FR2644797A1 - Procede et systeme de mesure et controle de temperature pour des processus photothermiques - Google Patents
Procede et systeme de mesure et controle de temperature pour des processus photothermiques Download PDFInfo
- Publication number
- FR2644797A1 FR2644797A1 FR9003632A FR9003632A FR2644797A1 FR 2644797 A1 FR2644797 A1 FR 2644797A1 FR 9003632 A FR9003632 A FR 9003632A FR 9003632 A FR9003632 A FR 9003632A FR 2644797 A1 FR2644797 A1 FR 2644797A1
- Authority
- FR
- France
- Prior art keywords
- temperature
- thermal
- laser
- thermal emission
- detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 28
- 230000008569 process Effects 0.000 title claims abstract description 22
- 230000005855 radiation Effects 0.000 claims abstract description 22
- 238000001182 laser chemical vapour deposition Methods 0.000 claims abstract description 11
- 238000000295 emission spectrum Methods 0.000 claims abstract description 6
- 230000003287 optical effect Effects 0.000 claims description 15
- 230000003595 spectral effect Effects 0.000 claims description 11
- 238000005229 chemical vapour deposition Methods 0.000 claims description 10
- 238000001228 spectrum Methods 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 9
- 239000003086 colorant Substances 0.000 claims description 6
- 239000003153 chemical reaction reagent Substances 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims 2
- 238000005137 deposition process Methods 0.000 claims 1
- 238000004804 winding Methods 0.000 claims 1
- 238000009529 body temperature measurement Methods 0.000 description 17
- 238000005259 measurement Methods 0.000 description 16
- 230000008901 benefit Effects 0.000 description 10
- 239000007789 gas Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000000376 reactant Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 235000012545 Vaccinium macrocarpon Nutrition 0.000 description 1
- 240000001717 Vaccinium macrocarpon Species 0.000 description 1
- 235000002118 Vaccinium oxycoccus Nutrition 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 235000004634 cranberry Nutrition 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000003711 photoprotective effect Effects 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000009182 swimming Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/60—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature
- G01J5/601—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature using spectral scanning
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
- G01J2001/4413—Type
- G01J2001/442—Single-photon detection or photon counting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/2803—Investigating the spectrum using photoelectric array detector
- G01J2003/2813—2D-array
Landscapes
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Radiation Pyrometers (AREA)
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/329,054 US4959244A (en) | 1989-03-27 | 1989-03-27 | Temperature measurement and control for photohermal processes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2644797A1 true FR2644797A1 (fr) | 1990-09-28 |
Family
ID=23283674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR9003632A Pending FR2644797A1 (fr) | 1989-03-27 | 1990-03-21 | Procede et systeme de mesure et controle de temperature pour des processus photothermiques |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4959244A (enExample) |
| JP (1) | JPH02267270A (enExample) |
| DE (1) | DE4008816A1 (enExample) |
| FR (1) | FR2644797A1 (enExample) |
| GB (1) | GB2232792B (enExample) |
| IT (1) | IT1239491B (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5200230A (en) * | 1987-06-29 | 1993-04-06 | Dunfries Investments Limited | Laser coating process |
| US5026979A (en) * | 1990-03-05 | 1991-06-25 | General Electric Company | Method and apparatus for optically monitoring laser materials processing |
| US5240736A (en) * | 1992-10-26 | 1993-08-31 | Ford Motor Company | Method and apparatus for in-situ measuring filament temperature and the thickness of a diamond film |
| US5365876A (en) * | 1993-02-01 | 1994-11-22 | The United States Of America As Represented By The United States Department Of Energy | Crystal face temperature determination means |
| JPH0929472A (ja) * | 1995-07-14 | 1997-02-04 | Hitachi Ltd | 割断方法、割断装置及びチップ材料 |
| US6400833B1 (en) | 1998-06-19 | 2002-06-04 | Oms-Optical Measuring Systems | Method and apparatus for discrimination of product units from spread spectrum images of thin portions of product units |
| US6303411B1 (en) | 1999-05-03 | 2001-10-16 | Vortek Industries Ltd. | Spatially resolved temperature measurement and irradiance control |
| KR101067901B1 (ko) | 2001-12-26 | 2011-09-28 | 맷슨 테크날러지 캐나다 인코퍼레이티드 | 온도 측정 및 열처리 방법과 시스템 |
| US7341673B2 (en) * | 2003-08-12 | 2008-03-11 | Lam Research Corporation | Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission |
| TWI320951B (en) * | 2002-08-13 | 2010-02-21 | Lam Res Corp | Methods for in situ substrate temperature monitoring by electromagnetic radiation emission |
| KR101163682B1 (ko) | 2002-12-20 | 2012-07-09 | 맷슨 테크날러지 캐나다 인코퍼레이티드 | 피가공물 지지 장치 |
| WO2005059991A1 (en) | 2003-12-19 | 2005-06-30 | Mattson Technology Canada Inc. | Apparatuses and methods for suppressing thermally induced motion of a workpiece |
| US7360945B2 (en) * | 2005-03-31 | 2008-04-22 | Intel Corporation | Apparatus for determining temperature of a portable computer system |
| DE102005047433B4 (de) * | 2005-09-30 | 2009-12-24 | Wolfgang Erdmann | Verfahren zum computergestützten Optimieren des Betriebs eines Rollenofens, Computerprogramm und computerlesbarer Datenträger |
| US8454356B2 (en) | 2006-11-15 | 2013-06-04 | Mattson Technology, Inc. | Systems and methods for supporting a workpiece during heat-treating |
| US9070590B2 (en) | 2008-05-16 | 2015-06-30 | Mattson Technology, Inc. | Workpiece breakage prevention method and apparatus |
| US8309883B2 (en) * | 2010-05-20 | 2012-11-13 | Ipg Photonics Corporation | Methods and systems for laser processing of materials |
| US9757902B2 (en) | 2014-09-02 | 2017-09-12 | Product Innovation and Engineering L.L.C. | Additive layering method using improved build description |
| US9573224B2 (en) | 2014-09-02 | 2017-02-21 | Product Innovation & Engineering, LLC | System and method for determining beam power level along an additive deposition path |
| US10632566B2 (en) | 2014-12-02 | 2020-04-28 | Product Innovation and Engineering L.L.C. | System and method for controlling the input energy from an energy point source during metal processing |
| CN105506733A (zh) * | 2015-12-23 | 2016-04-20 | 圆融光电科技股份有限公司 | 外延生长设备 |
| US9720243B1 (en) * | 2015-12-31 | 2017-08-01 | X Development Llc | Wavelength division monolithic optical device |
| CN106843316B (zh) * | 2017-03-01 | 2018-11-09 | 华中科技大学 | 一种基于光热式的快速升温控制方法、装置及升温炉 |
| US11839915B2 (en) | 2021-01-20 | 2023-12-12 | Product Innovation and Engineering LLC | System and method for determining beam power level along an additive deposition path |
| CN114216566A (zh) * | 2021-12-27 | 2022-03-22 | 中国工程物理研究院流体物理研究所 | 一种瞬态连续温度的单点测量方法及系统 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2572523A1 (fr) * | 1984-10-25 | 1986-05-02 | Bertin & Cie | Procede et dispositif pyrometriques pour determiner a distance, par voie optique, la temperature et/ou l'emissivite d'un corps ou milieu quelconque |
| EP0209131A2 (en) * | 1985-07-17 | 1987-01-21 | Nec Corporation | Optical CVD method with a strong optical intensity used during an initial period and device therefor |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1118303A (en) * | 1964-11-27 | 1968-06-26 | British Iron Steel Research | Heating control system |
| GB1372753A (en) * | 1971-01-11 | 1974-11-06 | Honeywell Inc | Apparatus for processing a workpiece with a laser beam |
| US4081215A (en) * | 1976-05-18 | 1978-03-28 | General Electric Company | Stable two-channel, single-filter spectrometer |
| WO1980000504A1 (en) * | 1978-08-18 | 1980-03-20 | Nat Res Dev | Control of deposition of thin films |
| DE3123427C2 (de) * | 1981-06-12 | 1985-10-24 | Siemens AG, 1000 Berlin und 8000 München | Anordnung zum Messen des elektrischen Widerstandes und der Temperatur von durch Aufdampfen oder Aufstäuben auf Substraten abgeschiedenen dünnen, metallischleitenden Schichten während der Schichtherstellung |
| FR2545007B1 (fr) * | 1983-04-29 | 1986-12-26 | Commissariat Energie Atomique | Procede et dispositif pour le revetement d'une piece par projection de plasma |
| US4582431A (en) * | 1983-10-11 | 1986-04-15 | Honeywell Inc. | Optical monitor for direct thickness control of transparent films |
| US4676646A (en) * | 1985-10-15 | 1987-06-30 | Energy Conversion Devices, Inc. | Method and apparatus for controlling thickness of a layer of an optical data storage device by measuring an optical property of the layer |
| JPS6217178A (ja) * | 1985-07-17 | 1987-01-26 | Nec Corp | 薄膜形成装置 |
| JPS6217179A (ja) * | 1985-07-17 | 1987-01-26 | Nec Corp | 薄膜形成方法 |
| DD254114A3 (de) * | 1985-07-30 | 1988-02-17 | Univ Dresden Tech | Pyrometrisches messverfahren |
| DE3634800A1 (de) * | 1985-12-30 | 1987-07-02 | Weinert E Messgeraetewerk | Mehrkanalmesskopf fuer ein strahlungspyrometer |
| CA1302803C (en) * | 1986-02-15 | 1992-06-09 | Hiroji Kawai | Method and apparatus for vapor deposition |
| US4699080A (en) * | 1986-05-15 | 1987-10-13 | Dynapert-Htc Corporation | Temperature sensors for vapor processing systems |
| JPS62296512A (ja) * | 1986-06-17 | 1987-12-23 | Fujitsu Ltd | 気相成長装置 |
| GB2196155B (en) * | 1986-09-20 | 1991-02-20 | Mitsubishi Electric Corp | Control apparatus for energy beam hardening |
| US4713140A (en) * | 1987-03-02 | 1987-12-15 | International Business Machines Corporation | Laser luminescence monitor for material thickness |
| DE3733147A1 (de) * | 1987-10-01 | 1989-04-13 | Messer Griesheim Gmbh | Verfahren zum laserwaermebehandeln, wie laserhaerten, laserweichgluehen, laserrekristallisieren von bauteilen in festem zustand |
| DE3739862A1 (de) * | 1987-11-25 | 1989-06-08 | Bosch Gmbh Robert | Werkstueckbearbeitungsvorrichtung |
-
1989
- 1989-03-27 US US07/329,054 patent/US4959244A/en not_active Expired - Fee Related
-
1990
- 1990-03-09 JP JP2056822A patent/JPH02267270A/ja active Pending
- 1990-03-15 GB GB9005861A patent/GB2232792B/en not_active Expired - Fee Related
- 1990-03-20 DE DE4008816A patent/DE4008816A1/de active Granted
- 1990-03-21 FR FR9003632A patent/FR2644797A1/fr active Pending
- 1990-03-27 IT IT19833A patent/IT1239491B/it active IP Right Grant
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2572523A1 (fr) * | 1984-10-25 | 1986-05-02 | Bertin & Cie | Procede et dispositif pyrometriques pour determiner a distance, par voie optique, la temperature et/ou l'emissivite d'un corps ou milieu quelconque |
| EP0209131A2 (en) * | 1985-07-17 | 1987-01-21 | Nec Corporation | Optical CVD method with a strong optical intensity used during an initial period and device therefor |
Non-Patent Citations (1)
| Title |
|---|
| INSTRUM. & EXPERIMENTAL TECHN. vol. 20, no. 2/2, 1 Mars 1977, NEW YORK, U.S.A pages 577 - 579; G.D. IVLEV ET AL.: 'measurement of surface color temperature ' * |
Also Published As
| Publication number | Publication date |
|---|---|
| IT9019833A0 (it) | 1990-03-27 |
| JPH02267270A (ja) | 1990-11-01 |
| IT9019833A1 (it) | 1991-09-27 |
| US4959244A (en) | 1990-09-25 |
| DE4008816C2 (enExample) | 1991-12-19 |
| GB2232792B (en) | 1993-11-24 |
| GB9005861D0 (en) | 1990-05-09 |
| DE4008816A1 (de) | 1990-10-04 |
| GB2232792A (en) | 1990-12-19 |
| IT1239491B (it) | 1993-11-03 |
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