JPH0160542B2 - - Google Patents

Info

Publication number
JPH0160542B2
JPH0160542B2 JP56171395A JP17139581A JPH0160542B2 JP H0160542 B2 JPH0160542 B2 JP H0160542B2 JP 56171395 A JP56171395 A JP 56171395A JP 17139581 A JP17139581 A JP 17139581A JP H0160542 B2 JPH0160542 B2 JP H0160542B2
Authority
JP
Japan
Prior art keywords
thin
mask
thin film
plate
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56171395A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5873767A (ja
Inventor
Minoru Tanaka
Hitoshi Kubota
Susumu Aiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56171395A priority Critical patent/JPS5873767A/ja
Publication of JPS5873767A publication Critical patent/JPS5873767A/ja
Publication of JPH0160542B2 publication Critical patent/JPH0160542B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrodes Of Semiconductors (AREA)
JP56171395A 1981-10-28 1981-10-28 薄膜形成用マスクおよびその製造方法 Granted JPS5873767A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56171395A JPS5873767A (ja) 1981-10-28 1981-10-28 薄膜形成用マスクおよびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56171395A JPS5873767A (ja) 1981-10-28 1981-10-28 薄膜形成用マスクおよびその製造方法

Publications (2)

Publication Number Publication Date
JPS5873767A JPS5873767A (ja) 1983-05-04
JPH0160542B2 true JPH0160542B2 (enExample) 1989-12-22

Family

ID=15922357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56171395A Granted JPS5873767A (ja) 1981-10-28 1981-10-28 薄膜形成用マスクおよびその製造方法

Country Status (1)

Country Link
JP (1) JPS5873767A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1302149C (zh) * 2001-10-26 2007-02-28 松下电工株式会社 真空蒸镀装置、真空蒸镀方法及获得的有机电子荧光元件

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308656A (en) * 1991-07-16 1994-05-03 Adc Telecommunications, Inc. Electroformed mask and use therefore
JP4364957B2 (ja) * 1998-10-22 2009-11-18 北陸電気工業株式会社 蒸着マスク
JP4126648B2 (ja) * 2002-07-01 2008-07-30 日立金属株式会社 メタルマスク用部材の製造方法
JP2005042147A (ja) * 2003-07-25 2005-02-17 Dainippon Screen Mfg Co Ltd 蒸着用マスクの製造方法および蒸着用マスク
JP2005089809A (ja) * 2003-09-17 2005-04-07 Mitsumura Printing Co Ltd マスキング装置およびマスキング装置の作製方法、並びに搬送装置および搬送装置の作製方法
JP5459632B1 (ja) * 2013-01-08 2014-04-02 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1302149C (zh) * 2001-10-26 2007-02-28 松下电工株式会社 真空蒸镀装置、真空蒸镀方法及获得的有机电子荧光元件

Also Published As

Publication number Publication date
JPS5873767A (ja) 1983-05-04

Similar Documents

Publication Publication Date Title
JP2744826B2 (ja) パターン化法及び製品
JPS5933673B2 (ja) 薄い自立金属構造の製造方法
US20030016116A1 (en) Method of depositing a thin metallic film and related apparatus
JPH0313304B2 (enExample)
US3423261A (en) Method of etching fine filamentary apertures in thin metal sheets
JPH0137728B2 (enExample)
US4528071A (en) Process for the production of masks having a metal carrier foil
JPS5873767A (ja) 薄膜形成用マスクおよびその製造方法
JPS6376859A (ja) 蒸着用マスクとその製造法
US5348825A (en) Method for manufacturing shadow mask and shadow mask manufactured by said method
JP7761440B2 (ja) 蒸着マスクの製造方法
KR100273784B1 (ko) 샤도우 마스크 및 그 제조 방법
JP2005314787A (ja) メタルマスクの製作方法
US4097394A (en) Etching liquid for etching aluminum
JPH07319152A (ja) ガラス系脆性基体印刷凹版の作製方法
JPS6338421B2 (enExample)
JPS6156317B2 (enExample)
JPS5857908B2 (ja) 薄膜構造体の形成方法
JPS6379958A (ja) 蒸着用マスクとその製造法
JPH02230716A (ja) Ｘ線リソグラフィー用マスクの製造方法
JPH0348498B2 (enExample)
JPH0438131B2 (enExample)
TW201444989A (zh) 複合式遮罩及其製造方法
KR19980073862A (ko) 새도우 마스크를 이용한 박막의 미세패턴 형성방법
JPS589414B2 (ja) フォトファブリケ−ション用マスクの製作方法