JPH0232112B2 - - Google Patents
Info
- Publication number
- JPH0232112B2 JPH0232112B2 JP61240767A JP24076786A JPH0232112B2 JP H0232112 B2 JPH0232112 B2 JP H0232112B2 JP 61240767 A JP61240767 A JP 61240767A JP 24076786 A JP24076786 A JP 24076786A JP H0232112 B2 JPH0232112 B2 JP H0232112B2
- Authority
- JP
- Japan
- Prior art keywords
- holder
- wafer
- recess
- holding
- polishing machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61240767A JPS6393562A (ja) | 1986-10-09 | 1986-10-09 | ウェハの保持方法及びその装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61240767A JPS6393562A (ja) | 1986-10-09 | 1986-10-09 | ウェハの保持方法及びその装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6393562A JPS6393562A (ja) | 1988-04-23 |
| JPH0232112B2 true JPH0232112B2 (en:Method) | 1990-07-18 |
Family
ID=17064406
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61240767A Granted JPS6393562A (ja) | 1986-10-09 | 1986-10-09 | ウェハの保持方法及びその装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6393562A (en:Method) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01289657A (ja) * | 1988-05-13 | 1989-11-21 | Matsushita Electric Ind Co Ltd | 研摩定盤および研摩方法 |
| JP2003060014A (ja) * | 2001-08-17 | 2003-02-28 | Disco Abrasive Syst Ltd | 板状被加工物のための保持具 |
| KR101174925B1 (ko) | 2005-08-31 | 2012-08-17 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 웨이퍼의 연마 방법 및 연마된 웨이퍼 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60135174A (ja) * | 1983-12-23 | 1985-07-18 | Toppan Printing Co Ltd | 裏面研磨方法 |
-
1986
- 1986-10-09 JP JP61240767A patent/JPS6393562A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6393562A (ja) | 1988-04-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6561891B2 (en) | Eliminating air pockets under a polished pad | |
| JP3024373B2 (ja) | シート状弾性発泡体及びウェーハ研磨加工用治具 | |
| US6592438B2 (en) | CMP platen with patterned surface | |
| US6007407A (en) | Abrasive construction for semiconductor wafer modification | |
| US6050880A (en) | Surface grinding device and method of surface grinding a thin-plate workpiece | |
| JPH09201765A (ja) | バッキングパッドおよび半導体ウエーハの研磨方法 | |
| TW201000262A (en) | Polishing pad | |
| KR20120109994A (ko) | 홀딩패드 | |
| JP2013533125A (ja) | 化学機械平坦化に使用される固定研磨材の接合技法 | |
| JP4943766B2 (ja) | 被加工物保持材およびその製造方法 | |
| EP2472571A2 (en) | Wafer-supporting member, method for manufacturing same, and wafer-polishing unit comprising same | |
| JP5567373B2 (ja) | 保持材および保持材の製造方法 | |
| JPH0547392B2 (en:Method) | ||
| JP3839903B2 (ja) | 半導体ウエーハの研磨装置および研磨方法 | |
| JPH0232112B2 (en:Method) | ||
| JP6674813B2 (ja) | 保持具 | |
| JP4273444B2 (ja) | 研磨用被加工物保持具及びこれを用いた研磨方法 | |
| JPS62297064A (ja) | 半導体等のウエ−ハ保持用積層体 | |
| JP2002355755A (ja) | 被研磨物保持用のバッキング材 | |
| JPS6316970A (ja) | 研磨用基板ホルダ−およびそれから基板を脱離させる方法 | |
| JP2851808B2 (ja) | 研磨用ウエハ保持部材及びそのウエハ保持部材の定盤への装着方法 | |
| JPH11188617A (ja) | 被研磨体の保持部材及びこの保持部材を用いた被研磨体の研磨方法 | |
| JPH08267668A (ja) | 研磨用ウエハ保持部材及びそのウエハ保持部材の研磨機定盤への脱着方法 | |
| JP2000158334A (ja) | 作業用トレー及び研削方法 | |
| JPH11156708A (ja) | バッキングパッド貼付形成装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| EXPY | Cancellation because of completion of term |