JPS5772072A - Voltage measuring device - Google Patents
Voltage measuring deviceInfo
- Publication number
- JPS5772072A JPS5772072A JP55148987A JP14898780A JPS5772072A JP S5772072 A JPS5772072 A JP S5772072A JP 55148987 A JP55148987 A JP 55148987A JP 14898780 A JP14898780 A JP 14898780A JP S5772072 A JPS5772072 A JP S5772072A
- Authority
- JP
- Japan
- Prior art keywords
- specimen
- electron beam
- secondary electrons
- microchannel plate
- irradiated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/265—Contactless testing
- G01R31/2653—Contactless testing using electron beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/266—Measurement of magnetic- or electric fields in the object; Lorentzmicroscopy
- H01J37/268—Measurement of magnetic- or electric fields in the object; Lorentzmicroscopy with scanning beams
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55148987A JPS5772072A (en) | 1980-10-24 | 1980-10-24 | Voltage measuring device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55148987A JPS5772072A (en) | 1980-10-24 | 1980-10-24 | Voltage measuring device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5772072A true JPS5772072A (en) | 1982-05-06 |
JPH0214663B2 JPH0214663B2 (ja) | 1990-04-09 |
Family
ID=15465159
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55148987A Granted JPS5772072A (en) | 1980-10-24 | 1980-10-24 | Voltage measuring device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5772072A (ja) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0105440A2 (de) * | 1982-09-30 | 1984-04-18 | Siemens Aktiengesellschaft | Spektrometerobjektiv für die Korpuskularstrahl-Messtechnik |
EP0105439A2 (de) * | 1982-09-30 | 1984-04-18 | Siemens Aktiengesellschaft | Spektrometerobjektiv mit parallelen Objektiv- und Spektrometerfeldern für die Potentialmesstechnik |
JPS6197575A (ja) * | 1984-10-19 | 1986-05-16 | Jeol Ltd | 電子線を用いた電位測定装置 |
JPS6250672A (ja) * | 1985-08-30 | 1987-03-05 | Jeol Ltd | 電位測定装置 |
US5384463A (en) * | 1991-06-10 | 1995-01-24 | Fujisu Limited | Pattern inspection apparatus and electron beam apparatus |
US5430292A (en) * | 1991-06-10 | 1995-07-04 | Fujitsu Limited | Pattern inspection apparatus and electron beam apparatus |
US5557105A (en) * | 1991-06-10 | 1996-09-17 | Fujitsu Limited | Pattern inspection apparatus and electron beam apparatus |
JP2008218159A (ja) * | 2007-03-02 | 2008-09-18 | Shimadzu Corp | Tftアレイ検査装置 |
WO2011024677A1 (ja) * | 2009-08-28 | 2011-03-03 | 独立行政法人産業技術総合研究所 | 電極部材、電子エネルギー分析器、光電子エネルギー分析器、及び温度測定装置 |
WO2017126089A1 (ja) * | 2016-01-21 | 2017-07-27 | 公益財団法人高輝度光科学研究センター | 阻止電位型エネルギー分析器 |
-
1980
- 1980-10-24 JP JP55148987A patent/JPS5772072A/ja active Granted
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0105440A2 (de) * | 1982-09-30 | 1984-04-18 | Siemens Aktiengesellschaft | Spektrometerobjektiv für die Korpuskularstrahl-Messtechnik |
EP0105439A2 (de) * | 1982-09-30 | 1984-04-18 | Siemens Aktiengesellschaft | Spektrometerobjektiv mit parallelen Objektiv- und Spektrometerfeldern für die Potentialmesstechnik |
JPS6197575A (ja) * | 1984-10-19 | 1986-05-16 | Jeol Ltd | 電子線を用いた電位測定装置 |
JPS6250672A (ja) * | 1985-08-30 | 1987-03-05 | Jeol Ltd | 電位測定装置 |
US5384463A (en) * | 1991-06-10 | 1995-01-24 | Fujisu Limited | Pattern inspection apparatus and electron beam apparatus |
US5430292A (en) * | 1991-06-10 | 1995-07-04 | Fujitsu Limited | Pattern inspection apparatus and electron beam apparatus |
US5557105A (en) * | 1991-06-10 | 1996-09-17 | Fujitsu Limited | Pattern inspection apparatus and electron beam apparatus |
JP2008218159A (ja) * | 2007-03-02 | 2008-09-18 | Shimadzu Corp | Tftアレイ検査装置 |
WO2011024677A1 (ja) * | 2009-08-28 | 2011-03-03 | 独立行政法人産業技術総合研究所 | 電極部材、電子エネルギー分析器、光電子エネルギー分析器、及び温度測定装置 |
JP5545577B2 (ja) * | 2009-08-28 | 2014-07-09 | 独立行政法人産業技術総合研究所 | 電極部材、電子エネルギー分析器、光電子エネルギー分析器、及び温度測定装置 |
US8944679B2 (en) | 2009-08-28 | 2015-02-03 | National Institute Of Advanced Industrial Science And Technology | Electrode member, electron energy analyzer, photoelectron energy analyzer, and temperature measuring apparatus |
WO2017126089A1 (ja) * | 2016-01-21 | 2017-07-27 | 公益財団法人高輝度光科学研究センター | 阻止電位型エネルギー分析器 |
US10319578B2 (en) | 2016-01-21 | 2019-06-11 | Japan Synchrotron Radiation Research Institute | Retarding potential type energy analyzer |
Also Published As
Publication number | Publication date |
---|---|
JPH0214663B2 (ja) | 1990-04-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5772072A (en) | Voltage measuring device | |
JPS5776837A (en) | Apparatus for multipile electron beam exposure | |
GB1571551A (en) | Electron discharge tube having an electron emissive electrode | |
SU830597A1 (ru) | Способ детектировани сигналаВ PACTPOBOM элЕКТРОННОМ МиКРОСКОпЕ | |
JPS5360178A (en) | Target for focusing of electron beam | |
JPS5684853A (en) | Face structure of member located close to electron beam path | |
Crandall | Search for Charm Production in 17 Gev/c Negative Pion-Proton Interactions. | |
JPS6433840A (en) | Surface analyzer | |
JPS52127390A (en) | Energy analyzer for secondary electron | |
SU150946A1 (ru) | Ионна ловушка | |
JPS5580255A (en) | Charged particle beam processing device | |
JPS548952A (en) | Current amplifying circuit | |
JPS52115161A (en) | Electron gun for electron beam exposing device | |
JPS5616853A (en) | Surface analysis unit | |
JPS5471558A (en) | Display unit | |
JPS5471559A (en) | Display unit | |
JPS5699949A (en) | Shadow mask | |
JPS5418679A (en) | Electron impact type ion source device | |
JPS5796525A (en) | Method of charged beam exposure | |
JPS5765660A (en) | Ion beam device | |
SU691034A1 (ru) | Измеритель ускорений | |
JPS5336292A (en) | Analyzer for charged particles | |
Binet et al. | Primary production and accumulation of bioelements at the level of a pure population of Atriplex hastata L. on the banks of the Seine Estuary(France).). | |
JPS56141158A (en) | Electron microscope device | |
JPS5740924A (en) | Exposing method and device for electron beam resist |