JPH0232352B2 - - Google Patents

Info

Publication number
JPH0232352B2
JPH0232352B2 JP59012578A JP1257884A JPH0232352B2 JP H0232352 B2 JPH0232352 B2 JP H0232352B2 JP 59012578 A JP59012578 A JP 59012578A JP 1257884 A JP1257884 A JP 1257884A JP H0232352 B2 JPH0232352 B2 JP H0232352B2
Authority
JP
Japan
Prior art keywords
flow rate
signal
pressure
deviation
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59012578A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60155669A (ja
Inventor
Minoru Oomoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHINKU KIKAI KOGYO KK
Original Assignee
SHINKU KIKAI KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHINKU KIKAI KOGYO KK filed Critical SHINKU KIKAI KOGYO KK
Priority to JP59012578A priority Critical patent/JPS60155669A/ja
Publication of JPS60155669A publication Critical patent/JPS60155669A/ja
Publication of JPH0232352B2 publication Critical patent/JPH0232352B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP59012578A 1984-01-26 1984-01-26 真空雰囲気制御装置 Granted JPS60155669A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59012578A JPS60155669A (ja) 1984-01-26 1984-01-26 真空雰囲気制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59012578A JPS60155669A (ja) 1984-01-26 1984-01-26 真空雰囲気制御装置

Publications (2)

Publication Number Publication Date
JPS60155669A JPS60155669A (ja) 1985-08-15
JPH0232352B2 true JPH0232352B2 (enrdf_load_stackoverflow) 1990-07-19

Family

ID=11809235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59012578A Granted JPS60155669A (ja) 1984-01-26 1984-01-26 真空雰囲気制御装置

Country Status (1)

Country Link
JP (1) JPS60155669A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03126273U (enrdf_load_stackoverflow) * 1990-03-28 1991-12-19

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61259746A (ja) * 1985-05-15 1986-11-18 Tokuda Seisakusho Ltd 真空容器の開閉装置
JPH0815540B2 (ja) * 1985-12-27 1996-02-21 株式会社日立製作所 処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03126273U (enrdf_load_stackoverflow) * 1990-03-28 1991-12-19

Also Published As

Publication number Publication date
JPS60155669A (ja) 1985-08-15

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term