JPH0217520B2 - - Google Patents

Info

Publication number
JPH0217520B2
JPH0217520B2 JP11734385A JP11734385A JPH0217520B2 JP H0217520 B2 JPH0217520 B2 JP H0217520B2 JP 11734385 A JP11734385 A JP 11734385A JP 11734385 A JP11734385 A JP 11734385A JP H0217520 B2 JPH0217520 B2 JP H0217520B2
Authority
JP
Japan
Prior art keywords
film
reaction vessel
discharge
reaction
reaction mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11734385A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61275197A (ja
Inventor
Kazuo Akashi
Toyonobu Yoshida
Shojiro Komatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP11734385A priority Critical patent/JPS61275197A/ja
Publication of JPS61275197A publication Critical patent/JPS61275197A/ja
Publication of JPH0217520B2 publication Critical patent/JPH0217520B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/403—AIII-nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP11734385A 1985-05-30 1985-05-30 窒化ほう素被膜の析出形成方法 Granted JPS61275197A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11734385A JPS61275197A (ja) 1985-05-30 1985-05-30 窒化ほう素被膜の析出形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11734385A JPS61275197A (ja) 1985-05-30 1985-05-30 窒化ほう素被膜の析出形成方法

Publications (2)

Publication Number Publication Date
JPS61275197A JPS61275197A (ja) 1986-12-05
JPH0217520B2 true JPH0217520B2 (enrdf_load_stackoverflow) 1990-04-20

Family

ID=14709354

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11734385A Granted JPS61275197A (ja) 1985-05-30 1985-05-30 窒化ほう素被膜の析出形成方法

Country Status (1)

Country Link
JP (1) JPS61275197A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6395200A (ja) * 1986-10-09 1988-04-26 Sumitomo Electric Ind Ltd 硬質窒化ホウ素膜の製造方法
JP4860665B2 (ja) * 2008-06-11 2012-01-25 日本電信電話株式会社 窒化ホウ素の単結晶薄膜構造およびその製造方法

Also Published As

Publication number Publication date
JPS61275197A (ja) 1986-12-05

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