JPH0236673B2 - - Google Patents

Info

Publication number
JPH0236673B2
JPH0236673B2 JP59113457A JP11345784A JPH0236673B2 JP H0236673 B2 JPH0236673 B2 JP H0236673B2 JP 59113457 A JP59113457 A JP 59113457A JP 11345784 A JP11345784 A JP 11345784A JP H0236673 B2 JPH0236673 B2 JP H0236673B2
Authority
JP
Japan
Prior art keywords
thin film
beam source
source
substrate
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59113457A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60255972A (ja
Inventor
Yoshifumi Minowa
Eishin Murakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP11345784A priority Critical patent/JPS60255972A/ja
Publication of JPS60255972A publication Critical patent/JPS60255972A/ja
Publication of JPH0236673B2 publication Critical patent/JPH0236673B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP11345784A 1984-05-31 1984-05-31 薄膜蒸着装置 Granted JPS60255972A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11345784A JPS60255972A (ja) 1984-05-31 1984-05-31 薄膜蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11345784A JPS60255972A (ja) 1984-05-31 1984-05-31 薄膜蒸着装置

Publications (2)

Publication Number Publication Date
JPS60255972A JPS60255972A (ja) 1985-12-17
JPH0236673B2 true JPH0236673B2 (fr) 1990-08-20

Family

ID=14612721

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11345784A Granted JPS60255972A (ja) 1984-05-31 1984-05-31 薄膜蒸着装置

Country Status (1)

Country Link
JP (1) JPS60255972A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0427276U (fr) * 1990-06-29 1992-03-04

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910002578B1 (ko) * 1988-01-19 1991-04-27 닙폰 가이시 카부시키카이샤 고밀도 SiC 소결체의 제조방법
JPH02104661A (ja) * 1988-10-12 1990-04-17 Mitsubishi Electric Corp 薄膜形成装置
JPH03202461A (ja) * 1989-12-29 1991-09-04 Nissin Electric Co Ltd 高絶縁酸化ケイ素薄膜の形成方法
JP3169151B2 (ja) * 1992-10-26 2001-05-21 三菱電機株式会社 薄膜形成装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5668932A (en) * 1979-11-07 1981-06-09 Sekisui Chem Co Ltd Manufacture of magnetic recording medium

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5668932A (en) * 1979-11-07 1981-06-09 Sekisui Chem Co Ltd Manufacture of magnetic recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0427276U (fr) * 1990-06-29 1992-03-04

Also Published As

Publication number Publication date
JPS60255972A (ja) 1985-12-17

Similar Documents

Publication Publication Date Title
JPH05171423A (ja) 真空蒸着用偏向電子銃装置
JP2501828B2 (ja) 薄膜蒸着装置
JPH0236673B2 (fr)
JP2710670B2 (ja) 蒸気発生源用るつぼ
JPS63472A (ja) 真空成膜装置
JPS60124931A (ja) 薄膜蒸着装置
JPS60262963A (ja) 化合物薄膜蒸着装置
JP2566602B2 (ja) イオン源
JPH0215630B2 (fr)
JPS60125368A (ja) 薄膜蒸着装置
JPH0351087B2 (fr)
JPH05339720A (ja) 薄膜形成装置
JPH02104661A (ja) 薄膜形成装置
JPS6329925A (ja) 化合物薄膜形成装置
JPH0541698B2 (fr)
JPS60124930A (ja) 薄膜蒸着装置
JPS60124923A (ja) 薄膜蒸着装置
JPS60124916A (ja) 薄膜蒸着装置
JPH0543783B2 (fr)
JPH0510423B2 (fr)
JPS60124933A (ja) 薄膜蒸着装置
JPS63161168A (ja) イオンビ−ムスパツタによる成膜方法
JPH04289161A (ja) 膜形成装置
JPS60124935A (ja) 薄膜蒸着装置
JPS60124915A (ja) 薄膜蒸着装置