JPH021224B2 - - Google Patents

Info

Publication number
JPH021224B2
JPH021224B2 JP5404881A JP5404881A JPH021224B2 JP H021224 B2 JPH021224 B2 JP H021224B2 JP 5404881 A JP5404881 A JP 5404881A JP 5404881 A JP5404881 A JP 5404881A JP H021224 B2 JPH021224 B2 JP H021224B2
Authority
JP
Japan
Prior art keywords
crystal
evaporation
vapor deposition
hole
adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5404881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57169085A (en
Inventor
Yasuo Nomura
Toshio Hayashi
Toshiki Suganuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Dempa Kogyo Co Ltd
Original Assignee
Nihon Dempa Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Dempa Kogyo Co Ltd filed Critical Nihon Dempa Kogyo Co Ltd
Priority to JP5404881A priority Critical patent/JPS57169085A/ja
Publication of JPS57169085A publication Critical patent/JPS57169085A/ja
Publication of JPH021224B2 publication Critical patent/JPH021224B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
JP5404881A 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator Granted JPS57169085A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5404881A JPS57169085A (en) 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5404881A JPS57169085A (en) 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator

Publications (2)

Publication Number Publication Date
JPS57169085A JPS57169085A (en) 1982-10-18
JPH021224B2 true JPH021224B2 (enrdf_load_stackoverflow) 1990-01-10

Family

ID=12959715

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5404881A Granted JPS57169085A (en) 1981-04-10 1981-04-10 Vacuum vapor-depositing device of crystal resonator

Country Status (1)

Country Link
JP (1) JPS57169085A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS57169085A (en) 1982-10-18

Similar Documents

Publication Publication Date Title
JP3466607B2 (ja) スパッタリング装置
JPS6340493B2 (enrdf_load_stackoverflow)
JP6712384B2 (ja) 膜厚監視装置
JPH021224B2 (enrdf_load_stackoverflow)
JP3975696B2 (ja) 圧電振動子の製造方法および圧電振動子
JPH025818B2 (enrdf_load_stackoverflow)
JP3720846B2 (ja) 複数の電子多層構成部品の製造方法
US4631197A (en) Apparatus and method for adjusting the frequency of a resonator by laser
JPH021225B2 (enrdf_load_stackoverflow)
JPH021226B2 (enrdf_load_stackoverflow)
US4833430A (en) Coupled-dual resonator crystal
JP2002217675A (ja) 圧電振動素子の電極構造及び製造装置
US2621624A (en) Apparatus for manufacture of piezo-electric elements
JP2000307368A (ja) 圧電振動子の製造方法
JP2016166380A (ja) 成膜マスク装置、及び電子素子の製造方法
JPS634727B2 (enrdf_load_stackoverflow)
US3681828A (en) Method of making rotors for variable capacitors
JPH09256156A (ja) 成膜装置
JPS63153265A (ja) スパツタ装置
JP2000151323A (ja) 圧電振動子の周波数調整装置
JPS63285983A (ja) 薄膜圧電素子の製造方法
JP2518582Y2 (ja) 圧電片の整列装置
KR20000024501A (ko) 인시츄 물리기상 증착기
JPH02179873A (ja) ワークの転載装置
JPH01209810A (ja) 圧電振動子およびその周波数微調整方法