JPH02267270A - 放射支援化学反応蒸着方法とそれを実施する装置 - Google Patents

放射支援化学反応蒸着方法とそれを実施する装置

Info

Publication number
JPH02267270A
JPH02267270A JP2056822A JP5682290A JPH02267270A JP H02267270 A JPH02267270 A JP H02267270A JP 2056822 A JP2056822 A JP 2056822A JP 5682290 A JP5682290 A JP 5682290A JP H02267270 A JPH02267270 A JP H02267270A
Authority
JP
Japan
Prior art keywords
workpiece
temperature
heat emission
laser
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2056822A
Other languages
English (en)
Japanese (ja)
Inventor
Carl M Penney
カール・マレイ・ペニー
Tushar S Chande
ツシャール・シャシカント・シャンデ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPH02267270A publication Critical patent/JPH02267270A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/60—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature
    • G01J5/601—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature using spectral scanning
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/44—Electric circuits
    • G01J2001/4413—Type
    • G01J2001/442—Single-photon detection or photon counting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G01J2003/2813—2D-array

Landscapes

  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Radiation Pyrometers (AREA)
  • Investigating Or Analyzing Materials Using Thermal Means (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2056822A 1989-03-27 1990-03-09 放射支援化学反応蒸着方法とそれを実施する装置 Pending JPH02267270A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/329,054 US4959244A (en) 1989-03-27 1989-03-27 Temperature measurement and control for photohermal processes
US329,054 1989-03-27

Publications (1)

Publication Number Publication Date
JPH02267270A true JPH02267270A (ja) 1990-11-01

Family

ID=23283674

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2056822A Pending JPH02267270A (ja) 1989-03-27 1990-03-09 放射支援化学反応蒸着方法とそれを実施する装置

Country Status (6)

Country Link
US (1) US4959244A (enExample)
JP (1) JPH02267270A (enExample)
DE (1) DE4008816A1 (enExample)
FR (1) FR2644797A1 (enExample)
GB (1) GB2232792B (enExample)
IT (1) IT1239491B (enExample)

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US5200230A (en) * 1987-06-29 1993-04-06 Dunfries Investments Limited Laser coating process
US5026979A (en) * 1990-03-05 1991-06-25 General Electric Company Method and apparatus for optically monitoring laser materials processing
US5240736A (en) * 1992-10-26 1993-08-31 Ford Motor Company Method and apparatus for in-situ measuring filament temperature and the thickness of a diamond film
US5365876A (en) * 1993-02-01 1994-11-22 The United States Of America As Represented By The United States Department Of Energy Crystal face temperature determination means
JPH0929472A (ja) * 1995-07-14 1997-02-04 Hitachi Ltd 割断方法、割断装置及びチップ材料
US6400833B1 (en) 1998-06-19 2002-06-04 Oms-Optical Measuring Systems Method and apparatus for discrimination of product units from spread spectrum images of thin portions of product units
US6303411B1 (en) 1999-05-03 2001-10-16 Vortek Industries Ltd. Spatially resolved temperature measurement and irradiance control
KR101067901B1 (ko) 2001-12-26 2011-09-28 맷슨 테크날러지 캐나다 인코퍼레이티드 온도 측정 및 열처리 방법과 시스템
US7341673B2 (en) * 2003-08-12 2008-03-11 Lam Research Corporation Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission
TWI320951B (en) * 2002-08-13 2010-02-21 Lam Res Corp Methods for in situ substrate temperature monitoring by electromagnetic radiation emission
KR101163682B1 (ko) 2002-12-20 2012-07-09 맷슨 테크날러지 캐나다 인코퍼레이티드 피가공물 지지 장치
WO2005059991A1 (en) 2003-12-19 2005-06-30 Mattson Technology Canada Inc. Apparatuses and methods for suppressing thermally induced motion of a workpiece
US7360945B2 (en) * 2005-03-31 2008-04-22 Intel Corporation Apparatus for determining temperature of a portable computer system
DE102005047433B4 (de) * 2005-09-30 2009-12-24 Wolfgang Erdmann Verfahren zum computergestützten Optimieren des Betriebs eines Rollenofens, Computerprogramm und computerlesbarer Datenträger
US8454356B2 (en) 2006-11-15 2013-06-04 Mattson Technology, Inc. Systems and methods for supporting a workpiece during heat-treating
US9070590B2 (en) 2008-05-16 2015-06-30 Mattson Technology, Inc. Workpiece breakage prevention method and apparatus
US8309883B2 (en) * 2010-05-20 2012-11-13 Ipg Photonics Corporation Methods and systems for laser processing of materials
US9757902B2 (en) 2014-09-02 2017-09-12 Product Innovation and Engineering L.L.C. Additive layering method using improved build description
US9573224B2 (en) 2014-09-02 2017-02-21 Product Innovation & Engineering, LLC System and method for determining beam power level along an additive deposition path
US10632566B2 (en) 2014-12-02 2020-04-28 Product Innovation and Engineering L.L.C. System and method for controlling the input energy from an energy point source during metal processing
CN105506733A (zh) * 2015-12-23 2016-04-20 圆融光电科技股份有限公司 外延生长设备
US9720243B1 (en) * 2015-12-31 2017-08-01 X Development Llc Wavelength division monolithic optical device
CN106843316B (zh) * 2017-03-01 2018-11-09 华中科技大学 一种基于光热式的快速升温控制方法、装置及升温炉
US11839915B2 (en) 2021-01-20 2023-12-12 Product Innovation and Engineering LLC System and method for determining beam power level along an additive deposition path
CN114216566A (zh) * 2021-12-27 2022-03-22 中国工程物理研究院流体物理研究所 一种瞬态连续温度的单点测量方法及系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6217179A (ja) * 1985-07-17 1987-01-26 Nec Corp 薄膜形成方法
JPS6217178A (ja) * 1985-07-17 1987-01-26 Nec Corp 薄膜形成装置

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Publication number Priority date Publication date Assignee Title
GB1118303A (en) * 1964-11-27 1968-06-26 British Iron Steel Research Heating control system
GB1372753A (en) * 1971-01-11 1974-11-06 Honeywell Inc Apparatus for processing a workpiece with a laser beam
US4081215A (en) * 1976-05-18 1978-03-28 General Electric Company Stable two-channel, single-filter spectrometer
WO1980000504A1 (en) * 1978-08-18 1980-03-20 Nat Res Dev Control of deposition of thin films
DE3123427C2 (de) * 1981-06-12 1985-10-24 Siemens AG, 1000 Berlin und 8000 München Anordnung zum Messen des elektrischen Widerstandes und der Temperatur von durch Aufdampfen oder Aufstäuben auf Substraten abgeschiedenen dünnen, metallischleitenden Schichten während der Schichtherstellung
FR2545007B1 (fr) * 1983-04-29 1986-12-26 Commissariat Energie Atomique Procede et dispositif pour le revetement d'une piece par projection de plasma
US4582431A (en) * 1983-10-11 1986-04-15 Honeywell Inc. Optical monitor for direct thickness control of transparent films
FR2572523B1 (fr) * 1984-10-25 1987-06-12 Bertin & Cie Procede et dispositif pyrometriques pour determiner a distance, par voie optique, la temperature et/ou l'emissivite d'un corps ou milieu quelconque
US4676646A (en) * 1985-10-15 1987-06-30 Energy Conversion Devices, Inc. Method and apparatus for controlling thickness of a layer of an optical data storage device by measuring an optical property of the layer
EP0209131B1 (en) * 1985-07-17 1991-12-04 Nec Corporation Optical cvd method with a strong optical intensity used during an initial period and device therefor
DD254114A3 (de) * 1985-07-30 1988-02-17 Univ Dresden Tech Pyrometrisches messverfahren
DE3634800A1 (de) * 1985-12-30 1987-07-02 Weinert E Messgeraetewerk Mehrkanalmesskopf fuer ein strahlungspyrometer
CA1302803C (en) * 1986-02-15 1992-06-09 Hiroji Kawai Method and apparatus for vapor deposition
US4699080A (en) * 1986-05-15 1987-10-13 Dynapert-Htc Corporation Temperature sensors for vapor processing systems
JPS62296512A (ja) * 1986-06-17 1987-12-23 Fujitsu Ltd 気相成長装置
GB2196155B (en) * 1986-09-20 1991-02-20 Mitsubishi Electric Corp Control apparatus for energy beam hardening
US4713140A (en) * 1987-03-02 1987-12-15 International Business Machines Corporation Laser luminescence monitor for material thickness
DE3733147A1 (de) * 1987-10-01 1989-04-13 Messer Griesheim Gmbh Verfahren zum laserwaermebehandeln, wie laserhaerten, laserweichgluehen, laserrekristallisieren von bauteilen in festem zustand
DE3739862A1 (de) * 1987-11-25 1989-06-08 Bosch Gmbh Robert Werkstueckbearbeitungsvorrichtung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6217179A (ja) * 1985-07-17 1987-01-26 Nec Corp 薄膜形成方法
JPS6217178A (ja) * 1985-07-17 1987-01-26 Nec Corp 薄膜形成装置

Also Published As

Publication number Publication date
IT9019833A0 (it) 1990-03-27
IT9019833A1 (it) 1991-09-27
US4959244A (en) 1990-09-25
DE4008816C2 (enExample) 1991-12-19
GB2232792B (en) 1993-11-24
GB9005861D0 (en) 1990-05-09
DE4008816A1 (de) 1990-10-04
GB2232792A (en) 1990-12-19
IT1239491B (it) 1993-11-03
FR2644797A1 (fr) 1990-09-28

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