JPH0195763U - - Google Patents
Info
- Publication number
- JPH0195763U JPH0195763U JP19141087U JP19141087U JPH0195763U JP H0195763 U JPH0195763 U JP H0195763U JP 19141087 U JP19141087 U JP 19141087U JP 19141087 U JP19141087 U JP 19141087U JP H0195763 U JPH0195763 U JP H0195763U
- Authority
- JP
- Japan
- Prior art keywords
- wiring layer
- resistance
- semiconductor integrated
- integrated circuit
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
- Dram (AREA)
Description
第1図は本考案のセンスアンプのレイアウト構
成図、第2図はセンスアンプの回路図、第3図は
従来のセンスアンプのレイアウト構成図である。
P1,P2……P型半導体層、N1,N2……
N型半導体層、PMOS1,PMOS2……Pチ
ヤネルMOSトランジスタ、NMOS1,NMO
S2……NチヤネルMOSトランジスタ、I……
第1金属配線層、……第2金属配線層、……
高抵抗配線層(多結晶シリコン層)、C01,C
02,C12,C13,C23……コンタクト。
FIG. 1 is a layout configuration diagram of a sense amplifier according to the present invention, FIG. 2 is a circuit diagram of the sense amplifier, and FIG. 3 is a layout configuration diagram of a conventional sense amplifier. P1, P2...P-type semiconductor layer, N1, N2...
N-type semiconductor layer, PMOS1, PMOS2...P channel MOS transistor, NMOS1, NMO
S2...N channel MOS transistor, I...
First metal wiring layer, ... second metal wiring layer, ...
High resistance wiring layer (polycrystalline silicon layer), C 01 , C
02 , C12 , C13 , C23 ...Contact.
Claims (1)
素子を有し、かつ選択された素子のゲート電極を
相互に接続する回路を含む半導体集積回路装置に
おいて、前記高抵抗配線層を各素子領域及びコン
タクト領域のみに限定し、これら高抵抗配線層を
低抵抗又は低容量配線層で相互に接続したことを
特徴とする半導体集積回路装置。 In a semiconductor integrated circuit device having a plurality of elements each having a gate electrode formed of a high-resistance wiring layer, and including a circuit that interconnects the gate electrodes of selected elements, the high-resistance wiring layer is connected to each element region and A semiconductor integrated circuit device characterized in that these high-resistance wiring layers are connected to each other by a low-resistance or low-capacitance wiring layer only in a contact region.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987191410U JP2519889Y2 (en) | 1987-12-18 | 1987-12-18 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987191410U JP2519889Y2 (en) | 1987-12-18 | 1987-12-18 | Semiconductor integrated circuit device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0195763U true JPH0195763U (en) | 1989-06-26 |
JP2519889Y2 JP2519889Y2 (en) | 1996-12-11 |
Family
ID=31482325
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1987191410U Expired - Lifetime JP2519889Y2 (en) | 1987-12-18 | 1987-12-18 | Semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2519889Y2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59129460A (en) * | 1983-01-14 | 1984-07-25 | Nec Corp | Semiconductor memory device |
-
1987
- 1987-12-18 JP JP1987191410U patent/JP2519889Y2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59129460A (en) * | 1983-01-14 | 1984-07-25 | Nec Corp | Semiconductor memory device |
Also Published As
Publication number | Publication date |
---|---|
JP2519889Y2 (en) | 1996-12-11 |
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