JPH0227320B2 - - Google Patents
Info
- Publication number
- JPH0227320B2 JPH0227320B2 JP59025536A JP2553684A JPH0227320B2 JP H0227320 B2 JPH0227320 B2 JP H0227320B2 JP 59025536 A JP59025536 A JP 59025536A JP 2553684 A JP2553684 A JP 2553684A JP H0227320 B2 JPH0227320 B2 JP H0227320B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- heat treatment
- crystal
- fet
- threshold voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2553684A JPS60171300A (ja) | 1984-02-14 | 1984-02-14 | 化合物半導体結晶の均質化方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2553684A JPS60171300A (ja) | 1984-02-14 | 1984-02-14 | 化合物半導体結晶の均質化方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60171300A JPS60171300A (ja) | 1985-09-04 |
JPH0227320B2 true JPH0227320B2 (enrdf_load_stackoverflow) | 1990-06-15 |
Family
ID=12168731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2553684A Granted JPS60171300A (ja) | 1984-02-14 | 1984-02-14 | 化合物半導体結晶の均質化方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60171300A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0787187B2 (ja) * | 1987-08-13 | 1995-09-20 | 古河電気工業株式会社 | GaAs化合物半導体基板の製造方法 |
JP2505222B2 (ja) * | 1987-10-16 | 1996-06-05 | 昭和電工株式会社 | 半絶縁体GaAs基板の製造方法 |
JPH0776160B2 (ja) * | 1987-11-05 | 1995-08-16 | 株式会社ジャパンエナジー | 化合物半導体単結晶の熱処理方法 |
US5093284A (en) * | 1988-05-27 | 1992-03-03 | Hitachi Chemical Company, Ltd. | Process for homogenizing compound semiconductor single crystal in properties |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5460858A (en) * | 1977-10-25 | 1979-05-16 | Hitachi Cable Ltd | Manufacture of gallium arsenide crystal wafer |
JPS5732643A (en) * | 1980-08-06 | 1982-02-22 | Toshiba Corp | Annealing method of compound semiconductor single crystal |
-
1984
- 1984-02-14 JP JP2553684A patent/JPS60171300A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60171300A (ja) | 1985-09-04 |
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