JPH0230835Y2 - - Google Patents

Info

Publication number
JPH0230835Y2
JPH0230835Y2 JP16736683U JP16736683U JPH0230835Y2 JP H0230835 Y2 JPH0230835 Y2 JP H0230835Y2 JP 16736683 U JP16736683 U JP 16736683U JP 16736683 U JP16736683 U JP 16736683U JP H0230835 Y2 JPH0230835 Y2 JP H0230835Y2
Authority
JP
Japan
Prior art keywords
substrate
mounting table
substrate mounting
heat pipe
liquid reservoir
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16736683U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6076032U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16736683U priority Critical patent/JPS6076032U/ja
Publication of JPS6076032U publication Critical patent/JPS6076032U/ja
Application granted granted Critical
Publication of JPH0230835Y2 publication Critical patent/JPH0230835Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP16736683U 1983-10-31 1983-10-31 半導体製造装置 Granted JPS6076032U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16736683U JPS6076032U (ja) 1983-10-31 1983-10-31 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16736683U JPS6076032U (ja) 1983-10-31 1983-10-31 半導体製造装置

Publications (2)

Publication Number Publication Date
JPS6076032U JPS6076032U (ja) 1985-05-28
JPH0230835Y2 true JPH0230835Y2 (h) 1990-08-20

Family

ID=30366174

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16736683U Granted JPS6076032U (ja) 1983-10-31 1983-10-31 半導体製造装置

Country Status (1)

Country Link
JP (1) JPS6076032U (h)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4778559A (en) * 1986-10-15 1988-10-18 Advantage Production Technology Semiconductor substrate heater and reactor process and apparatus
JP2020526012A (ja) * 2017-06-23 2020-08-27 ワットロー・エレクトリック・マニュファクチャリング・カンパニー 高温ヒートプレートペデスタル

Also Published As

Publication number Publication date
JPS6076032U (ja) 1985-05-28

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