JPH0213478B2 - - Google Patents
Info
- Publication number
- JPH0213478B2 JPH0213478B2 JP60011484A JP1148485A JPH0213478B2 JP H0213478 B2 JPH0213478 B2 JP H0213478B2 JP 60011484 A JP60011484 A JP 60011484A JP 1148485 A JP1148485 A JP 1148485A JP H0213478 B2 JPH0213478 B2 JP H0213478B2
- Authority
- JP
- Japan
- Prior art keywords
- multilayer wiring
- melting point
- paste
- wiring board
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004020 conductor Substances 0.000 claims description 66
- 238000002844 melting Methods 0.000 claims description 32
- 239000000919 ceramic Substances 0.000 claims description 26
- 230000008018 melting Effects 0.000 claims description 26
- 239000011521 glass Substances 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 22
- 239000002184 metal Substances 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 229910000510 noble metal Inorganic materials 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 12
- 230000001590 oxidative effect Effects 0.000 claims description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- 229910052745 lead Inorganic materials 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 description 50
- 230000003647 oxidation Effects 0.000 description 22
- 238000007254 oxidation reaction Methods 0.000 description 22
- 239000011241 protective layer Substances 0.000 description 18
- 238000010304 firing Methods 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 238000007639 printing Methods 0.000 description 6
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000010970 precious metal Substances 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000001856 Ethyl cellulose Substances 0.000 description 3
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 3
- 229920001249 ethyl cellulose Polymers 0.000 description 3
- 235000019325 ethyl cellulose Nutrition 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 239000000156 glass melt Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60011484A JPS61170094A (ja) | 1985-01-24 | 1985-01-24 | セラミツク多層配線基板の製造法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60011484A JPS61170094A (ja) | 1985-01-24 | 1985-01-24 | セラミツク多層配線基板の製造法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61170094A JPS61170094A (ja) | 1986-07-31 |
JPH0213478B2 true JPH0213478B2 (th) | 1990-04-04 |
Family
ID=11779323
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60011484A Granted JPS61170094A (ja) | 1985-01-24 | 1985-01-24 | セラミツク多層配線基板の製造法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61170094A (th) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6782996B1 (ja) | 2019-07-08 | 2020-11-11 | 株式会社ワールドメタル | 接合基材と金属層の接合体 |
-
1985
- 1985-01-24 JP JP60011484A patent/JPS61170094A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61170094A (ja) | 1986-07-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3237258B2 (ja) | セラミック多層配線基板 | |
KR100812077B1 (ko) | 전자부품 및 그 제조방법 | |
JPH0728128B2 (ja) | セラミック多層配線基板とその製造方法 | |
KR900004379B1 (ko) | 세라믹 다층기판 및 그 제조방법 | |
US5120473A (en) | Metallizing composition for use with ceramics | |
JPH0213478B2 (th) | ||
JPH0348415A (ja) | ペースト組成物および積層セラミックコンデンサの製造方法 | |
JP2727651B2 (ja) | セラミックス基板 | |
JPS61275161A (ja) | 低温焼成多層セラミツク基板 | |
JPH0213479B2 (th) | ||
JPS6318356B2 (th) | ||
JPS6318357B2 (th) | ||
JP3197147B2 (ja) | 多層セラミック基板の製造方法 | |
JPS6253960B2 (th) | ||
JPH0521935A (ja) | 回路基板 | |
JPS63301405A (ja) | 低温焼成型導電性ペ−スト及び回路基板の製造方法 | |
JPH0588557B2 (th) | ||
JP2842710B2 (ja) | 回路基板 | |
JPS6077187A (ja) | セラミツク電子部品及びその製造法 | |
JP2738603B2 (ja) | 回路基板 | |
JPH0321109B2 (th) | ||
JPH0253951B2 (th) | ||
JPS63295491A (ja) | メタライズ組成物 | |
JPH0691319B2 (ja) | 低温焼成セラミックス基板の製造方法 | |
JPH11186001A (ja) | 抵抗材料とこれを用いたセラミック積層部品 |