JPH02104632U - - Google Patents
Info
- Publication number
- JPH02104632U JPH02104632U JP1293289U JP1293289U JPH02104632U JP H02104632 U JPH02104632 U JP H02104632U JP 1293289 U JP1293289 U JP 1293289U JP 1293289 U JP1293289 U JP 1293289U JP H02104632 U JPH02104632 U JP H02104632U
- Authority
- JP
- Japan
- Prior art keywords
- wafer stage
- wafer
- lower electrode
- utility
- dry etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 235000012431 wafers Nutrition 0.000 claims 4
- 238000001312 dry etching Methods 0.000 claims 1
Landscapes
- Drying Of Semiconductors (AREA)
- Intermediate Stations On Conveyors (AREA)
Description
第１図は、本考案のウエーハステージのリフト
機構の実施例を示す要部の断面図。第２図は、従
来例のウエーハステージのリフト機構の実施例を
示す要部の断面図。
機構の実施例を示す要部の断面図。第２図は、従
来例のウエーハステージのリフト機構の実施例を
示す要部の断面図。
Claims (1)
- ウエーハの受け渡しを行う、ドライエツチング
装置の下部電極ウエーハステージのリフト機構に
おいて、ソレノイド機構の制御により、ウエーハ
リフトピンの往復動作を行うことを特徴とするウ
エーハステージのリフト機構。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1293289U JPH02104632U (ja) | 1989-02-06 | 1989-02-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1293289U JPH02104632U (ja) | 1989-02-06 | 1989-02-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02104632U true JPH02104632U (ja) | 1990-08-20 |
Family
ID=31222811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1293289U Pending JPH02104632U (ja) | 1989-02-06 | 1989-02-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02104632U (ja) |
-
1989
- 1989-02-06 JP JP1293289U patent/JPH02104632U/ja active Pending