JPH0237580B2 - - Google Patents

Info

Publication number
JPH0237580B2
JPH0237580B2 JP56167174A JP16717481A JPH0237580B2 JP H0237580 B2 JPH0237580 B2 JP H0237580B2 JP 56167174 A JP56167174 A JP 56167174A JP 16717481 A JP16717481 A JP 16717481A JP H0237580 B2 JPH0237580 B2 JP H0237580B2
Authority
JP
Japan
Prior art keywords
polymer
radiation
solution
irradiated
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56167174A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5868745A (ja
Inventor
Koichi Hatada
Yutaka Tsubokura
Shigeru Danjo
Hiraaki Juki
Hiroaki Aritome
Susumu Nanba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56167174A priority Critical patent/JPS5868745A/ja
Publication of JPS5868745A publication Critical patent/JPS5868745A/ja
Publication of JPH0237580B2 publication Critical patent/JPH0237580B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56167174A 1981-10-21 1981-10-21 浮き彫り構造体の製造方法 Granted JPS5868745A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56167174A JPS5868745A (ja) 1981-10-21 1981-10-21 浮き彫り構造体の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56167174A JPS5868745A (ja) 1981-10-21 1981-10-21 浮き彫り構造体の製造方法

Publications (2)

Publication Number Publication Date
JPS5868745A JPS5868745A (ja) 1983-04-23
JPH0237580B2 true JPH0237580B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-08-24

Family

ID=15844785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56167174A Granted JPS5868745A (ja) 1981-10-21 1981-10-21 浮き彫り構造体の製造方法

Country Status (1)

Country Link
JP (1) JPS5868745A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5136216A (en) * 1991-02-15 1992-08-04 York International Corporation Ac motor drive system
JP6007155B2 (ja) * 2013-07-30 2016-10-12 東京エレクトロン株式会社 現像処理方法、プログラム、コンピュータ記憶媒体及び現像処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143019A (en) * 1976-05-25 1977-11-29 Toshiba Corp Developing agent for positive type radiation sensitive material
JPS53120430A (en) * 1977-03-29 1978-10-20 Toshiba Corp Developing liquid for resist sensitive to radioactive ray
JPS608493B2 (ja) * 1978-03-01 1985-03-04 富士通株式会社 ポジ型レジスト像の形成方法

Also Published As

Publication number Publication date
JPS5868745A (ja) 1983-04-23

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