JPH0211849B2 - - Google Patents
Info
- Publication number
- JPH0211849B2 JPH0211849B2 JP56116512A JP11651281A JPH0211849B2 JP H0211849 B2 JPH0211849 B2 JP H0211849B2 JP 56116512 A JP56116512 A JP 56116512A JP 11651281 A JP11651281 A JP 11651281A JP H0211849 B2 JPH0211849 B2 JP H0211849B2
- Authority
- JP
- Japan
- Prior art keywords
- analyzer
- polarizer
- light
- polarization
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11651281A JPS5818146A (ja) | 1981-07-27 | 1981-07-27 | 測光型偏光解析装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11651281A JPS5818146A (ja) | 1981-07-27 | 1981-07-27 | 測光型偏光解析装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5818146A JPS5818146A (ja) | 1983-02-02 |
JPH0211849B2 true JPH0211849B2 (enrdf_load_stackoverflow) | 1990-03-16 |
Family
ID=14688976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11651281A Granted JPS5818146A (ja) | 1981-07-27 | 1981-07-27 | 測光型偏光解析装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5818146A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2810737B1 (fr) | 2000-06-23 | 2003-04-18 | Oreal | Appareil et procede d'examen d'une surface |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5414952A (en) * | 1977-07-04 | 1979-02-03 | Kao Corp | 1-halogenocarbonyltricyclo(4,3,1,12,5)undecane |
JPS5619576A (en) * | 1979-07-25 | 1981-02-24 | Fujitsu Ltd | Address matching detection system in multiple-space processing data processing system |
-
1981
- 1981-07-27 JP JP11651281A patent/JPS5818146A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5818146A (ja) | 1983-02-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4647207A (en) | Ellipsometric method and apparatus | |
US3985447A (en) | Measurement of thin films by polarized light | |
US6081337A (en) | Method and apparatus for measuring liquid crystal cell properties | |
Fanton et al. | Multiparameter measurements of thin films using beam‐profile reflectometry | |
US6583875B1 (en) | Monitoring temperature and sample characteristics using a rotating compensator ellipsometer | |
US5034617A (en) | Method and apparatus for measuring refractive index and thickness of film | |
CN1187600C (zh) | 测量光学薄膜等效折射率及物理厚度的设备和方法 | |
JPH02503115A (ja) | デファレンシャルエリプソメーター | |
JP3781245B2 (ja) | 半導体装置の製造方法 | |
EP0144115B1 (en) | An ellipsometer | |
US6731386B2 (en) | Measurement technique for ultra-thin oxides | |
JPH0211849B2 (enrdf_load_stackoverflow) | ||
JPH07159131A (ja) | エリプソパラメータ測定方法及びエリプソメータ | |
JPH055699A (ja) | 異方性薄膜の屈折率及び膜厚測定方法 | |
JPS6250769B2 (enrdf_load_stackoverflow) | ||
JPH1038694A (ja) | エリプソメーター | |
US7342661B2 (en) | Method for noise improvement in ellipsometers | |
JP3007944B2 (ja) | 薄膜の光学的性質を求める方法 | |
Carren et al. | Use of spectrogoniometric—ellipsometric techniques for the determination of optical properties of films of trinitrofluorenone and poly-n-vinylcarbazole | |
JPH06147837A (ja) | 光学的膜厚測定方法及び装置 | |
JPH0781837B2 (ja) | エリプソメ−タ | |
US7307723B2 (en) | Method for the optical characterization of materials without using a physical model | |
JPH04357405A (ja) | 偏光解析装置 | |
박지훈 | Region Classification and Thin-film Thickness Measurement Using Color Camera Imaging Mueller Matrix Ellipsometry | |
Epner et al. | Spectroscopic Ellipsometry Analysis of Opaque Gold Film for Epner Technology |