JPS5845175B2 - Rotary evaporation equipment - Google Patents

Rotary evaporation equipment

Info

Publication number
JPS5845175B2
JPS5845175B2 JP10533279A JP10533279A JPS5845175B2 JP S5845175 B2 JPS5845175 B2 JP S5845175B2 JP 10533279 A JP10533279 A JP 10533279A JP 10533279 A JP10533279 A JP 10533279A JP S5845175 B2 JPS5845175 B2 JP S5845175B2
Authority
JP
Japan
Prior art keywords
substrate
driven roller
rotating frame
deposited film
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10533279A
Other languages
Japanese (ja)
Other versions
JPS5638824A (en
Inventor
俊則 浦出
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10533279A priority Critical patent/JPS5845175B2/en
Publication of JPS5638824A publication Critical patent/JPS5638824A/en
Publication of JPS5845175B2 publication Critical patent/JPS5845175B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Description

【発明の詳細な説明】 本発明は、同時に収容した複数の基板面に順次蒸着膜を
形成する回転式蒸着装置の改善に係り、とくに蒸着膜形
成基板載置用の懸垂具を回転枠に軸支した形で取付け、
かつ従動ローラとガイド部材とによって回転中の懸垂具
の角度を規制するように改良した新しい蒸着装置に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement of a rotary evaporation apparatus that sequentially forms evaporated films on the surfaces of a plurality of substrates accommodated at the same time. Installed in a supported manner,
The present invention also relates to a new vapor deposition apparatus which has been improved so that the angle of the rotating hanging device is regulated by a driven roller and a guide member.

従来、例えば間接放電型ガス放電表示パネルの製造工程
において、ガラス基板上に形成した所定パターンの電極
を被覆してAl2O3などの誘電体層を形成する場合、
量産性の見地から第1図に示すような回転式蒸着装置が
用いられていた。
Conventionally, for example, in the manufacturing process of indirect discharge type gas discharge display panels, when a dielectric layer such as Al2O3 is formed by covering a predetermined pattern of electrodes formed on a glass substrate,
From the standpoint of mass production, a rotary vapor deposition apparatus as shown in FIG. 1 was used.

すなわち第1図において、1は蒸着槽となる円筒状の真
空容器、2は前記真空容器1の中に設置された蒸着試料
容器、3は前記蒸着試料容器内に収容される蒸着試料、
4は蒸着すべき基板5を固定する回転枠、6は加熱ヒー
タ、1は前記回転枠4を回動する回転伝導ローラである
That is, in FIG. 1, 1 is a cylindrical vacuum container serving as a vapor deposition tank, 2 is a vapor deposition sample container installed in the vacuum container 1, 3 is a vapor deposition sample accommodated in the vapor deposition sample container,
4 is a rotating frame for fixing the substrate 5 to be vapor-deposited; 6 is a heater; 1 is a rotation transmission roller for rotating the rotating frame 4;

このような構成の回転式蒸着装置においては、あらかじ
め電極パターンを形成した基板5を回転枠4の各辺に被
蒸着面が内向きとなるよう取付け、さらにAl2O3な
どの所定の蒸着試料3を蒸着試料容器2に収容する。
In a rotary evaporation apparatus having such a configuration, a substrate 5 on which an electrode pattern has been formed in advance is attached to each side of the rotating frame 4 so that the surface to be evaporated faces inward, and a predetermined evaporation sample 3 such as Al2O3 is evaporated. The sample is stored in the sample container 2.

そして真空容器1内を図示しない真空ポンプで排気し高
真空を保持した状態で回転枠4を回転伝導ローラ1によ
って矢印A方向に回転すると、基板5の蒸着膜形成面が
蒸着試料3の上側に順次位置するようになる。
Then, when the vacuum chamber 1 is evacuated by a vacuum pump (not shown) and the rotating frame 4 is rotated in the direction of arrow A by the rotational conduction roller 1 while maintaining a high vacuum, the surface on which the vapor deposited film of the substrate 5 is formed is placed above the vapor deposition sample 3. They will be located sequentially.

かくして前記蒸着試料3を加熱して蒸発せしめれば前記
回転枠4の各辺に取り付けた複数の基板5のそれぞれの
蒸着膜形成面に順次蒸着膜を形成することができる。
By heating and evaporating the vapor deposition sample 3 in this manner, a vapor deposition film can be sequentially formed on each of the vapor deposition film formation surfaces of the plurality of substrates 5 attached to each side of the rotating frame 4.

しかしながらかかる構成の回転式蒸着装置にあっては、
基板5の蒸着膜形成面のみならずその他の部分にも蒸着
膜が付着する。
However, in a rotary evaporation apparatus with such a configuration,
The vapor deposited film adheres not only to the vapor deposited film forming surface of the substrate 5 but also to other parts.

その付着物が数8以上の厚さとなると、真空容器1内の
熱サイクル等によって該付着物が剥離し易くなって落下
する場合がある。
If the thickness of the deposit is greater than 8, the deposit may easily peel off due to thermal cycles within the vacuum container 1 and may fall.

この場合に蒸着膜を形成する基板5の内、下側に位置し
ている基板は蒸着膜形成面が上向きとなっているため、
当該蒸着膜形成面−Fに前記付着物が剥離して落下する
と、そのまま異物として残留し、次の蒸着膜との間に閉
じ込められたりして蒸着膜の均一性を損なう欠点があっ
た。
In this case, among the substrates 5 on which the vapor deposited film is formed, the substrate located on the lower side has the vapor deposited film forming surface facing upward.
When the deposits peel off and fall on the vapor deposited film formation surface -F, they remain as foreign matter and are trapped between the next vapor deposited film, which impairs the uniformity of the vapor deposited film.

そこで本発明者等は、先に第2図に示すような回転式蒸
着装置の改良を提案した。
Therefore, the present inventors previously proposed an improvement to a rotary vapor deposition apparatus as shown in FIG.

これは蒸着膜形成基板5を常時下向きに保持した状態で
回転枠8を回転させる考え方を骨子としたもので、第2
図中8は基板5を吊下げる回転枠、9は前記回転枠8の
円周上の略等間隔の位置に軸10により回動自在に軸支
された複数の吊下げ具である。
This is based on the concept of rotating the rotating frame 8 while the vapor-deposited film forming substrate 5 is always held downward.
In the figure, reference numeral 8 denotes a rotating frame from which the substrate 5 is suspended, and 9 denotes a plurality of hanging tools rotatably supported by a shaft 10 at substantially equally spaced positions on the circumference of the rotating frame 8.

この第2図のような構成とすることによって基板5を前
記複数の吊下げ具9に蒸着膜形成面が下向きとなるよう
取り付け、前記回転枠8を矢印A方向に回転すると、基
板5を取り付けた吊下げ具9は重力によって常時水平状
態を保持された形となり、基板5の蒸着膜形成面も常に
下向きとなる。
With the configuration shown in FIG. 2, the substrate 5 is attached to the plurality of hanging tools 9 so that the deposited film forming surface faces downward, and when the rotating frame 8 is rotated in the direction of arrow A, the substrate 5 is attached. The hanging tool 9 is always held horizontally by gravity, and the surface of the substrate 5 on which the vapor deposited film is formed also always faces downward.

かくして基板5の蒸着膜形成面以外に付着した不要な蒸
着物が剥離し落下しても、前記基板5の蒸着膜形成面は
常時下側を向いた形で水平状態にあるので、蒸着膜形成
面に付着することがなくなり、高品質の蒸着膜が形成で
きることになる。
In this way, even if unnecessary vapor deposits attached to a surface other than the surface on which the vapor deposited film is formed of the substrate 5 peel off and fall, the surface on which the vapor deposited film is formed on the substrate 5 is always in a horizontal state facing downward, so that the vapor deposited film cannot be formed. This eliminates the possibility of adhesion to the surface, making it possible to form a high-quality deposited film.

しかしこのような同転式蒸着方法では懸垂具がその自重
によって常に垂直方向を向いており、基板の外側回転軌
跡は長円状となるので円筒状の真空容器1内で蒸着でき
る基板5の大きさに制限があり、たとえば点線で示す基
板5′のような大型基板となると上下の位置では伺ら支
障を生じないが横方向で回転軌跡が容器1に衝突して該
真空容器1円での蒸着は不可能となり、真空容器自体の
構造を改造しなければならない問題を生じてきた。
However, in such a co-rotating vapor deposition method, the hanging device always faces in the vertical direction due to its own weight, and the outer rotation locus of the substrate becomes an ellipse. For example, when it comes to a large substrate such as the substrate 5' shown by the dotted line, there is no problem in the vertical position, but the rotation locus collides with the container 1 in the lateral direction, causing the vacuum container 1 circle to be damaged. Vapor deposition has become impossible, creating the problem of having to modify the structure of the vacuum vessel itself.

本発明は前記の問題を解消すべくなされたもので、大型
の基板にあっても真空容器の形状や大きさを変えること
なく蒸着膜の形成を可能に1−だ新却な回転式蒸着装置
を提供するものである。
The present invention was made to solve the above problems, and is the only innovative rotary evaporation device that enables the formation of evaporated films without changing the shape or size of the vacuum container even on large substrates. It provides:

簡単に述べると、本発明は回転枠をそなえた回転式蒸着
装置において、前記回転枠に蒸着膜形成基板載置用の懸
垂具を複数個はぼ等角度で同動自在に軸支して設け、か
つ該懸垂具の少なくとも一側に従動ローラを付設すると
ともに、前記回転枠の側方に該従動ローラを案内して前
記懸垂具の角度を規制するガイド部材を設けたことを特
徴とするものである。
Briefly stated, the present invention provides a rotary evaporation apparatus equipped with a rotating frame, in which a plurality of hanging devices for placing a vapor-deposited film forming substrate are provided on the rotating frame so as to be rotatably supported at approximately equal angles. and a driven roller is attached to at least one side of the suspension device, and a guide member is provided on the side of the rotating frame to guide the driven roller and regulate the angle of the suspension device. It is.

以−F図面を参照しながら本発明に係る回転式蒸着装置
について詳細に説明する。
Hereinafter, the rotary vapor deposition apparatus according to the present invention will be explained in detail with reference to the drawings.

第3図は、本発明に係る回転蒸着装置の一実施例を示す
側断面図で、前図と同等の部分については同一符号を付
しである。
FIG. 3 is a side cross-sectional view showing one embodiment of the rotary evaporation apparatus according to the present invention, in which the same parts as in the previous figure are given the same reference numerals.

11は前記回転枠8の両側板の円周上でほぼ等間隔の位
置に軸12により[1]]動自在に軸支された6個の懸
垂具で、該懸垂具11を軸支している軸12の一側端部
に従動ローラ保持板13を軸着し、該従動ローラ保持板
の両端には1対の従動ローラ14が回動自在に軸支され
ている。
Reference numeral 11 denotes six suspension devices movably supported by shafts 12 [1] at positions approximately equally spaced on the circumference of both side plates of the rotating frame 8, and the suspension devices 11 are pivotally supported. A driven roller holding plate 13 is pivotally attached to one end of the shaft 12, and a pair of driven rollers 14 are rotatably supported at both ends of the driven roller holding plate.

また回転枠8の側方には従動ローラ14を案内するガイ
ド部材15が設けられている。
Further, a guide member 15 for guiding the driven roller 14 is provided on the side of the rotating frame 8.

このような構成とすることによって、蒸着膜を形成する
基板5を各懸垂具11に蒸着面が下向きとなるよう嵌め
込み、前記回転枠8が回転伝導ローラ7によって矢印A
方向に回転すると、基板5を嵌め込んだ懸垂具11が回
転枠8の上方にあるときは重力によって水平状態を保持
された形となり、基板5の蒸着膜形成面は常に下向きと
なるが、前記回転枠8が引続きA方向に回転して懸垂具
11が側方に回動すると、従動ローラ14が2点破線で
示すガイド15に案内され規制された傾斜角にしたがっ
て回動し、前記懸垂具11が回転枠8の下方に回動した
ときはほぼ水平状態を保持する形となり、基板5の蒸着
膜形成面は下向きとなる。
With this configuration, the substrate 5 on which the vapor deposited film is to be formed is fitted into each suspension tool 11 with the vapor deposition surface facing downward, and the rotating frame 8 is rotated by the rotation transmission roller 7 in the direction indicated by the arrow A.
When the suspension device 11 into which the substrate 5 is fitted is placed above the rotating frame 8, it is held in a horizontal state by gravity, and the vapor deposited film forming surface of the substrate 5 always faces downward. When the rotating frame 8 continues to rotate in the A direction and the suspension device 11 rotates laterally, the driven roller 14 is guided by the guide 15 shown by the two-dot broken line and rotates according to the regulated inclination angle, and the suspension device 11 rotates according to the regulated inclination angle. When the rotating frame 11 is rotated below the rotating frame 8, it maintains a substantially horizontal state, and the surface of the substrate 5 on which the deposited film is formed faces downward.

このように回転枠8に回動自在に軸支された懸垂具11
が上方にあるときは重力によって水平状態となり、懸垂
具11が側面あるいは下方にあるときはガイド15に案
内される従動ローラ14にしたがって傾斜しながら回動
するが、この傾斜角は音大のときでも90°゛以下で下
向きを維持するようになっている。
The suspension device 11 is rotatably supported on the rotating frame 8 in this way.
When it is above, it is in a horizontal state due to gravity, and when the suspension device 11 is on the side or below, it rotates while tilting according to the driven roller 14 guided by the guide 15. However, it maintains a downward direction below 90°.

本発明はこのように蒸着膜形成基板5の回動軌跡をガイ
ド部材と従動ローラとによって規制するようにした構成
を特徴とするものである。
The present invention is characterized by a configuration in which the rotation locus of the vapor deposited film forming substrate 5 is regulated by the guide member and the driven roller.

かくして基板5の蒸着膜形成面以外に付着した不要な蒸
着物が剥離し落下しても、前記基板5の蒸着膜形成面に
付着することがなくなり、高品質の蒸着膜が形成できる
わけである。
In this way, even if unnecessary vapor deposits attached to surfaces other than the vapor deposited film forming surface of the substrate 5 peel off and fall, they will not adhere to the vapor deposited film forming surface of the substrate 5, and a high quality vapor deposited film can be formed. .

さらに前記基板5を保持した懸垂具11は従動ローラ1
4によってそれぞれ規制された傾斜角にしたがって回動
するので、基板5′のような大型の基板でも容器の内壁
に衝突することなく効率よく蒸着できるわけである。
Further, the suspension device 11 holding the substrate 5 is attached to the driven roller 1.
4, it is possible to efficiently deposit even a large substrate such as the substrate 5' without colliding with the inner wall of the container.

第4図は、本実施例による懸垂具11とガイド部材15
の詳細図で、aは懸垂具11の斜視図、bはガイド部材
15iL向図で、懸垂具11の−側端部に従動ローラ保
持板13を介して回動自在に軸支された従動ローラ14
がガイド15に案内されて傾斜しながら回動する状態を
示したものである。
FIG. 4 shows the suspension device 11 and guide member 15 according to this embodiment.
In the detailed drawings, a is a perspective view of the suspension device 11, and b is a view facing the guide member 15iL, in which a driven roller is rotatably supported at the − side end of the suspension device 11 via a driven roller holding plate 13. 14
The figure shows the state in which it is guided by the guide 15 and rotates while tilting.

第5図は、本発明に係る回転式蒸着装置の他の実施例を
示す側断面図で、前図と同等の部分については同一符号
を付しである。
FIG. 5 is a side sectional view showing another embodiment of the rotary vapor deposition apparatus according to the present invention, in which the same parts as in the previous figure are given the same reference numerals.

16は一]転枠8の両側板の円周上でほぼ等間隔の位置
に軸10により回動自在に軸支した6個の懸垂具で、該
懸垂具16の保持板に支軸17を固定してその先端部に
従動ローラ保持板18を固着し、該従動ローラ保持板1
8の両端部に大きさの異なる第1の従動ローラ19と、
第2の従動ローラ20が回動自在に軸支されており、該
第1の従動ローラ19および第2の従動ローラ20はそ
れぞれ異なる2点破線で示す第1のガイド21と、点線
で示す第2のガイド22に案内されて傾斜角が規制され
るようになっている。
Reference numeral 16 denotes six suspension devices which are rotatably supported by shafts 10 at approximately equal intervals on the circumference of both side plates of the rolling frame 8, and a support shaft 17 is attached to the holding plate of the suspension device 16. The driven roller holding plate 18 is fixed to the leading end of the driven roller holding plate 1.
a first driven roller 19 of different sizes at both ends of the roller 8;
A second driven roller 20 is rotatably supported, and the first driven roller 19 and the second driven roller 20 are respectively connected to a first guide 21 indicated by a two-dot broken line and a first guide 21 indicated by a dotted line. The angle of inclination is regulated by being guided by the guide 22 of No. 2.

このような構成すなわち同じ材料よりなる第1の従動ロ
ーラ19と、第2の従動ローラ20の大きさを変えると
重量も変わるので、その重力差によってそれぞれのガイ
ドに従動ローラ19,20が案内され基板5の傾斜角が
規制されるので懸垂具16の回動がより確実安定となる
わけである。
If you change the size of the first driven roller 19 and the second driven roller 20 made of the same material, the weight will also change, so the difference in gravity will guide the driven rollers 19 and 20, respectively. Since the inclination angle of the base plate 5 is regulated, the rotation of the suspension tool 16 becomes more reliable and stable.

このような従動ローラと、ガイド部材との動作関係を第
6図に詳述する。
The operational relationship between such a driven roller and the guide member will be explained in detail in FIG.

第6図は、本実施例の懸垂杖とガイドの詳細図を示し、
aは懸垂具の斜視図、bはガイドの正面図であって、懸
垂具16の基板5の保持板−側端部に支軸17および従
動ローラ保持板18を介して回動自在に軸支された第1
および第2の従動ローラ19,20がそれぞれ対応する
ガイド21および22に案内されて回動する状態を示し
たものである。
FIG. 6 shows a detailed view of the suspension cane and guide of this embodiment,
a is a perspective view of the suspension device, and b is a front view of the guide, in which a pivot is rotatably supported at the end of the suspension device 16 on the side opposite to the holding plate of the base plate 5 via a support shaft 17 and a driven roller holding plate 18. The first
The figure also shows the state in which the second driven rollers 19 and 20 rotate while being guided by the corresponding guides 21 and 22, respectively.

第7図、第8図および第9図は、従動ローラとガイドの
他の実施例の概略を示した斜視図であって、第7図は、
回動自在に軸支された従動ローラ23を1個で構成し、
ガイド24に溝24’を設けて前記ガイド溝24′に案
内されて基板5を保持した懸垂!A16の傾斜角を規制
しながら回動するようにしたものである。
7, 8, and 9 are perspective views schematically showing other embodiments of the driven roller and the guide, and FIG.
Consists of one driven roller 23 rotatably supported,
A groove 24' is provided in the guide 24, and the board 5 is held while being guided by the guide groove 24'! It is designed to rotate while regulating the angle of inclination of A16.

第8図は、ガイドをつの字状に形成し、該コの字状の溝
に沿って従動ローラ23を所定の傾斜角で回動させるよ
うにしたものである。
In FIG. 8, the guide is formed in a U-shaped groove, and the driven roller 23 is rotated at a predetermined angle of inclination along the U-shaped groove.

第9図は、[i−]]動自在に軸1支された2個の従動
ローラ23でレール状のガイド26を挾持するような構
成としたもので、何れも傾斜角が90°以下で蒸着膜形
成面か下向きとなるよう構成されている。
FIG. 9 shows a configuration in which a rail-shaped guide 26 is held between two driven rollers 23 supported on a shaft so as to be movable, and both have an inclination angle of 90° or less. It is configured so that the surface on which the deposited film is formed faces downward.

なお、以上の実施例はいずれもガイド部材に案内される
従動ローラによって傾斜角を規制したものであるが、前
記懸垂具に磁性材料を付設しガイドに電磁石等を配列し
て前記回転枠の回動に同期させて傾斜角を頬制すること
も可能である。
Incidentally, in all of the above embodiments, the inclination angle is regulated by a driven roller guided by a guide member, but the rotation of the rotating frame is controlled by attaching a magnetic material to the suspension device and arranging electromagnets on the guide. It is also possible to control the tilt angle in synchronization with the movement.

また、本実施例ではガス放電表示パネルの電極基板表面
に対する誘電体層用の蒸着膜を形成する装置について詳
述したが、その他蒸着工程を有する各種素子のための量
産向蒸着装置としても適用が可能である。
Furthermore, in this embodiment, the apparatus for forming a vapor deposited film for a dielectric layer on the surface of an electrode substrate of a gas discharge display panel was described in detail, but it can also be applied as a vapor deposition apparatus for mass production for various devices having other vapor deposition processes. It is possible.

以上説明したように、本発明に係る回転式蒸着装置によ
れば、回転枠に回動自在にE軸支された懸垂具がガイド
部材に案内されて傾余1角が規制され、I[i1転枠の
回転位置にかかわらず複数の基板5の蒸着膜形成面が常
時90″゛以下の下方を向いた状態にあるので、蒸着装
置内において無用な異物の付着が防止でき、しかも同一
の蒸着装置で外形の異なる複数種の基板5の蒸着膜形成
が可能となるので、量産に適し、しかも高品質の蒸着膜
の形成が可能となり、各種の蒸着装置に適用して極めて
有益である。
As explained above, according to the rotary evaporation apparatus according to the present invention, the hanging device rotatably supported on the E-axis by the rotating frame is guided by the guide member, and the 1 angle of inclination is regulated, and I[i1 Regardless of the rotational position of the rotating frame, the surfaces on which the vapor deposited films of the plurality of substrates 5 are formed are always facing downward by 90" or less, so that it is possible to prevent unnecessary foreign matter from adhering within the vapor deposition apparatus, and moreover, the same vapor deposition can be performed. Since the apparatus can form a vapor deposited film on a plurality of types of substrates 5 having different external shapes, it is suitable for mass production, and it is possible to form a high quality vapor deposited film, which is extremely useful when applied to various vapor deposition apparatuses.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は、従来の回転式蒸着装置の概略を
示す側断面図、第3図へ一第6図は本発明に係る回転式
蒸着装置の実施例を示す側断面図、第7図、第8図およ
び第9図は他の実施例を示す概略斜視図である。 1:真空容器、2:蒸着試料容器、3:蒸着試料、4
、8 : [〔11転枠、5:基板、6:加熱ヒータ、
1:回転伝導ローラ、9:吊下げ具、10,12:軸、
ICl3:懸垂具、13,18:従動ローラ保持板、1
4,19,20,23:従動ローラ、15.21 .2
2,24,25,26 : ガイ ド、17:支軸。
1 and 2 are side sectional views schematically showing a conventional rotary evaporation apparatus, and FIG. 3 is a side sectional view showing an embodiment of the rotary evaporation apparatus according to the present invention. 7, 8 and 9 are schematic perspective views showing other embodiments. 1: Vacuum container, 2: Vapor deposition sample container, 3: Vapor deposition sample, 4
, 8: [[11 rolling frame, 5: substrate, 6: heater,
1: Rotation transmission roller, 9: Hanging tool, 10, 12: Axis,
ICl3: Suspension device, 13, 18: Driven roller holding plate, 1
4, 19, 20, 23: Followed roller, 15.21. 2
2, 24, 25, 26: Guide, 17: Support shaft.

Claims (1)

【特許請求の範囲】[Claims] 1 回転枠をそなえた回転式蒸着装置において、前記回
転枠に蒸着膜形成基板載置用の懸垂具を複数個はぼ等角
度で回動自在に軸支して設け、かつ該懸垂具の少なくと
も一側に従動ローラを付設するとともに、前記回転枠の
側方に該従動ローラを案内して前記懸垂具の角度を規制
するガイド部材を設けたことを特徴とする回転式蒸着装
置。
1. In a rotary vapor deposition apparatus equipped with a rotating frame, a plurality of hanging devices for placing a substrate on which a vapor deposited film is formed are rotatably supported on the rotating frame at approximately equal angles, and at least one of the hanging devices is provided. A rotary vapor deposition apparatus, characterized in that a driven roller is attached to one side, and a guide member is provided on a side of the rotating frame to guide the driven roller and regulate the angle of the hanging device.
JP10533279A 1979-08-17 1979-08-17 Rotary evaporation equipment Expired JPS5845175B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10533279A JPS5845175B2 (en) 1979-08-17 1979-08-17 Rotary evaporation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10533279A JPS5845175B2 (en) 1979-08-17 1979-08-17 Rotary evaporation equipment

Publications (2)

Publication Number Publication Date
JPS5638824A JPS5638824A (en) 1981-04-14
JPS5845175B2 true JPS5845175B2 (en) 1983-10-07

Family

ID=14404762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10533279A Expired JPS5845175B2 (en) 1979-08-17 1979-08-17 Rotary evaporation equipment

Country Status (1)

Country Link
JP (1) JPS5845175B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0213434Y2 (en) * 1984-09-25 1990-04-13
WO2020065971A1 (en) * 2018-09-28 2020-04-02 株式会社アシックス Shirt and pants

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58144471A (en) * 1982-02-19 1983-08-27 Ulvac Corp Apparatus for holding substrate in vacuum treating apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0213434Y2 (en) * 1984-09-25 1990-04-13
WO2020065971A1 (en) * 2018-09-28 2020-04-02 株式会社アシックス Shirt and pants

Also Published As

Publication number Publication date
JPS5638824A (en) 1981-04-14

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