JPH0214426B2 - - Google Patents

Info

Publication number
JPH0214426B2
JPH0214426B2 JP19675384A JP19675384A JPH0214426B2 JP H0214426 B2 JPH0214426 B2 JP H0214426B2 JP 19675384 A JP19675384 A JP 19675384A JP 19675384 A JP19675384 A JP 19675384A JP H0214426 B2 JPH0214426 B2 JP H0214426B2
Authority
JP
Japan
Prior art keywords
energy
deposited film
ion beam
substrate
vapor deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19675384A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6176665A (ja
Inventor
Hiroki Kuwano
Fusao Shimokawa
Kazutoshi Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP19675384A priority Critical patent/JPS6176665A/ja
Publication of JPS6176665A publication Critical patent/JPS6176665A/ja
Publication of JPH0214426B2 publication Critical patent/JPH0214426B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP19675384A 1984-09-21 1984-09-21 蒸着膜形成装置 Granted JPS6176665A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19675384A JPS6176665A (ja) 1984-09-21 1984-09-21 蒸着膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19675384A JPS6176665A (ja) 1984-09-21 1984-09-21 蒸着膜形成装置

Publications (2)

Publication Number Publication Date
JPS6176665A JPS6176665A (ja) 1986-04-19
JPH0214426B2 true JPH0214426B2 (OSRAM) 1990-04-09

Family

ID=16363037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19675384A Granted JPS6176665A (ja) 1984-09-21 1984-09-21 蒸着膜形成装置

Country Status (1)

Country Link
JP (1) JPS6176665A (OSRAM)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62177176A (ja) * 1986-01-30 1987-08-04 Nippon Steel Corp 薄膜形成装置
JPH0774441B2 (ja) * 1987-06-05 1995-08-09 株式会社日立製作所 イオンビ−ムスパツタ装置
JPH0748368B2 (ja) * 1989-12-19 1995-05-24 株式会社日本製鋼所 複合イオンビーム照射方法及び照射装置
JPH04173961A (ja) * 1990-11-06 1992-06-22 Japan Steel Works Ltd:The 複合イオンビームによるダイナミックミキシング方法
JP7220122B2 (ja) * 2019-06-05 2023-02-09 株式会社アルバック イオン注入装置、イオン源

Also Published As

Publication number Publication date
JPS6176665A (ja) 1986-04-19

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