JPH0229521U - - Google Patents

Info

Publication number
JPH0229521U
JPH0229521U JP10715788U JP10715788U JPH0229521U JP H0229521 U JPH0229521 U JP H0229521U JP 10715788 U JP10715788 U JP 10715788U JP 10715788 U JP10715788 U JP 10715788U JP H0229521 U JPH0229521 U JP H0229521U
Authority
JP
Japan
Prior art keywords
reaction tube
gas introduction
raw material
material gas
introduction pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10715788U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10715788U priority Critical patent/JPH0229521U/ja
Publication of JPH0229521U publication Critical patent/JPH0229521U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP10715788U 1988-08-12 1988-08-12 Pending JPH0229521U (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10715788U JPH0229521U (de) 1988-08-12 1988-08-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10715788U JPH0229521U (de) 1988-08-12 1988-08-12

Publications (1)

Publication Number Publication Date
JPH0229521U true JPH0229521U (de) 1990-02-26

Family

ID=31341319

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10715788U Pending JPH0229521U (de) 1988-08-12 1988-08-12

Country Status (1)

Country Link
JP (1) JPH0229521U (de)

Similar Documents

Publication Publication Date Title
JPH0229521U (de)
JPS61153337U (de)
JPS6219731U (de)
JPS58168574U (ja) 気相成長反応炉
JPS61142441U (de)
JPS59109776U (ja) 気相成長装置
JPH0273737U (de)
JPH03111561U (de)
JPS63106766U (de)
JPS60149132U (ja) 半導体熱処理炉
JPH0468519U (de)
JPH0357965U (de)
JPH03128668U (de)
JPS588894U (ja) ヒ−タ装置
JPS6139937U (ja) 拡散炉型気相成長装置
JPS63124736U (de)
JPH0210470U (de)
JPS605116U (ja) 気相成長用サセプタ
JPS6151730U (de)
JPH01173156U (de)
JPS6057123U (ja) 半導体用プロセスチュ−ブ
JPH038426U (de)
JPH022829U (de)
JPH0321845U (de)
JPH0187173U (de)