JPS57169087A - Vacuum vapor-deposition device of crystal resonator - Google Patents
Vacuum vapor-deposition device of crystal resonatorInfo
- Publication number
- JPS57169087A JPS57169087A JP5405081A JP5405081A JPS57169087A JP S57169087 A JPS57169087 A JP S57169087A JP 5405081 A JP5405081 A JP 5405081A JP 5405081 A JP5405081 A JP 5405081A JP S57169087 A JPS57169087 A JP S57169087A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- shielding plate
- deposition
- evaporated
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 title abstract 6
- 239000013078 crystal Substances 0.000 title abstract 2
- 230000008020 evaporation Effects 0.000 abstract 3
- 238000001704 evaporation Methods 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 3
- 238000000151 deposition Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5405081A JPS57169087A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-deposition device of crystal resonator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5405081A JPS57169087A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-deposition device of crystal resonator |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57169087A true JPS57169087A (en) | 1982-10-18 |
JPH021226B2 JPH021226B2 (enrdf_load_stackoverflow) | 1990-01-10 |
Family
ID=12959776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5405081A Granted JPS57169087A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-deposition device of crystal resonator |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57169087A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61179496A (ja) * | 1984-07-31 | 1986-08-12 | カシオ計算機株式会社 | 波形発生装置 |
JP2011210495A (ja) * | 2010-03-29 | 2011-10-20 | Seiko Instruments Inc | 端子付電気化学セルおよび製造方法 |
-
1981
- 1981-04-10 JP JP5405081A patent/JPS57169087A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61179496A (ja) * | 1984-07-31 | 1986-08-12 | カシオ計算機株式会社 | 波形発生装置 |
JP2011210495A (ja) * | 2010-03-29 | 2011-10-20 | Seiko Instruments Inc | 端子付電気化学セルおよび製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH021226B2 (enrdf_load_stackoverflow) | 1990-01-10 |
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