JPH0230174B2 - - Google Patents

Info

Publication number
JPH0230174B2
JPH0230174B2 JP59166597A JP16659784A JPH0230174B2 JP H0230174 B2 JPH0230174 B2 JP H0230174B2 JP 59166597 A JP59166597 A JP 59166597A JP 16659784 A JP16659784 A JP 16659784A JP H0230174 B2 JPH0230174 B2 JP H0230174B2
Authority
JP
Japan
Prior art keywords
reticle
alignment
lens
wafer
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59166597A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6146024A (ja
Inventor
Masataka Shiba
Yoshitada Oshida
Naoto Nakajima
Yukio Uto
Toshihiko Nakada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59166597A priority Critical patent/JPS6146024A/ja
Priority to US06/762,329 priority patent/US4701050A/en
Publication of JPS6146024A publication Critical patent/JPS6146024A/ja
Publication of JPH0230174B2 publication Critical patent/JPH0230174B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59166597A 1984-08-10 1984-08-10 アライメント方法 Granted JPS6146024A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59166597A JPS6146024A (ja) 1984-08-10 1984-08-10 アライメント方法
US06/762,329 US4701050A (en) 1984-08-10 1985-08-05 Semiconductor exposure apparatus and alignment method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59166597A JPS6146024A (ja) 1984-08-10 1984-08-10 アライメント方法

Publications (2)

Publication Number Publication Date
JPS6146024A JPS6146024A (ja) 1986-03-06
JPH0230174B2 true JPH0230174B2 (enExample) 1990-07-04

Family

ID=15834235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59166597A Granted JPS6146024A (ja) 1984-08-10 1984-08-10 アライメント方法

Country Status (1)

Country Link
JP (1) JPS6146024A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61100931A (ja) * 1984-10-24 1986-05-19 Hitachi Ltd 縮小投影式アライメント方法
JP6799487B2 (ja) * 2017-03-21 2020-12-16 セイコーＮｐｃ株式会社 双曲線パターンを使った撮影装置及び撮影方法

Also Published As

Publication number Publication date
JPS6146024A (ja) 1986-03-06

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term