JPH025818B2 - - Google Patents
Info
- Publication number
- JPH025818B2 JPH025818B2 JP5404781A JP5404781A JPH025818B2 JP H025818 B2 JPH025818 B2 JP H025818B2 JP 5404781 A JP5404781 A JP 5404781A JP 5404781 A JP5404781 A JP 5404781A JP H025818 B2 JPH025818 B2 JP H025818B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- shielding plate
- sample
- evaporation
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims description 55
- 238000001704 evaporation Methods 0.000 claims description 20
- 230000008020 evaporation Effects 0.000 claims description 19
- 238000007738 vacuum evaporation Methods 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 5
- 239000007769 metal material Substances 0.000 claims description 2
- 230000005284 excitation Effects 0.000 description 14
- 230000005540 biological transmission Effects 0.000 description 13
- 238000007740 vapor deposition Methods 0.000 description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 12
- 229910052737 gold Inorganic materials 0.000 description 12
- 239000010931 gold Substances 0.000 description 12
- 238000001771 vacuum deposition Methods 0.000 description 10
- 238000000151 deposition Methods 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 7
- 229910052804 chromium Inorganic materials 0.000 description 6
- 239000011651 chromium Substances 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- VYZAMTAEIAYCRO-OIOBTWANSA-N chromium-49 Chemical compound [49Cr] VYZAMTAEIAYCRO-OIOBTWANSA-N 0.000 description 5
- 238000003780 insertion Methods 0.000 description 5
- 230000037431 insertion Effects 0.000 description 5
- 230000010355 oscillation Effects 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- LJAOOBNHPFKCDR-UHFFFAOYSA-K chromium(3+) trichloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Cl-].[Cr+3] LJAOOBNHPFKCDR-UHFFFAOYSA-K 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5404781A JPS57169084A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-depositing device of crystal resonator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5404781A JPS57169084A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-depositing device of crystal resonator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57169084A JPS57169084A (en) | 1982-10-18 |
| JPH025818B2 true JPH025818B2 (enrdf_load_stackoverflow) | 1990-02-06 |
Family
ID=12959685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5404781A Granted JPS57169084A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-depositing device of crystal resonator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57169084A (enrdf_load_stackoverflow) |
-
1981
- 1981-04-10 JP JP5404781A patent/JPS57169084A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57169084A (en) | 1982-10-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3466607B2 (ja) | スパッタリング装置 | |
| US7595089B2 (en) | Deposition method for semiconductor laser bars using a clamping jig | |
| JP6712384B2 (ja) | 膜厚監視装置 | |
| JPH025818B2 (enrdf_load_stackoverflow) | ||
| US5937493A (en) | Method of manufacturing an electronic multilayer component | |
| JPH021224B2 (enrdf_load_stackoverflow) | ||
| JPH021225B2 (enrdf_load_stackoverflow) | ||
| JPH021226B2 (enrdf_load_stackoverflow) | ||
| JPS5812336B2 (ja) | ジヨウチヤクマクアツソクテイホウホウ | |
| JPS63153265A (ja) | スパツタ装置 | |
| JPH09256156A (ja) | 成膜装置 | |
| JPS6360275A (ja) | スパツタリング装置 | |
| JP2000151323A (ja) | 圧電振動子の周波数調整装置 | |
| KR200191059Y1 (ko) | 인시츄 물리기상 증착기 | |
| JP2000114201A (ja) | 蒸着装置 | |
| JPH0638111Y2 (ja) | 成膜装置の試料台保持機構 | |
| JP2890686B2 (ja) | レーザ・スパッタリング装置 | |
| KR200208493Y1 (ko) | 물리기상 증착기 | |
| JPS5842441Y2 (ja) | 蒸着装置 | |
| JPH06172998A (ja) | 薄膜製造方法および装置 | |
| JPH0722348A (ja) | 半導体製造装置 | |
| JPH01209810A (ja) | 圧電振動子およびその周波数微調整方法 | |
| KR910006920Y1 (ko) | 저항가열 진공증착장치 | |
| JPS5842268B2 (ja) | ジヨウチヤクソウチ | |
| JPS6217027B2 (enrdf_load_stackoverflow) |