JPH0222004B2 - - Google Patents
Info
- Publication number
- JPH0222004B2 JPH0222004B2 JP56037491A JP3749181A JPH0222004B2 JP H0222004 B2 JPH0222004 B2 JP H0222004B2 JP 56037491 A JP56037491 A JP 56037491A JP 3749181 A JP3749181 A JP 3749181A JP H0222004 B2 JPH0222004 B2 JP H0222004B2
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- trichlorosilane
- reaction
- sihcl
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007789 gas Substances 0.000 claims description 39
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 36
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 36
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 36
- 238000006243 chemical reaction Methods 0.000 claims description 29
- 239000011541 reaction mixture Substances 0.000 claims description 19
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 14
- 239000005052 trichlorosilane Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 239000002994 raw material Substances 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- 239000005049 silicon tetrachloride Substances 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 38
- 229910003902 SiCl 4 Inorganic materials 0.000 description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 238000006386 neutralization reaction Methods 0.000 description 5
- 238000004821 distillation Methods 0.000 description 4
- 229910003822 SiHCl3 Inorganic materials 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 229910003910 SiCl4 Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 2
- XMIJDTGORVPYLW-UHFFFAOYSA-N [SiH2] Chemical compound [SiH2] XMIJDTGORVPYLW-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3749181A JPS57156318A (en) | 1981-03-16 | 1981-03-16 | Production of trichlorosilane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3749181A JPS57156318A (en) | 1981-03-16 | 1981-03-16 | Production of trichlorosilane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57156318A JPS57156318A (en) | 1982-09-27 |
| JPH0222004B2 true JPH0222004B2 (de) | 1990-05-17 |
Family
ID=12498986
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3749181A Granted JPS57156318A (en) | 1981-03-16 | 1981-03-16 | Production of trichlorosilane |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57156318A (de) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2530638A1 (fr) * | 1982-07-26 | 1984-01-27 | Rhone Poulenc Spec Chim | Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete |
| US4526769A (en) * | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
| DE3828344C1 (de) * | 1988-08-20 | 1989-07-06 | Huels Ag, 4370 Marl, De | |
| CN100436315C (zh) * | 2001-10-19 | 2008-11-26 | 株式会社德山 | 硅的制造方法 |
| JP5205910B2 (ja) | 2006-10-31 | 2013-06-05 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
| JP5428146B2 (ja) * | 2006-10-31 | 2014-02-26 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
| JP5428145B2 (ja) | 2006-10-31 | 2014-02-26 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
| JP5205906B2 (ja) * | 2006-10-31 | 2013-06-05 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
| JP5601438B2 (ja) * | 2006-11-07 | 2014-10-08 | 三菱マテリアル株式会社 | トリクロロシランの製造方法およびトリクロロシラン製造装置 |
| JP5397580B2 (ja) * | 2007-05-25 | 2014-01-22 | 三菱マテリアル株式会社 | トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 |
| JP5333725B2 (ja) * | 2008-10-30 | 2013-11-06 | 三菱マテリアル株式会社 | トリクロロシランの製造方法および利用方法 |
| TW201031591A (en) | 2008-10-30 | 2010-09-01 | Mitsubishi Materials Corp | Process for production of trichlorosilane and method for use thereof |
| DE102009037155B3 (de) * | 2009-08-04 | 2010-11-04 | Schmid Silicon Technology Gmbh | Verfahren und Anlage zur Herstellung von Trichlorsilan |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57118017A (en) * | 1981-01-16 | 1982-07-22 | Koujiyundo Silicon Kk | Manufacture of trichlorosilane |
-
1981
- 1981-03-16 JP JP3749181A patent/JPS57156318A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57118017A (en) * | 1981-01-16 | 1982-07-22 | Koujiyundo Silicon Kk | Manufacture of trichlorosilane |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57156318A (en) | 1982-09-27 |
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