JPH0217935B2 - - Google Patents
Info
- Publication number
- JPH0217935B2 JPH0217935B2 JP60000431A JP43185A JPH0217935B2 JP H0217935 B2 JPH0217935 B2 JP H0217935B2 JP 60000431 A JP60000431 A JP 60000431A JP 43185 A JP43185 A JP 43185A JP H0217935 B2 JPH0217935 B2 JP H0217935B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- semiconductor layer
- gate
- thickness
- field effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/475—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
- H10D30/4755—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs having wide bandgap charge-carrier supplying layers, e.g. modulation doped HEMTs such as n-AlGaAs/GaAs HEMTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60000431A JPS61160977A (ja) | 1985-01-08 | 1985-01-08 | 電界効果トランジスタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60000431A JPS61160977A (ja) | 1985-01-08 | 1985-01-08 | 電界効果トランジスタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61160977A JPS61160977A (ja) | 1986-07-21 |
| JPH0217935B2 true JPH0217935B2 (OSRAM) | 1990-04-24 |
Family
ID=11473621
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60000431A Granted JPS61160977A (ja) | 1985-01-08 | 1985-01-08 | 電界効果トランジスタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61160977A (OSRAM) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4872038A (en) * | 1988-02-24 | 1989-10-03 | Arizona Board Of Regents | Lateral surface superlattice having negative differential conductivity novel process for producing same |
| US5023671A (en) * | 1989-03-27 | 1991-06-11 | International Business Machines Corporation | Microstructures which provide superlattice effects and one-dimensional carrier gas channels |
-
1985
- 1985-01-08 JP JP60000431A patent/JPS61160977A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61160977A (ja) | 1986-07-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4984036A (en) | Field effect transistor with multiple grooves | |
| JPH02148738A (ja) | 電界効果トランジスタの製造方法 | |
| JPS61121369A (ja) | 半導体装置 | |
| KR100250793B1 (ko) | 반도체장치 | |
| US5397907A (en) | Field effect transistor and fabricating method thereof | |
| US5448086A (en) | Field effect transistor | |
| JP2746482B2 (ja) | 電界効果型トランジスタ及びその製造方法 | |
| KR0174879B1 (ko) | 화합물 반도체 소자의 격리방법 | |
| JPH0217935B2 (OSRAM) | ||
| JP2688678B2 (ja) | 電界効果トランジスタおよびその製造方法 | |
| JPH04225533A (ja) | 電界効果トランジスタ | |
| JP3767759B2 (ja) | 電界効果型半導体素子 | |
| JPH0228254B2 (OSRAM) | ||
| JPH0685286A (ja) | 電界効果トランジスタおよびその製造方法 | |
| JP2745624B2 (ja) | 電界効果トランジスタの製造方法 | |
| JP3106747B2 (ja) | 化合物半導体fetの製造方法 | |
| JPS61160978A (ja) | 半導体装置 | |
| JPH0523497B2 (OSRAM) | ||
| KR100349368B1 (ko) | 초고주파 반도체 소자 및 그의 제조방법 | |
| JPH0715018A (ja) | 電界効果トランジスタ | |
| JPH03240243A (ja) | 電界効果型トランジスタの製造方法 | |
| JPH0529354A (ja) | 半導体装置の製造方法 | |
| KR950000661B1 (ko) | 금속-반도체 전계효과트랜지스터 및 그 제조방법 | |
| JPS6332273B2 (OSRAM) | ||
| JP3035969B2 (ja) | 化合物半導体装置の製造方法 |