JPH02102725U - - Google Patents
Info
- Publication number
- JPH02102725U JPH02102725U JP1204189U JP1204189U JPH02102725U JP H02102725 U JPH02102725 U JP H02102725U JP 1204189 U JP1204189 U JP 1204189U JP 1204189 U JP1204189 U JP 1204189U JP H02102725 U JPH02102725 U JP H02102725U
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- semiconductor wafer
- cleaning solution
- tank
- replenished
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims 3
- 239000000126 substance Substances 0.000 claims 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989012041U JPH0749790Y2 (ja) | 1989-02-02 | 1989-02-02 | 半導体ウェーハの洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989012041U JPH0749790Y2 (ja) | 1989-02-02 | 1989-02-02 | 半導体ウェーハの洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02102725U true JPH02102725U ( ) | 1990-08-15 |
| JPH0749790Y2 JPH0749790Y2 (ja) | 1995-11-13 |
Family
ID=31221128
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989012041U Expired - Lifetime JPH0749790Y2 (ja) | 1989-02-02 | 1989-02-02 | 半導体ウェーハの洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0749790Y2 ( ) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109673107A (zh) * | 2018-12-13 | 2019-04-23 | 重庆方正高密电子有限公司 | 褪洗设备和生产线 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59215729A (ja) * | 1983-05-21 | 1984-12-05 | Ulvac Corp | 半導体もしくは磁気記録媒体等の基板の洗浄装置 |
| JPS63128186A (ja) * | 1986-11-17 | 1988-05-31 | Hitachi Ltd | 湿式エツチング装置 |
| JPS63272040A (ja) * | 1987-04-30 | 1988-11-09 | Fujitsu Ltd | 循環濾過洗浄装置 |
-
1989
- 1989-02-02 JP JP1989012041U patent/JPH0749790Y2/ja not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59215729A (ja) * | 1983-05-21 | 1984-12-05 | Ulvac Corp | 半導体もしくは磁気記録媒体等の基板の洗浄装置 |
| JPS63128186A (ja) * | 1986-11-17 | 1988-05-31 | Hitachi Ltd | 湿式エツチング装置 |
| JPS63272040A (ja) * | 1987-04-30 | 1988-11-09 | Fujitsu Ltd | 循環濾過洗浄装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109673107A (zh) * | 2018-12-13 | 2019-04-23 | 重庆方正高密电子有限公司 | 褪洗设备和生产线 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0749790Y2 (ja) | 1995-11-13 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |