JPH0235438U - - Google Patents
Info
- Publication number
- JPH0235438U JPH0235438U JP11397488U JP11397488U JPH0235438U JP H0235438 U JPH0235438 U JP H0235438U JP 11397488 U JP11397488 U JP 11397488U JP 11397488 U JP11397488 U JP 11397488U JP H0235438 U JPH0235438 U JP H0235438U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- electrode
- processed
- electric field
- electrostatic adsorption
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 7
- 238000001179 sorption measurement Methods 0.000 claims description 6
- 230000005684 electric field Effects 0.000 claims description 5
- 239000012212 insulator Substances 0.000 claims description 5
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11397488U JPH0235438U (de) | 1988-08-29 | 1988-08-29 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11397488U JPH0235438U (de) | 1988-08-29 | 1988-08-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0235438U true JPH0235438U (de) | 1990-03-07 |
Family
ID=31354299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11397488U Pending JPH0235438U (de) | 1988-08-29 | 1988-08-29 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0235438U (de) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001516967A (ja) * | 1997-09-16 | 2001-10-02 | アプライド マテリアルズ インコーポレイテッド | 電気的に結合されているカラーリングを有するプラズマチャンバ支持体 |
JP2001345372A (ja) * | 2000-05-31 | 2001-12-14 | Kyocera Corp | ウエハ支持部材及びその製造方法 |
WO2007132757A1 (ja) * | 2006-05-15 | 2007-11-22 | Ulvac, Inc. | クリーニング方法及び真空処理装置 |
JP2008171888A (ja) * | 2007-01-09 | 2008-07-24 | Ulvac Japan Ltd | プラズマcvd装置、薄膜形成方法 |
JP2011138907A (ja) * | 2009-12-28 | 2011-07-14 | Tokyo Electron Ltd | プラズマ処理装置 |
US8962101B2 (en) | 2007-08-31 | 2015-02-24 | Novellus Systems, Inc. | Methods and apparatus for plasma-based deposition |
US9088085B2 (en) | 2012-09-21 | 2015-07-21 | Novellus Systems, Inc. | High temperature electrode connections |
-
1988
- 1988-08-29 JP JP11397488U patent/JPH0235438U/ja active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001516967A (ja) * | 1997-09-16 | 2001-10-02 | アプライド マテリアルズ インコーポレイテッド | 電気的に結合されているカラーリングを有するプラズマチャンバ支持体 |
JP2001345372A (ja) * | 2000-05-31 | 2001-12-14 | Kyocera Corp | ウエハ支持部材及びその製造方法 |
JP4502462B2 (ja) * | 2000-05-31 | 2010-07-14 | 京セラ株式会社 | ウエハ支持部材及びその製造方法 |
WO2007132757A1 (ja) * | 2006-05-15 | 2007-11-22 | Ulvac, Inc. | クリーニング方法及び真空処理装置 |
JP5335421B2 (ja) * | 2006-05-15 | 2013-11-06 | 株式会社アルバック | 真空処理装置 |
JP2008171888A (ja) * | 2007-01-09 | 2008-07-24 | Ulvac Japan Ltd | プラズマcvd装置、薄膜形成方法 |
US8962101B2 (en) | 2007-08-31 | 2015-02-24 | Novellus Systems, Inc. | Methods and apparatus for plasma-based deposition |
JP2011138907A (ja) * | 2009-12-28 | 2011-07-14 | Tokyo Electron Ltd | プラズマ処理装置 |
US9245776B2 (en) | 2009-12-28 | 2016-01-26 | Tokyo Electron Limited | Plasma processing apparatus |
US9088085B2 (en) | 2012-09-21 | 2015-07-21 | Novellus Systems, Inc. | High temperature electrode connections |
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