JPH021226B2 - - Google Patents
Info
- Publication number
- JPH021226B2 JPH021226B2 JP5405081A JP5405081A JPH021226B2 JP H021226 B2 JPH021226 B2 JP H021226B2 JP 5405081 A JP5405081 A JP 5405081A JP 5405081 A JP5405081 A JP 5405081A JP H021226 B2 JPH021226 B2 JP H021226B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- vapor deposition
- shielding plate
- frequency
- crystal piece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims description 69
- 238000001704 evaporation Methods 0.000 claims description 21
- 230000008020 evaporation Effects 0.000 claims description 21
- 238000007740 vapor deposition Methods 0.000 claims description 20
- 230000005284 excitation Effects 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 238000007738 vacuum evaporation Methods 0.000 claims description 13
- 238000001771 vacuum deposition Methods 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 8
- 238000000605 extraction Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 6
- 230000010355 oscillation Effects 0.000 claims description 6
- 230000002441 reversible effect Effects 0.000 claims description 2
- 238000012544 monitoring process Methods 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000003780 insertion Methods 0.000 description 3
- 230000037431 insertion Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5405081A JPS57169087A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-deposition device of crystal resonator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5405081A JPS57169087A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-deposition device of crystal resonator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57169087A JPS57169087A (en) | 1982-10-18 |
| JPH021226B2 true JPH021226B2 (enrdf_load_stackoverflow) | 1990-01-10 |
Family
ID=12959776
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5405081A Granted JPS57169087A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-deposition device of crystal resonator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57169087A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2586443B2 (ja) * | 1984-07-31 | 1997-02-26 | カシオ計算機株式会社 | 波形発生装置 |
| JP5550415B2 (ja) * | 2010-03-29 | 2014-07-16 | セイコーインスツル株式会社 | 端子付電気化学セルおよび製造方法 |
-
1981
- 1981-04-10 JP JP5405081A patent/JPS57169087A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57169087A (en) | 1982-10-18 |
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