JPH0218384B2 - - Google Patents

Info

Publication number
JPH0218384B2
JPH0218384B2 JP59251062A JP25106284A JPH0218384B2 JP H0218384 B2 JPH0218384 B2 JP H0218384B2 JP 59251062 A JP59251062 A JP 59251062A JP 25106284 A JP25106284 A JP 25106284A JP H0218384 B2 JPH0218384 B2 JP H0218384B2
Authority
JP
Japan
Prior art keywords
chamber
residual gas
vacuum
pressure
mass spectrometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59251062A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61130485A (ja
Inventor
Shigeru Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP25106284A priority Critical patent/JPS61130485A/ja
Publication of JPS61130485A publication Critical patent/JPS61130485A/ja
Publication of JPH0218384B2 publication Critical patent/JPH0218384B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Measuring Fluid Pressure (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Examining Or Testing Airtightness (AREA)
  • Physical Vapour Deposition (AREA)
JP25106284A 1984-11-28 1984-11-28 真空モニタ装置 Granted JPS61130485A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25106284A JPS61130485A (ja) 1984-11-28 1984-11-28 真空モニタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25106284A JPS61130485A (ja) 1984-11-28 1984-11-28 真空モニタ装置

Publications (2)

Publication Number Publication Date
JPS61130485A JPS61130485A (ja) 1986-06-18
JPH0218384B2 true JPH0218384B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-04-25

Family

ID=17217056

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25106284A Granted JPS61130485A (ja) 1984-11-28 1984-11-28 真空モニタ装置

Country Status (1)

Country Link
JP (1) JPS61130485A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6280268A (ja) * 1985-10-04 1987-04-13 Hitachi Ltd 微細加工用真空装置
JP2952894B2 (ja) * 1989-07-03 1999-09-27 富士通株式会社 真空装置およびプロセスチャンバ内のガス分析方法
JP2945948B2 (ja) * 1990-12-26 1999-09-06 株式会社半導体エネルギー研究所 半導体膜作製方法
JP2006329662A (ja) * 2005-05-23 2006-12-07 Ulvac Japan Ltd 質量分析装置およびその使用方法
FR2888587B1 (fr) 2005-07-13 2007-10-05 Sidel Sas Appareil pour le depot pecvd d'une couche barriere interne sur un recipient, comprenant un dispositif d'analyse optique du plasma
JP4859423B2 (ja) * 2005-09-27 2012-01-25 三菱重工業株式会社 真空処理装置及びその不純物監視方法
JP4865532B2 (ja) * 2006-12-22 2012-02-01 株式会社アルバック 質量分析ユニット、及び質量分析ユニットの使用方法
JP5219960B2 (ja) * 2009-08-11 2013-06-26 株式会社アルバック プロセスモニタ装置及び成膜装置、並びにプロセスモニタ方法
CN102612641B (zh) * 2009-11-09 2015-01-14 Mks仪器公司 真空质量测量系统
CN114813447A (zh) * 2022-07-01 2022-07-29 沈阳天科合达半导体设备有限公司 一种高压气体真空分压测量装置及测量方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57161063A (en) * 1981-03-31 1982-10-04 Nippon Sheet Glass Co Ltd Method and device for sticking metallic oxide film on substrate

Also Published As

Publication number Publication date
JPS61130485A (ja) 1986-06-18

Similar Documents

Publication Publication Date Title
US4383431A (en) Auto-zero system for pressure transducers
JPH0218384B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CN110017955B (zh) 真空腔体漏率监测方法
JPH01108378A (ja) スパツタ装置
US20110315872A1 (en) Oxygen detection method, air leakage determination method, gas component detection device, and vacuum processing apparatus
US5951834A (en) Vacuum processing apparatus
JP2826409B2 (ja) ドライエッチング装置
JPH0476492B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS635529A (ja) エツチング終点検出装置
JPH11304629A (ja) 真空容器の漏洩検出方法及び成膜品質監視装置及び連続式真空成膜装置
JPS5647569A (en) Plasma etching method
JPH10144581A (ja) 半導体製造装置
JPH08222182A (ja) 質量分析装置
JP2906624B2 (ja) 薄膜形成装置
JP2507356B2 (ja) 排気システム
JP2735231B2 (ja) 半導体製造装置
JPH03197832A (ja) 真空測定装置
JPH02179869A (ja) スパッタ装置
JPH0722401A (ja) プラズマエッチング装置
JPH075265A (ja) ガス圧力変動に伴う測定誤差を補正したガスフロー型比例計数管
JPH0567665A (ja) リーク検出方法
JPH0419301B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP2000028471A (ja) プラズマ生成器における大気漏洩検出
JPH0754283Y2 (ja) 真空装置
KR20100077956A (ko) 화학기상증착장치 및 누설 압력 체크 방법

Legal Events

Date Code Title Description
S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

EXPY Cancellation because of completion of term