to the description are omitted, and like reference numerals are assigned to similar parts throughout the specification.

Throughout this specification, when a part is "connected" to another part, it is not only "directly connected", but also "electrically connected" or "indirectly connected" with another element in between. "It also includes the case where it is.

Throughout the present specification, when a member is positioned on another member “on”, “on the top”, “top”, “bottom”, “bottom”, “bottom”, this means that one member is attached to another member. This includes cases where there is another member between the two members as well as when in contact.

Throughout this specification, when a part “includes” a certain component, it means that the component may further include other components, not to exclude other components, unless otherwise stated.

Throughout the present specification, terms related to the direction or position (upper, upper, upper, upper, lower, lower, lower, lower, vertical, vertical, and horizontal) are based on the arrangement of each component shown in the drawings. It is explained. For example, based on FIG. 2, the 12 o'clock direction may be the upper side, and the 6 o'clock direction may be the lower side. In addition, the 12 o'clock to 6 o'clock direction may be a vertical direction and a vertical direction. Also, the 3-9 o'clock direction may be a horizontal direction.

1 is a perspective view of a sputtering apparatus to which a 3-axis drive stage is applied according to an embodiment of the present application, FIG. 2 is a cross-sectional view taken along line AA of FIG. 1, and FIG. 3 illustrates a state in which the stage unit is tilted based on the tilt axis It is a drawing.

The sputtering apparatus 1000 to which the 3-axis drive stage is applied according to an embodiment of the present application is a sputtering apparatus for forming a thin film on a substrate 1 as a workpiece.

Hereinafter, the sputtering apparatus 1000 to which the three-axis drive stage according to an embodiment of the present application is applied will be referred to as the sputtering apparatus 1000 for convenience of description.

1 to 3, the present sputtering apparatus 1000 includes a tilt-driven rotation drive unit 100, a stage unit 200 and a drive transmission mechanism 300.

The tilt-driven rotation drive unit 100 is disposed such that the rotation axis faces the vertical direction, and a bevel gear may be provided on the top of the rotation axis. Here, the bevel gear (Bevel gear) may be one that is commonly used to transmit the motion between the two axes to meet the right angle, such as the shape of the gear is formed in a conical shape. Accordingly, the bevel gear of the tilt-driven rotation drive unit 100 and the bevel gear provided at the other end of the auxiliary spur gear 312, which will be described later, are engaged with each other (gear-coupled) and rotated, so that the tilt-driven rotation drive with the vertical direction as a central axis The rotational force of the unit 100 may be converted into a rotational force that rotates around a rotation axis coinciding with or parallel to the tilt axis 110 to be described later.

4A is a photograph illustrating a state in which the substrate is not brought into the chamber in a state where the substrate is coupled to the bonding member, and FIG. 4B is a photograph illustrating a state in which the substrate is seated and fixed to the stage unit.

1 to 4B, the stage unit 200 is mounted with a substrate 1, which is an object to be formed to form a thin film. The stage unit 200 may be disposed in a chamber maintaining a vacuum atmosphere. In addition, the substrate 1 may be carried into the chamber while being held in the stage unit 200 while the vacuum state of the chamber is maintained by the load lock device 600. This is obvious to a person skilled in the art, so a more detailed description is omitted.

The load lock device 600 and the substrate 1 may be detachably coupled via a coupling member 610. That is, the coupling member 610 may be detachably coupled to the load lock device 600.

The stage unit 200 may include a coupling protrusion 230 protruding upward in the normal direction. At the same time, the coupling member 610 may form a coupling hole 611 through which the coupling protrusion 230 is inserted so as to be coupled with the stage unit 200 through the vertical direction.

In addition, when the stage unit 200 is rotated by a predetermined angle in the unidirectional direction by the rotation-driven rotation drive unit 400 to be described later, the coupling hole 230 releases the coupling between the stage unit 200 and the coupling member 610. The radius of the coupling hole can be formed to be as large as possible. Conversely, when the stage unit 200 is rotated by a predetermined angle in the unidirectional reverse direction by the rotation drive unit 400 corresponding to the rotation, the radius of the coupling hole is coupled so that the stage unit 200 and the coupling member 610 are coupled. It may be formed to be small corresponding to the diameter of the projection 230. Accordingly, the substrate 1 is brought into the chamber by the load lock device 600 and the coupling member 610 coupled with the substrate 1 is seated and fixed on the stage unit 200, thereby driving three axes (tilt, rotation, When lift), the separation of the substrate 1 can be suppressed.

The drive transmission mechanism 300 is connected to the tilt-driven rotation drive unit 100 and the stage unit 200 so that the tilt movement of the stage unit 200 is performed by driving the tilt-driven rotation drive unit 100. do.

Referring to FIG. 1, the stage unit 200 and the drive transmission mechanism 300 may be disposed on the upper side of the frame 700, and the stage unit 200 and the drive transmission mechanism 300 have a vacuum atmosphere. It is maintained and can be placed in a chamber disposed at the top of the frame 700. A part of the tilt-compatible rotation drive unit 100 (including a bevel gear) is maintained in the vacuum atmosphere of the chamber while the tilt-compatible rotation drive unit 100 is disposed under the frame 700, and is inserted into the chamber to drive driving mechanism ( 300) can be geared with a bevel gear. In this regard, since it is apparent to those skilled in the art, a more detailed description will be omitted.

As another example, the stage unit 200, the drive transmission mechanism 300, the tilt-driven rotation drive unit 100, and the like may be disposed in the chamber maintaining the vacuum state.

1 and 3, the drive transmission mechanism 300 includes a stage unit 200 such that the tilt axis 110 through which the stage unit 200 is tilted passes through the heater center 210 of the stage unit 200. ) Connected to the tilt driving transmission unit 310.

Here, the heater center 210 may mean a center point of the stage unit 200. The stage unit 200 may incline the tilt axis 110 to the central axis.

In a state in which the tilt shaft 110 passes through the heater center 210, the tilt-compatible rotation drive unit 100 may be disposed at various positions of the frame 700 by different combinations of bevel gears, spur gears, and the like. .

The tilt drive transmission unit 310 has a rotation axis parallel to the tilt axis 110 so as to be geared (engaged) with the main spur gear unit 311, which will be described later, and interlocks with the rotation drive of the rotation drive unit 100 corresponding to the tilt. And an auxiliary spur gear unit 312 that is rotated. At this time, a bevel gear is provided at the other end of the auxiliary spur gear unit 312 to be gear-coupled with the bevel gear of the tilt-driven rotation drive unit 100.

In detail, as the above-described tilt-compatible rotation drive unit 100 rotates with the vertical direction as the rotation axis, the bevel gear at the upper end of the tilt-compatible rotation drive unit 100 rotates with the vertical direction as the rotation axis, and supports tilt. The bevel gear of the rotation drive unit 100 is engaged with the bevel gear of the auxiliary spur gear unit 312 provided at the other end of the auxiliary spur gear unit 312 (gear engagement) and tilts the bevel gear of the auxiliary spur gear unit 312 It can be rotated around a rotation axis parallel to the shaft 110. At the same time, the main spur gear unit 311 is gear-engaged with the auxiliary spur gear unit 312, and thus can be rotated around a rotation axis that coincides with the tilt axis 110.

The tilt drive transmission unit 310 has a rotation axis that coincides with the tilt axis 110, and one side thereof is fixedly connected to the base structure 330 so that the base structure 330 is tilted around the tilt axis 110 The main spur gear unit 311 may be included.

As the main spur gear unit 311 is tilted around a rotation axis that coincides with the tilt axis 110, the base structure 330 connected to the main spur gear unit 311 is tilted axis 110 that coincides with the rotation axis It can be tilted around. At this time, the base structure 330 may be formed in a'b' shape when viewed from the front, and the'b' shape base structure 330 and the vertical base 331 orthogonal to the tilt axis 110 It may include a horizontal base 332 parallel to the tilt axis (110). The vertical base 331 is connected to the main spur gear unit 311 and is tilted about a rotation axis coinciding with the tilt axis 110 by the main spur gear unit 311, and the horizontal base 332 is a vertical base 331 ) Can be tilted around a rotation axis coincident with the tilt axis 110 by a vertical base 331. At this time, the stage unit 200 includes a stage shaft member 220 that protrudes downward, which will be described later, and the lower end of the stage shaft member 220 is connected to the horizontal base 331 so that the horizontal face 331 is tilted. As the shaft member 220 is tilted, as a result, the stage unit 200 may be tilted around the heater center 210 and the tilt shaft 110.

The sputtering apparatus 1000 further includes a rotation drive unit 400 for rotation, and the drive transmission mechanism 300 is rotated by the rotation drive unit 400 for rotation. To be made, it may be connected to the rotation-driven rotation drive unit 400 and the stage unit 200.

Referring to FIG. 1, a part of the rotation-response rotation drive unit 400 (including a bevel gear) maintains a vacuum atmosphere in the chamber while the rotation-response rotation drive unit 400 is disposed below the frame 700. It is inserted into the chamber and can be in contact with the bevel gear of the drive transmission mechanism 300 (gear engagement). In this regard, since it is apparent to those skilled in the art, a more detailed description will be omitted.

As another example, the stage unit 200, the drive transmission mechanism 300, and the rotation-driven rotation drive unit 400, etc. may be disposed in the chamber maintaining the vacuum state.

The sputtering apparatus 1000 may include a rotation driving transmission unit 320 connected to the stage unit 200 so that the rotation axis 410 through which the stage unit 200 is rotated passes through the heater center 210. .

The stage unit 200 may rotate the rotation axis 410 about the central axis. In a state in which the rotation shaft 410 passes through the heater center 210, the rotation-compatible rotation drive unit 400 may be disposed at various positions of the frame 700 by different combinations of bevel gears, spur gears, and the like. .

The rotation-adaptive rotation drive unit 400 is disposed such that the rotation axis faces the vertical direction, a bevel gear is provided on an upper end of the rotation shaft, and a bevel gear is provided at the other end of the main shaft member 321, which will be described later. Bevel gear of the unit 400 may be geared.

In detail, as the rotation-compatible rotation drive unit 400 rotates with the rotational direction as the rotational axis, the bevel gear of the rotation-compatible rotation drive unit 400 rotates with the rotational direction as the rotational axis, and the rotational rotational rotation drive unit 400 The bevel gear of 400 is engaged with the bevel gear of the main shaft member 321 provided at the other end of the main shaft member 321 to be described later (gear coupling), and the bevel gear of the main shaft member 321 is tilted shaft 110 It can be rotated around the axis of rotation that coincides with. Although described above, the bevel gear may be one that is commonly used to transmit a motion between two axes by forming a gear in a cone shape and meeting at right angles. Therefore, the main shaft member 321 of the rotation driving transmission unit 320, which will be described later, may be rotated around a rotation axis that coincides with the tilt axis 110.

The rotation drive transmission unit 320 has a rotation axis that coincides with the rotation axis of the main spur gear unit 311 and the main spur gear unit 311 to have a rotational degree of freedom that does not interlock with the rotation of the main spur gear unit 311 It may extend through the center of the rotation, and rotates in conjunction with the rotational drive of the rotational drive unit 400 corresponding to the rotation, may include a main shaft member 321 is provided with a bevel gear at one end.

In detail, the main spur gear unit 311 may be formed with a hollow through which a pivot axis coincides with the tilt axis 110. The main shaft member 321 penetrates through the hollow of the main spur gear unit 311 and the other end of the main shaft member 321 may be provided with a bevel gear to be gear-engaged with the bevel gear of the rotation drive unit 400 corresponding to the rotation. . At this time, between the main circumferential surface of the main spur gear unit 311 (the inner surface of the main spur gear unit 311) and the outer peripheral surface of the main shaft member 320, the main spur gear unit 311 and the main shaft member 321 The sliding member 320a may be interposed to reduce frictional force generated in the liver. As it is obvious to a person skilled in the art with respect to the sliding member 320a, a more detailed description will be omitted. Therefore, the main shaft member 321 has a rotation degree of freedom with the main spur gear unit 311 and can be rotated.

The drive transmission mechanism 300 may include a base structure 330 connected to the stage unit 200 such that the stage unit 200 is rotatable about the rotation axis 410.

The vertical base 331 of the base structure 330 may similarly be formed with a hollow through which a pivot axis coinciding with the tilt axis 110 passes, and the main shaft member 321 penetrates through the hollow of the vertical base 331 A bevel gear may be provided at one end of the main shaft member 321 to be geared with a bevel gear provided on the upper side of the auxiliary shaft member 322 to be described later. That is, the main shaft member 321 penetrates through the hollow of the main spur gear unit 311 and the hollow of the vertical base 331, and bevel gears may be provided at both ends. At this time, the frictional force between the vertical base 331 and the main shaft member 321 is reduced between the hollow circumferential surface of the vertical base 331 (the inner surface of the vertical base 331) and the outer peripheral surface of the main shaft member 320. The sliding member 320a may be interposed as much as possible. Therefore, the main shaft member 321 has a rotational degree of freedom with the vertical base 331 and can be rotated.

The rotation drive transmission unit 320 has a rotation axis parallel to the rotation axis 410, and is rotated in cooperation with rotation of the main shaft member 321 by a bevel gear gear-engaged with a bevel gear of the main shaft member 321 It may include an auxiliary shaft member 322 is provided.

In more detail, when the main shaft member 321 is rotated around the rotation axis that coincides with the tilt axis 110 by the rotation drive unit 400 for rotation, the bevel gear of one end of the main shaft member 321 is tilted. By pivoting around a pivot axis coinciding with the shaft 110 and gearing with a bevel gear provided at the upper end of the secondary shaft member 322, the secondary shaft member 322 rotates around a rotation axis parallel to the rotation shaft 410. Can be.

The rotation drive transmission unit 320 is coupled to the rotation of the auxiliary shaft member 322 so that the stage unit 200 is rotated around the rotation axis 410, the stage unit 200 in the auxiliary shaft member 233 It may include a spur gear assembly 323 including a plurality of rotation transmission spur gears (323a, 323b, 323c) are connected to the chain in a chain.

In addition, any one of the plurality of rotation transmission spur gears 323a, 323b, and 323c (rotation transmission spur gear 323a) may be connected to the auxiliary shaft member 322 to surround the auxiliary shaft member 322 in a fixed manner. have. Therefore, the rotation transmission spur gear 323a fixedly enclosing the auxiliary shaft member 322 may be rotated around the rotation axis 420 in response to the rotation movement of the auxiliary shaft member 322.

The other of the plurality of rotation transmission spur gears 323a, 323b, and 323c (rotation transmission spur gear 323c) is fixed to the periphery of the stage shaft member 220 protruding downwardly corresponding to the center of the stage unit 200 It may be connected to the stage shaft member 220 to wrap. Therefore, the stage unit 200 rotates about the rotation axis 420 as the stage axis member 220 rotates in response to the rotation movement of the rotation transmission spur gear 323c that wraps the stage axis member 220 fixedly. Can be moved.

As a result, when the rotation-adaptive rotation drive unit 400 is rotated clockwise around the rotation axis 410 when viewed in a plan view, the other bevel gear of the main shaft member 321 is rotated by gear coupling between the bevel gears. When viewed from the left (9 o'clock in Fig. 2) around a pivot axis orthogonal to the shaft 420, the rotation moves counterclockwise, so that the bevel gear of the main shaft member 321 is right (3 o'clock in Fig. 2) Direction), the rotation may move clockwise around a rotation axis orthogonal to the rotation axis 420. In this case, the auxiliary shaft member 322 and the rotation transmission spur gear 323a are counterclockwise when viewed from a plane by gear coupling between a bevel gear at one end of the main shaft member 321 and a bevel gear at the top of the auxiliary shaft member 322. By rotating, the rotation transmission spur gear 323b is geared with the rotation transmission spur gear 323a, so that it can rotate clockwise when viewed from a plane. Therefore, the rotation transmission spur gear 323b and the rotation transmission spur gear 323c and the rotation transmission spur gear 323c fixedly connected to the stage unit 200 are rotated counterclockwise when viewed from the plane. Can be moved. It is preferable that the rotation movement direction of the rotation driving unit 400 corresponding to the rotation is set in consideration of the target rotation movement direction of the stage unit 200.

At this time, the lower end of the shaft member (secondary shaft member 322, stage shaft member 220, etc.) passing through the plurality of rotation transmission spur gears 323a, 323b, 323c may be connected on the horizontal base 332, The sliding member 320a is provided between the horizontal base 332 and the shaft member (secondary shaft member 322, stage shaft member 220, etc.) so that the frictional force between the horizontal base 332 and the shaft member is reduced to have rotational rotational freedom. Can be intervened.

The sputtering apparatus 1000 may include a lifting mechanism 500 that raises and lowers the drive transmission mechanism 300.

Referring to FIGS. 1 to 3, the lifting mechanism 500 may be disposed below the frame 700 to support the lower surface of the drive transmission mechanism 300. When the drive transmission mechanism 300 in the chamber is lifted by the lifting mechanism 500, a part of the lifting mechanism 500 can be inserted into the chamber while maintaining the vacuum atmosphere in the chamber. In this regard, since it is apparent to those skilled in the art, a more detailed description will be omitted. In addition, the chamber may include both the stage unit 200, the drive transmission mechanism 300 and the lifting mechanism 500.

The lifting mechanism 500 provides a driving force to elevate and move the driving transmission mechanism 300 along the rail portion 510 and the rail portion 510 that are rail-coupled so as to be able to slide up and down with the driving transmission mechanism 300. It may include a lifting drive unit 520.

That is, the block 512 is moved up and down on the rail 511 by the lifting drive unit 520, and a lift bar 530 is connected to the block 512 to move up and down in response to the movement of the block 512. Can be. At the same time, the upper end of the lift bar 530 is connected to the driving transmission mechanism 300 to move the driving transmission mechanism 300 up and down. In this regard, since it is apparent to those skilled in the art, a more detailed description will be omitted.

As described above, the vacuum atmosphere in the chamber is maintained, and the lift bar 530 is inserted into the chamber to lift the drive transmission mechanism 300.

As described above, the substrate 1 is tilted, rotated, and lifted in the chamber, so that uniformity of the thin film may be secured even in a small target size. The size of the target used in the conventional sputtering device is 366 mm, but the size of the target used in the sputtering device 1000 may be 288 mm. Therefore, the target manufacturing cost can be reduced.

The RMS (root mean square roughness of the surface) of the thin film deposited without tilting the substrate (0 degree) is approximately 55 nm, while the RMS of the central portion when depositing the thin film by tilting the substrate 30 degrees. Since the roughness is approximately 203.2 nm, and the RMS roughness of the corner portion is approximately 114.8 nm, the roughness of the entire sphere may be increased. In this way, roughness can be controlled by controlling the inclination of the substrate.

The foregoing description of the present application is for illustration, and a person having ordinary knowledge in the technical field to which the present application belongs will understand that it is possible to easily change to other specific forms without changing the technical spirit or essential characteristics of the present application. Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive. For example, each component described as a single type may be implemented in a distributed manner, and similarly, components described as distributed may be implemented in a combined form.

The scope of the present application is indicated by the claims below, rather than the detailed description, and it should be interpreted that all modifications or variations derived from the meaning and scope of the claims and equivalent concepts thereof are included in the scope of the present application.

1000: sputtering device
1: Substrate
100: tilt-driven rotation drive unit
110: tilt axis
200: stage unit
210: heater center
220: stage shaft member
300: drive transmission mechanism
310: tilt drive transmission
311: main spur gear unit
312: auxiliary spur gear unit
320: rotation drive transmission unit
321: Main shaft member
322: secondary shaft member
323: spur gear assembly
323a, 323b, 323c: rotation transmission spur gear
330: base structure
400: rotation drive unit for rotation
410: rotation axis
500: lifting mechanism
510: rail
520: lifting drive unit

Claims (8)

In the sputtering device for forming a thin film on a substrate to be treated,
A tilt-driven rotation drive unit;
A stage unit on which the substrate is seated; And
The tilt-driven rotation drive unit comprises a drive transmission mechanism connected to the tilt-driven rotation drive unit and the stage unit so that tilt movement of the stage unit is achieved by rotational drive of the rotation drive unit,
The drive transmission mechanism, the sputtering device comprising a tilt drive transmission that is connected to the stage unit so that the tilt axis through which the stage unit is tilted passes through the heater center of the stage unit. According to claim 1,
Further comprising a rotation drive unit for rotation,
The drive transmission mechanism is connected to the rotation-response rotation drive unit and the stage unit so that the rotational movement of the stage unit is performed by the rotation-response rotation drive unit, wherein the rotation axis is rotated. And a rotation driving transmission part connected to the stage unit to pass through the heater center. According to claim 2,
The drive transmission mechanism includes a base structure connected to the stage unit so that the stage unit is rotatable about the rotation axis,
The tilt drive transmission unit,
A main spur gear unit having a rotation axis coincident with the tilt axis, and one side of which is fixedly connected to the base structure so that the base structure is tilted around the tilt axis; And
And an auxiliary spur gear unit having a rotation axis parallel to the tilt axis so as to be gear-engaged with the main spur gear unit, and being rotated in cooperation with the rotation drive of the rotation drive unit corresponding to the tilt,
The rotation drive transmission unit,
It extends through the center of the main spur gear unit so as to have a rotational axis that coincides with the rotational axis of the main spur gear unit and has a rotational degree of freedom that does not interlock with the rotation of the main spur gear unit. A main shaft member which is rotated in connection with a rotation drive, and is provided with a bevel gear at one end thereof;
An auxiliary shaft member having a rotation axis parallel to the rotation axis, and provided to be rotated in cooperation with rotation of the main shaft member by a bevel gear gear-engaged with a bevel gear of the main shaft member; And
A spur gear comprising a plurality of rotation transmission spur gears which are coupled to and connected in series from the auxiliary shaft member to the stage unit so that the stage unit is rotated around the rotation axis in association with the rotation of the auxiliary shaft member. A sputtering device comprising an assembly. According to claim 3,
Any one of the plurality of rotation transmission spur gear is connected to the auxiliary shaft member so as to surround the auxiliary shaft member fixedly,
The other of the plurality of rotation transmission spur gears is a sputtering device that is connected to the stage shaft member so as to be fixed around the periphery of the stage shaft member protruding downwardly corresponding to the center of the stage unit. According to claim 3,
The tilt-driven rotation drive unit is disposed such that the rotation axis faces the vertical direction, and a bevel gear is provided at the top of the rotation axis,
The other spur gear unit is provided with a bevel gear on the other end of the sputtering device, which is gear-coupled with the bevel gear of the tilt-compatible rotation drive unit. According to claim 3,
The rotation-adaptive rotation drive unit is arranged such that the rotation axis faces the vertical direction, and a bevel gear is provided at an upper end of the rotation axis,
The other end of the main shaft member is provided with a bevel gear is a sputtering device that is gear-engaged with the bevel gear of the rotation-compatible rotation drive unit. According to claim 1,
The sputtering device further comprises a lifting mechanism for raising and lowering the drive transmission mechanism. The method of claim 6,
The lifting mechanism,
A rail part coupled to the drive transmission mechanism to be movable in a vertical direction; And
And a lifting drive unit that provides a driving force for raising and lowering the drive transmission mechanism along the rail portion.

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