JPH021119B2 - - Google Patents
Info
- Publication number
- JPH021119B2 JPH021119B2 JP57031090A JP3109082A JPH021119B2 JP H021119 B2 JPH021119 B2 JP H021119B2 JP 57031090 A JP57031090 A JP 57031090A JP 3109082 A JP3109082 A JP 3109082A JP H021119 B2 JPH021119 B2 JP H021119B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- silicon crystal
- silicon
- heat treatment
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3109082A JPS58151393A (ja) | 1982-02-26 | 1982-02-26 | シリコン結晶の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3109082A JPS58151393A (ja) | 1982-02-26 | 1982-02-26 | シリコン結晶の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58151393A JPS58151393A (ja) | 1983-09-08 |
| JPH021119B2 true JPH021119B2 (cs) | 1990-01-10 |
Family
ID=12321702
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3109082A Granted JPS58151393A (ja) | 1982-02-26 | 1982-02-26 | シリコン結晶の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58151393A (cs) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61242984A (ja) * | 1985-04-19 | 1986-10-29 | Shinetsu Sekiei Kk | シリコン単結晶引上げ用ルツボ |
| EP3635768A4 (en) * | 2017-05-10 | 2021-02-24 | McMahon, Shane Thomas | THIN LAYER CRYSTALLIZATION PROCESS |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55130897A (en) * | 1979-03-30 | 1980-10-11 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Silicon single crystal |
| JPS5645894A (en) * | 1979-09-25 | 1981-04-25 | Nippon Telegr & Teleph Corp <Ntt> | Reducing method for defect of silicon single crystal |
-
1982
- 1982-02-26 JP JP3109082A patent/JPS58151393A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58151393A (ja) | 1983-09-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100453850B1 (ko) | 웨이퍼주변부에결정결함이없는실리콘단결정 | |
| JPS6046998A (ja) | 単結晶引上方法及びそのための装置 | |
| JPH02263792A (ja) | シリコンの熱処理方法 | |
| US5911823A (en) | Method for pulling a single-crystal semiconductor | |
| US7235133B2 (en) | Method for growing single crystal of semiconductor | |
| JP2001151596A (ja) | エピタキシャル成長用シリコンウエーハ及びエピタキシャルウエーハ並びにその製造方法 | |
| JPH0393700A (ja) | シリコン単結晶の熱処理方法および装置ならびに製造装置 | |
| JP4055343B2 (ja) | シリコン半導体基板の熱処理方法 | |
| JPH021119B2 (cs) | ||
| JP3172389B2 (ja) | シリコンウエーハの製造方法 | |
| JPH04104988A (ja) | 単結晶成長方法 | |
| JPS6027684A (ja) | 単結晶製造装置 | |
| JPS61201692A (ja) | 欠陥発生の少ないシリコン単結晶インゴットの引上げ育成方法 | |
| JPH0119265B2 (cs) | ||
| JPS63198334A (ja) | 半導体シリコンウエ−ハの製造方法 | |
| JPH04175300A (ja) | シリコン単結晶の熱処理方法 | |
| JPS5939794A (ja) | 単結晶製造方法およびその装置 | |
| JPH03184345A (ja) | シリコンウェハおよびその製造方法 | |
| JPH023539B2 (cs) | ||
| JPH0818907B2 (ja) | Ig効果の高いシリコン単結晶の引上げ育成方法 | |
| JPH05121319A (ja) | 半導体装置の製造法 | |
| JPS6344720B2 (cs) | ||
| JPS58120591A (ja) | 単結晶の製造方法 | |
| JPH05102167A (ja) | シリコンの熱処理方法 | |
| JPS6027678A (ja) | 単結晶育成方法 |