JPH0214663B2 - - Google Patents

Info

Publication number
JPH0214663B2
JPH0214663B2 JP55148987A JP14898780A JPH0214663B2 JP H0214663 B2 JPH0214663 B2 JP H0214663B2 JP 55148987 A JP55148987 A JP 55148987A JP 14898780 A JP14898780 A JP 14898780A JP H0214663 B2 JPH0214663 B2 JP H0214663B2
Authority
JP
Japan
Prior art keywords
sample
secondary electrons
voltage
grid
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55148987A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5772072A (en
Inventor
Yoshiaki Goto
Akio Ito
Toshihiro Ishizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55148987A priority Critical patent/JPS5772072A/ja
Publication of JPS5772072A publication Critical patent/JPS5772072A/ja
Publication of JPH0214663B2 publication Critical patent/JPH0214663B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • G01R31/265—Contactless testing
    • G01R31/2653—Contactless testing using electron beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/266—Measurement of magnetic or electric fields in the object; Lorentzmicroscopy
    • H01J37/268—Measurement of magnetic or electric fields in the object; Lorentzmicroscopy with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measurement Of Current Or Voltage (AREA)
  • Tests Of Electronic Circuits (AREA)
JP55148987A 1980-10-24 1980-10-24 Voltage measuring device Granted JPS5772072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55148987A JPS5772072A (en) 1980-10-24 1980-10-24 Voltage measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55148987A JPS5772072A (en) 1980-10-24 1980-10-24 Voltage measuring device

Publications (2)

Publication Number Publication Date
JPS5772072A JPS5772072A (en) 1982-05-06
JPH0214663B2 true JPH0214663B2 (enrdf_load_stackoverflow) 1990-04-09

Family

ID=15465159

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55148987A Granted JPS5772072A (en) 1980-10-24 1980-10-24 Voltage measuring device

Country Status (1)

Country Link
JP (1) JPS5772072A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197575A (ja) * 1984-10-19 1986-05-16 Jeol Ltd 電子線を用いた電位測定装置
JPS6250672A (ja) * 1985-08-30 1987-03-05 Jeol Ltd 電位測定装置
EP0518633B1 (en) * 1991-06-10 1997-11-12 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5384463A (en) * 1991-06-10 1995-01-24 Fujisu Limited Pattern inspection apparatus and electron beam apparatus
JP5077643B2 (ja) * 2007-03-02 2012-11-21 株式会社島津製作所 Ｔｆｔアレイ検査装置
US8944679B2 (en) 2009-08-28 2015-02-03 National Institute Of Advanced Industrial Science And Technology Electrode member, electron energy analyzer, photoelectron energy analyzer, and temperature measuring apparatus
EP3330998B1 (en) * 2016-01-21 2021-10-13 Japan Synchrotron Radiation Research Institute Retarding potential type energy analyzer

Also Published As

Publication number Publication date
JPS5772072A (en) 1982-05-06

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