JPS5772072A - Voltage measuring device - Google Patents

Voltage measuring device

Info

Publication number
JPS5772072A
JPS5772072A JP55148987A JP14898780A JPS5772072A JP S5772072 A JPS5772072 A JP S5772072A JP 55148987 A JP55148987 A JP 55148987A JP 14898780 A JP14898780 A JP 14898780A JP S5772072 A JPS5772072 A JP S5772072A
Authority
JP
Japan
Prior art keywords
specimen
electron beam
secondary electrons
microchannel plate
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55148987A
Other languages
English (en)
Other versions
JPH0214663B2 (ja
Inventor
Yoshiaki Goto
Akio Ito
Toshihiro Ishizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55148987A priority Critical patent/JPS5772072A/ja
Publication of JPS5772072A publication Critical patent/JPS5772072A/ja
Publication of JPH0214663B2 publication Critical patent/JPH0214663B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/265Contactless testing
    • G01R31/2653Contactless testing using electron beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/266Measurement of magnetic- or electric fields in the object; Lorentzmicroscopy
    • H01J37/268Measurement of magnetic- or electric fields in the object; Lorentzmicroscopy with scanning beams
JP55148987A 1980-10-24 1980-10-24 Voltage measuring device Granted JPS5772072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55148987A JPS5772072A (en) 1980-10-24 1980-10-24 Voltage measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55148987A JPS5772072A (en) 1980-10-24 1980-10-24 Voltage measuring device

Publications (2)

Publication Number Publication Date
JPS5772072A true JPS5772072A (en) 1982-05-06
JPH0214663B2 JPH0214663B2 (ja) 1990-04-09

Family

ID=15465159

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55148987A Granted JPS5772072A (en) 1980-10-24 1980-10-24 Voltage measuring device

Country Status (1)

Country Link
JP (1) JPS5772072A (ja)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0105440A2 (de) * 1982-09-30 1984-04-18 Siemens Aktiengesellschaft Spektrometerobjektiv für die Korpuskularstrahl-Messtechnik
EP0105439A2 (de) * 1982-09-30 1984-04-18 Siemens Aktiengesellschaft Spektrometerobjektiv mit parallelen Objektiv- und Spektrometerfeldern für die Potentialmesstechnik
JPS6197575A (ja) * 1984-10-19 1986-05-16 Jeol Ltd 電子線を用いた電位測定装置
JPS6250672A (ja) * 1985-08-30 1987-03-05 Jeol Ltd 電位測定装置
US5384463A (en) * 1991-06-10 1995-01-24 Fujisu Limited Pattern inspection apparatus and electron beam apparatus
US5430292A (en) * 1991-06-10 1995-07-04 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
JP2008218159A (ja) * 2007-03-02 2008-09-18 Shimadzu Corp Tftアレイ検査装置
WO2011024677A1 (ja) * 2009-08-28 2011-03-03 独立行政法人産業技術総合研究所 電極部材、電子エネルギー分析器、光電子エネルギー分析器、及び温度測定装置
WO2017126089A1 (ja) * 2016-01-21 2017-07-27 公益財団法人高輝度光科学研究センター 阻止電位型エネルギー分析器

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0105440A2 (de) * 1982-09-30 1984-04-18 Siemens Aktiengesellschaft Spektrometerobjektiv für die Korpuskularstrahl-Messtechnik
EP0105439A2 (de) * 1982-09-30 1984-04-18 Siemens Aktiengesellschaft Spektrometerobjektiv mit parallelen Objektiv- und Spektrometerfeldern für die Potentialmesstechnik
JPS6197575A (ja) * 1984-10-19 1986-05-16 Jeol Ltd 電子線を用いた電位測定装置
JPS6250672A (ja) * 1985-08-30 1987-03-05 Jeol Ltd 電位測定装置
US5384463A (en) * 1991-06-10 1995-01-24 Fujisu Limited Pattern inspection apparatus and electron beam apparatus
US5430292A (en) * 1991-06-10 1995-07-04 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
JP2008218159A (ja) * 2007-03-02 2008-09-18 Shimadzu Corp Tftアレイ検査装置
WO2011024677A1 (ja) * 2009-08-28 2011-03-03 独立行政法人産業技術総合研究所 電極部材、電子エネルギー分析器、光電子エネルギー分析器、及び温度測定装置
JP5545577B2 (ja) * 2009-08-28 2014-07-09 独立行政法人産業技術総合研究所 電極部材、電子エネルギー分析器、光電子エネルギー分析器、及び温度測定装置
US8944679B2 (en) 2009-08-28 2015-02-03 National Institute Of Advanced Industrial Science And Technology Electrode member, electron energy analyzer, photoelectron energy analyzer, and temperature measuring apparatus
WO2017126089A1 (ja) * 2016-01-21 2017-07-27 公益財団法人高輝度光科学研究センター 阻止電位型エネルギー分析器
US10319578B2 (en) 2016-01-21 2019-06-11 Japan Synchrotron Radiation Research Institute Retarding potential type energy analyzer

Also Published As

Publication number Publication date
JPH0214663B2 (ja) 1990-04-09

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